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鎂合金微弧氧化過(guò)程中電源模式對(duì)顆粒摻雜的影響

發(fā)布時(shí)間:2019-05-08 06:55
【摘要】:目的采用含顆粒電解液是目前最常用制備具有更佳性能微弧氧化膜層的方法之一,主要研究微弧氧化過(guò)程中顆粒摻雜與電源模式的關(guān)系。方法在Y2O3顆粒質(zhì)量濃度為0~10 g/L的電解液中,分別以單極脈沖和雙極脈沖電源模式制備一系列微弧氧化膜層,并從表面形貌、表面元素組成、截面形貌及耐蝕性能等方面對(duì)膜層進(jìn)行綜合評(píng)價(jià)。結(jié)果分散在電解液中的顆粒帶有負(fù)電荷,在微弧氧化過(guò)程中發(fā)生電泳現(xiàn)象。在單極脈沖電源模式下,顆粒受正電吸引而發(fā)生定向遷移,在試樣附近聚集并且吸附至表面,從而參與下一步的微弧氧化膜層形成過(guò)程。隨著電解液中顆粒濃度的提高,分散在微弧氧化膜層表面的Y2O3顆粒數(shù)量增多,膜層表面的Y元素含量增加,膜層變得致密,耐蝕性能因而提高。在雙極脈沖電源作用下,由于電場(chǎng)的交替變化,顆粒難以聚集在試樣周?chē)?顆粒的摻雜只能通過(guò)隨機(jī)熔融包覆進(jìn)行,因而參與到微弧氧化過(guò)程中的顆粒數(shù)量較少。結(jié)論顆粒摻雜受電場(chǎng)力影響,在單極脈沖模式下,顆粒的摻雜濃度對(duì)膜層的性能影響明顯;在雙極脈沖電源模式下,負(fù)向電流的引入不利于顆粒摻雜至氧化膜層,顆粒的摻雜濃度對(duì)膜層的性能影響不明顯。
[Abstract]:Aim the use of electrolyte containing particles is one of the most commonly used methods to prepare micro-arc oxide films with better performance. The relationship between particle doping and power supply mode in the process of micro-arc oxidation is mainly studied. Methods A series of micro-arc oxidation films were prepared by single-pole pulse mode and bipolar pulse mode in the electrolyte with Y2O3 particle concentration of 0-10 g / L, and the surface morphology and surface element composition were analyzed. The cross-section morphology and corrosion resistance of the films were evaluated comprehensively. Results the particles dispersed in the electrolyte had negative charge, and electrophoresis occurred in the process of micro-arc oxidation. In the monopole pulse power supply mode, the particles migrate directionally by the positive electric attraction, gather and adsorb to the surface near the sample, thus participate in the formation process of the micro-arc oxidation film in the next step. With the increase of particle concentration in electrolyte, the number of Y2O3 particles dispersed on the surface of micro-arc oxidation film increased, the content of Y element on the surface of the film increased, and the film became dense, so the corrosion resistance of the film was improved. Under the action of bipolar pulse power supply, due to the alternation of electric field, the particles are difficult to gather around the sample, the doping of particles can only be carried out by random melting coating, so the number of particles involved in the process of micro-arc oxidation is small. Conclusion the particle doping is affected by the electric field force. In unipolar pulse mode, the doping concentration of the particle has obvious effect on the performance of the film. In bipolar pulse power supply mode, the introduction of negative current is not conducive to the doping of particles into the oxide film, and the doping concentration of particles has little effect on the performance of the films.
【作者單位】: 北京化工大學(xué);
【分類(lèi)號(hào)】:TG174.4

【參考文獻(xiàn)】

相關(guān)期刊論文 前2條

1 蔣百靈,吳國(guó)建,張淑芬,雷廷權(quán);鎂合金微弧氧化陶瓷層生長(zhǎng)過(guò)程及微觀結(jié)構(gòu)的研究[J];金屬熱處理學(xué)報(bào);2002年01期

2 楊眉;雷正;王平;歐r,

本文編號(hào):2471697


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