本文選題：ITO刻蝕廢液　切入點(diǎn)：沉淀法　出處：《合肥工業(yè)大學(xué)》2017年碩士論文

【摘要】：氧化銦錫(ITO)的主要應(yīng)用領(lǐng)域是生產(chǎn)液晶顯示器,而其主要成分金屬銦在地殼上含量稀少,屬于稀散金屬。隨著電子行業(yè)的發(fā)展、含銦原生資源的過渡開采以及銦的需求量進(jìn)一步增加,很多國(guó)家將其列為戰(zhàn)略資源,因此,開發(fā)銦的二次資源顯得尤為重要。ITO刻蝕廢液產(chǎn)生于液晶顯示器的生產(chǎn)過程中。這種廢液的特點(diǎn)為含酸高且含高回收價(jià)值的金屬離子,若是采用的是直排方式,既會(huì)使環(huán)境受到污染,又會(huì)使寶貴的資源被浪費(fèi)。鑒于銦的需求量擴(kuò)大,回收ITO刻蝕廢液中的銦顯得十分必要。本文以ITO刻蝕廢液為研究對(duì)象,研究刻蝕廢液中銦錫的回收利用技術(shù)。首先,通過沉淀法對(duì)ITO刻蝕廢液進(jìn)行處理,介紹了沉淀法的優(yōu)缺點(diǎn),并敘述了實(shí)驗(yàn)現(xiàn)象。實(shí)驗(yàn)結(jié)果表明,通過沉淀法處理ITO刻蝕廢液,其回收率較高,其中銦離子的回收率為99.9%,錫離子的回收效率為96.6%。其次,通過萃取法對(duì)ITO刻蝕廢液進(jìn)行處理,介紹了萃取法的優(yōu)缺點(diǎn),選擇了三種常見的應(yīng)用于銦錫萃取的萃取劑,即,P204,P507和TBP,并通過定性的角度確定了適合用于ITO刻蝕廢液的萃取劑為P204,并做了P204的反萃實(shí)驗(yàn)。實(shí)驗(yàn)結(jié)果表明,通過對(duì)P204進(jìn)行單因素實(shí)驗(yàn)及正交實(shí)驗(yàn)得出萃取法在處理ITO刻蝕廢液的最佳工藝為萃取劑/稀釋劑為3/7;攪拌時(shí)間為5分鐘;油水比(A/O)為7/1,溫度為30℃。最佳工藝條件下,銦離子的萃取率為99.14%,錫離子的萃取率為76.68%。但是由于反萃效率不高,經(jīng)估算,該方法銦的總回收率在85%左右,錫的回收率僅為15%左右。最后,通過螯合樹脂法對(duì)ITO刻蝕廢液進(jìn)行處理,介紹了螯合樹脂法的優(yōu)缺點(diǎn),并通過對(duì)三類應(yīng)用于金屬離子吸附的螯合樹脂進(jìn)行比選,選出了適用于吸附銦錫離子的螯合樹脂。實(shí)驗(yàn)結(jié)果表明,通過螯合樹脂法處理ITO刻蝕廢液,其回收率較高,其中對(duì)銦的平均去除率高達(dá)99.5%,對(duì)錫的平均去除率高達(dá)96.2%。通過解吸,能將廢液中的銦錫進(jìn)行回收利用,且解吸效率較高,該方法對(duì)銦錫的總回收率均在95%以上,且產(chǎn)廢較少,后續(xù)處理成本不大。
[Abstract]:The main application field of indium tin oxide (ITO) is the production of liquid crystal display (LCD), and its main component, indium, is rare in the crust and belongs to dilute metal. The overexploitation of indium-containing primary resources and the further increase in demand for indium have been listed as strategic resources in many countries. It is particularly important to develop indium secondary resources. ITO etching waste liquid is produced in the production process of liquid crystal display. The waste liquid is characterized by high acid content and high recovery value of metal ions. In view of the increasing demand for indium, it is very necessary to recover indium from the waste liquid of ITO etch. In this paper, the ITO etching waste liquid is taken as the research object. The recovery and utilization technology of indium tin in etching waste liquid is studied. Firstly, the ITO etching waste liquid is treated by precipitation method, the advantages and disadvantages of precipitation method are introduced, and the experimental phenomena are described. The experimental results show that the ITO etching waste liquid is treated by precipitation method. The recovery rate of indium ion is 99.9 and the recovery efficiency of tin ion is 96.6. secondly, the ITO etching waste liquid is treated by extraction, and the advantages and disadvantages of the extraction method are introduced. Three common extractants used in indium tin extraction, namely P204P507 and TBP, were selected. The extractant P204was determined to be suitable for ITO etching waste liquid by qualitative analysis, and the back extraction experiment of P204 was carried out. Through the single factor experiment and orthogonal experiment of P204, it is concluded that the optimum process of extraction in treating ITO etching waste liquid is that the extractant / diluent is 3 / 7; the stirring time is 5 minutes; the ratio of oil to water is 7 / 1; the temperature is 30 鈩，

本文編號(hào)：1680696