【摘要】：將冷軋取向硅鋼樣品在不同退火條件下進(jìn)行退火,并結(jié)合現(xiàn)有的檢測(cè)手段(FTIR、GD-OES)和Raman光譜分別對(duì)最終生成的氧化層進(jìn)行綜合檢測(cè)分析。研究結(jié)果表明,Raman光譜能快速準(zhǔn)確地檢測(cè)出氧化層成分,樣品在低氧化性氣氛條件(pH2O/pH2=0.288)下,于850℃退火3min后所生成的氧化層成分為SiO_2-FeSiO_3組織;并且隨著反應(yīng)氣氛氧化性的提高(pH_2O/pH_2增加),氧化層中FeSiO_3的含量也隨之增多。
[Abstract]:The samples of cold-rolled oriented silicon steel were annealed under different annealing conditions. The final oxide layer was analyzed by FTIR,GD-OES and Raman spectra. The results show that the composition of the oxide layer can be detected quickly and accurately by Raman spectroscopy. The composition of the oxide layer formed after annealing at 850 鈩，

本文編號(hào)：2271798