【摘要】：光刻機是集成電路產(chǎn)業(yè)的基礎設備,光刻機的線寬決定著集成電路的特征尺寸。光刻機研制水平的提高能夠帶動整個集成電路產(chǎn)業(yè)界的技術升級,能夠有效地促進國家經(jīng)濟的發(fā)展和提高國家高技術領域的核心競爭力。光刻機儼然已成為衡量國家綜合國力的重要標志。極紫外光刻機是當今光刻機研制中的熱點。掩模臺是極紫外光刻機中的核心組成部分,由于極紫外光刻機套刻精度和產(chǎn)業(yè)化的要求,掩模臺要實現(xiàn)高速大行程的納米級運動,這使得掩模臺成為了一個電、氣、磁耦合的復雜機械系統(tǒng)。 利用SolidWorks、ANSYS靜力分析、ANSYS模態(tài)分析和ANSYS拓撲優(yōu)化初步完成了對掩模臺的結構設計和優(yōu)化,使其固有頻率和質(zhì)量都能達到設計要求。掩模臺設計成宏動臺和微動臺的雙級結構。宏動臺采用“H”型直線電機驅(qū)動和氣浮導軌支撐,微動臺采用音圈電機驅(qū)動和支撐。 直線電機的啟動和停止會引起掩模臺的超調(diào),因此對微動臺、掩模支撐系統(tǒng)、基座系統(tǒng)分別進行了瞬態(tài)分析,得到了相應的穩(wěn)定時間。直線電機的電磁力存在周期性的波動,這個波動會影響宏動臺的振動。利用ANSYS諧分析得到了掩模支撐系統(tǒng)的最大振動幅值。為了得到外界干擾的影響,對基座系統(tǒng)進行了隨機振動分析。 利用SolidWorks、GAMBIT和FLUENT完成了對氣浮導軌的設計,使得每個氣浮滑塊豎直剛度為93.46 N/μm,水平剛度為121.56 N/μm。 掩模板的變形會直接影響到套刻精度,因此對掩模板進行了熱-結構耦合分析。當掩模板變形產(chǎn)生的套刻誤差超出設計指標值時,提出了三條改進措施,最終使其達到設計指標。
[Abstract]:Lithography machine is the basic equipment of the integrated circuit industry. The linewidth of the lithography machine determines the characteristic size of the integrated circuit. The improvement of the development level of the lithography machine can promote the technology upgrade of the whole integrated circuit industry, promote the development of the national economy and improve the core competitiveness of the national high-tech field effectively. Lithography machine has become an important symbol of national comprehensive national strength. The ultra-violet lithography machine is a hot spot in the research and development of the lithography machine today. The mask table is the core component of the ultra-ultraviolet lithography machine. Because of the precision and industrialization requirements of the ultra-ultraviolet lithography machine, the mask table must realize the high-speed and large-stroke nanoscale movement, which makes the mask table become an electric and gas. Magnetically coupled complex mechanical systems. By using the static analysis of SolidWorks,ANSYS, ANSYS modal analysis and ANSYS topology optimization, the structure design and optimization of the mask table are preliminarily completed, so that the natural frequency and quality of the mask can meet the design requirements. The mask table is designed as a two-stage structure of macro-moving platform and micro-moving table. The macro platform is driven by H-type linear motor and supported by air-floating guideway, while the micro-platform is driven and supported by voice coil motor. The start and stop of the linear motor will cause the overshoot of the mask table. Therefore, the transient analysis of the micro-platform, the mask support system and the base system is carried out, and the corresponding stability time is obtained. The electromagnetic force of linear motor fluctuates periodically, which will affect the vibration of macroplatform. The maximum vibration amplitude of mask support system is obtained by ANSYS harmonic analysis. In order to obtain the influence of external interference, the random vibration analysis of the base system is carried out. By using SolidWorks,GAMBIT and FLUENT, the design of the air-bearing guideway is completed. The vertical stiffness and horizontal stiffness of each air-floating slide block are 93.46 N / 渭 m and 121.56 N / 渭 m respectively. The deformation of the mask will directly affect the accuracy of the mask, so the thermal-structural coupling analysis of the mask is carried out. When the cover error caused by the deformation of mask template exceeds the design index value, three improvement measures are put forward to make it reach the design target at last.
【學位授予單位】：哈爾濱工業(yè)大學
【學位級別】：碩士
【學位授予年份】：2011
【分類號】：TH122

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