SOI光開關(guān)陣列的基礎(chǔ)研究
本文選題:SOI + 電光開關(guān) ; 參考:《長春理工大學(xué)》2017年碩士論文
【摘要】:SOI(Silicon-On-Insulator)中文翻譯成為絕緣體上的硅,其在半導(dǎo)體材料領(lǐng)域占有一半份額,因其在低壓、高溫、低功率電路、傳感器及光電集成方面有著優(yōu)良的性能,所以被稱為“二十一世紀(jì)的硅基礎(chǔ)電路技術(shù)”。同時(shí),SOI材料的光開關(guān)具有與傳統(tǒng)硅工藝相兼容、實(shí)現(xiàn)光電的集成,開關(guān)響應(yīng)時(shí)間快,精湛的加工技術(shù)和造價(jià)低廉等優(yōu)勢,成為廣泛應(yīng)用的具有發(fā)展前景的半導(dǎo)體材料。因此,其不但可以制作精致緊湊靈敏的光電集成器件,也為在CMOS(Complementary Metal Oxide Semiconductor)微電子工藝上實(shí)現(xiàn)光電集成提供了一個(gè)優(yōu)良的平臺(tái)。本文擬以SOI光開關(guān)的設(shè)計(jì)與仿真作為自己的研究方向,重點(diǎn)研究了基于優(yōu)化后的開關(guān)單元進(jìn)行光開關(guān)陣列的建模與仿真。由于光開關(guān)在制備工藝上有著一定的困難與不成熟,所以本文主要利用光束傳播法對(duì)耦合器、光開關(guān)以及大型光開關(guān)陣列進(jìn)行優(yōu)化設(shè)計(jì),主要研究內(nèi)容包括:(1)2×2 SOI光開關(guān)單元的優(yōu)化設(shè)計(jì)與性能模擬,從MZI(Mach-Zehnder Interferometer)型光開關(guān)結(jié)構(gòu)和原理出發(fā),利用有限差分光束傳播法優(yōu)化設(shè)計(jì)的MZI干涉儀型光開關(guān)單元,并對(duì)其光路進(jìn)行性能仿真。(2)2×2 SOI電光開關(guān)的研究,研究了SOI電光開關(guān)載流子色散效應(yīng)及其特性。(3)在2×2光開關(guān)單元的優(yōu)化設(shè)計(jì)和連接光路建模與仿真基礎(chǔ)上,構(gòu)建網(wǎng)絡(luò)結(jié)構(gòu),仿真分析了4×4、8×8、16×16的MZI型SOI熱光和電光開關(guān)陣列的性能。
[Abstract]:The SOI Silicon-On-Insulator translates into silicon on insulators, which has a half share in semiconductor materials because of its excellent performance in low-voltage, high-temperature, low-power circuits, sensors and optoelectronic integration. Therefore, it is called the basic circuit technology of silicon in the 21 century. At the same time, the optical switch of SOI material is compatible with the traditional silicon technology, realizes the photoelectric integration, the switch response time is fast, the consummate processing technology and the cost is low, so it has become a widely used semiconductor material with the prospect of development. Therefore, it can not only make compact and sensitive optoelectronic integrated devices, but also provide an excellent platform for the realization of optoelectronic integration in CMOS(Complementary Metal Oxide Semiconductor) microelectronics technology. In this paper, the design and simulation of SOI optical switch is taken as its own research direction, and the modeling and simulation of optical switch array based on the optimized switch cell is studied. Because the optical switch has some difficulties and immaturity in the fabrication process, this paper mainly uses the beam propagation method to optimize the design of coupler, optical switch and large optical switch array. The main research contents include the optimal design and performance simulation of the 2 脳 2 SOI optical switch unit. Based on the structure and principle of the MZI(Mach-Zehnder Interferometer optical switch, the MZI interferometer optical switch cell is optimized by using the finite difference beam propagation method. The performance of the optical circuit is simulated. The 2 脳 2 SOI electro-optic switch is studied. The carrier dispersion effect and its characteristics of the SOI electro-optic switch are studied. Based on the optimized design of the 2 脳 2 optical switch unit and the modeling and simulation of the connected optical path, the network structure is constructed. The performance of MZI SOI thermo-optical and electro-optic switch arrays with 4 脳 4 脳 4 脳 8 脳 8 脳 16 脳 16 is simulated and analyzed.
【學(xué)位授予單位】:長春理工大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2017
【分類號(hào)】:TN256;TN929.1
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