本文選題：TiAlN納米多層膜 + 硬質(zhì)合金�。� 參考：《重慶理工大學(xué)》2015年碩士論文

【摘要】：利用磁控濺射技術(shù),通過調(diào)整工藝參數(shù):氮氣流量、基體偏壓、濺射功率、沉積溫度、調(diào)制周期以及調(diào)制比,在硬質(zhì)合金基體表面制備一系列TiAlN納米多層膜,綜合利用納米壓痕、X射線衍射、掃描電子顯微鏡、熱重分析、電化學(xué)腐蝕等技術(shù)手段對TiAlN納米多層膜進(jìn)行結(jié)構(gòu)和性能表征,研究了磁控濺射工藝對納米多層膜結(jié)構(gòu)和性能的影響,探討了納米多層膜結(jié)構(gòu)與性能之間的影響機制,獲得了具有超硬性以及優(yōu)良的耐磨、抗高溫和耐腐蝕性能薄膜的制備工藝,為硬質(zhì)合金基體材質(zhì)的表面改性,特別是刀具表面超硬涂層的獲得提供了有益參考。主要研究結(jié)果如下:(1)影響TiN薄膜與硬質(zhì)合金基體結(jié)合力以及其本身硬度的影響因素中,影響權(quán)重依次為:R偏壓R氮流量R功率R溫度,隨著基體偏壓的增加,薄膜的硬度升高但與基體的結(jié)合強度降低;綜合考慮硬度和結(jié)合力,選擇偏壓-150V、氮流量35sccm、沉積溫度150℃以及Ti靶功率1000W作為制備TiN過渡層的工藝參數(shù)。(2)TiN/AlN納米多層膜的硬度與氮流量之間存在一定的關(guān)聯(lián),但并未表現(xiàn)出一定的規(guī)律性,當(dāng)?shù)髁繛?5sccm時,薄膜表現(xiàn)出較高的硬度,達(dá)到2900HV;表面形貌在氮流量為25sccm與35sccm時較為平整。(3)隨著偏壓的增大,TiN/AlN納米多層膜的硬度先增加后降低,在偏壓為-100V時,薄膜表現(xiàn)出較高的硬度值,達(dá)到2800HV,且表面形貌最優(yōu)。(4)不同調(diào)制周期的TiN/Al N納米多層膜中均僅存在立方結(jié)構(gòu)的TiN和AlN相;調(diào)制周期與TiN/AlN納米多層膜的硬度之間表現(xiàn)出顯著的關(guān)聯(lián)性,當(dāng)且僅當(dāng)調(diào)制周期厚度在5~7nm范圍內(nèi)時,薄膜表現(xiàn)出顯著的超硬特性,當(dāng)調(diào)制周期為5.6nm時薄膜的顯微硬度均值達(dá)到35GPa,同時表現(xiàn)出最好的抗腐蝕性能;納米多層薄膜的耐磨性和耐高溫氧化性隨調(diào)制周期的減小(周期數(shù)與界面數(shù)量的增加)而單調(diào)升高,調(diào)制周期為3.6nm的薄膜耐磨性和耐高溫氧化性能最優(yōu)。(5)調(diào)制比的變化造成了TiN/AlN納米多層膜中晶體結(jié)構(gòu)的差異,當(dāng)調(diào)制比為1:35時,薄膜中僅存在立方結(jié)構(gòu)的TiN和AlN,此時薄膜表現(xiàn)出超硬性(顯微硬度均值35GPa),且該薄膜具有最優(yōu)的耐磨性和耐腐蝕性能;調(diào)制比為1:25的TiN/AlN納米多層薄膜表現(xiàn)出最好的耐高溫氧化性能。(6)通過論文的研究,綜合考慮TiAlN涂層的應(yīng)用實際,硬質(zhì)合金刀具表面涂層設(shè)計的最佳方案為:過渡層(Ti+TiN)+TiN/AlN(調(diào)制周期5-7nm,調(diào)制比1:35)。
[Abstract]:A series of TiAlN nanocrystalline multilayers were prepared on cemented carbide substrate by means of magnetron sputtering technology by adjusting the process parameters: nitrogen flow rate, substrate bias, sputtering power, deposition temperature, modulation period and modulation ratio.The structure and properties of TiAlN nanocrystalline multilayers were characterized by means of nano-indentation X-ray diffraction scanning electron microscope thermogravimetric analysis and electrochemical corrosion.The effect of magnetron sputtering technology on the structure and properties of nanocrystalline multilayer films was studied. The influence mechanism between the structure and properties of nano-multilayer films was discussed.The preparation process of high temperature and corrosion resistant films provides a useful reference for the surface modification of cemented carbide substrates, especially for the acquisition of superhard coatings on tool surfaces.The main results are as follows: (1) among the factors affecting the adhesion between TiN film and cemented carbide substrate and its hardness, the weight of influence is in turn R: r bias R N flux R power R temperature, and with the increase of substrate bias voltage,The hardness of the film increases but the bonding strength with the substrate decreases.Choosing bias voltage -150V, nitrogen flow rate 35sccm, deposition temperature 150 鈩，

本文編號：1737005