本文選題：化學(xué)機(jī)械拋光 + 玻璃基板�。� 參考：《中國(guó)表面工程》2015年02期

【摘要】：為了研究拋光工藝參數(shù)(拋光壓力、拋光臺(tái)轉(zhuǎn)速、拋光液流量)對(duì)精細(xì)霧化拋光TFT-LCD玻璃基板的影響,實(shí)現(xiàn)對(duì)玻璃基板的高效、高質(zhì)量加工,采用正交試驗(yàn)方法對(duì)玻璃基板進(jìn)行霧化拋光,以材料去除率(MRR)和表面粗糙度(Ra)為評(píng)價(jià)指標(biāo),根據(jù)實(shí)驗(yàn)結(jié)果得到最優(yōu)的工藝參數(shù)組合,并將傳統(tǒng)拋光和霧化拋光進(jìn)行了對(duì)比。結(jié)果表明:當(dāng)壓力為0.055 MPa,拋光臺(tái)轉(zhuǎn)速為65r/min,拋光液流量為8.3mL/min時(shí),霧化拋光的材料去除率為219nm/min,表面粗糙度Ra為1.1nm,光學(xué)透過(guò)率≥92.6%。在相同的試驗(yàn)條件下,傳統(tǒng)拋光的去除率和表面粗糙度分別為335nm/min和1.2nm,兩種方法的拋光效果相近,但霧化方法拋光液用量?jī)H為傳統(tǒng)的1/10。
[Abstract]:In order to study the effect of polishing process parameters (polishing pressure, polishing table speed, polishing liquid flow) on fine atomization polishing TFT-LCD glass substrate, the high efficiency and high quality processing of glass substrate can be realized. The glass substrate was atomized by orthogonal test. The material removal rate (MRR) and the surface roughness (Raa) were taken as the evaluation indexes. The optimal combination of process parameters was obtained according to the experimental results, and the traditional polishing and atomization polishing were compared. The results show that when the pressure is 0.055 MPA, the rotating speed of polishing table is 65 r / min and the flow rate of polishing liquid is 8.3mL/min, the material removal rate of atomization polishing is 219nm / min, the surface roughness Ra is 1.1 nm, and the optical transmittance is 鈮，

本文編號(hào)：1779336