懸浮液進樣-液體陰極輝光放電原子發(fā)射光譜法測定高純氮化硅粉體中微量雜質(zhì)元素
發(fā)布時間:2018-10-09 07:39
【摘要】:針對高純氮化硅粉體中的9種微量雜質(zhì)元素(Al、Ca、Co、Fe、K、Mg、Mn、Na、Ni),建立了懸浮液進樣-液體陰極輝光放電原子發(fā)射光譜定量分析方法?疾炝酥苽浞(wěn)定懸浮液對樣品顆粒度的要求,并通過六通閥將懸浮液引入液體陰極輝光放電原子發(fā)射光譜裝置檢測。本方法采用水溶液標準進行定量分析,無需對懸浮液的p H值進行精確調(diào)節(jié),能夠保持液體陰極輝光等離子體的穩(wěn)定性。研究了儀器裝置的操作電壓、載液流速、光電倍增管積分時間等因素對檢出限的影響。優(yōu)化后得到的最佳實驗條件為操作電壓1080 V,載液流速1.2 m L/min,光電倍增管積分時間800 ms。利用六通閥進樣系統(tǒng)對原有的液體陰極輝光放電原子發(fā)射光譜裝置進行改進,從而實現(xiàn)懸浮液直接進樣檢測。用此裝置對氮化硅實際樣品進行檢測,得到各種元素的檢出限在0.2~53 mg/kg之間,RSD在1.1%~5.0%之間。通過對氮化硅標準參考物質(zhì)ERM-ED101進行分析,其測定結(jié)果與高溫高壓消解-電感耦合等離子體發(fā)射光譜法一致,并與標準參考值吻合,表明此方法可用于氮化硅粉體的懸浮液直接進樣檢測,結(jié)果準確可靠,靈敏度高,具備應(yīng)用價值。
[Abstract]:Aiming at nine trace impurity elements (Al,Ca,Co,Fe,K,Mg,Mn,Na,Ni) in high purity silicon nitride powder, a quantitative analysis method of suspension injection and liquid cathode glow discharge atomic emission spectrometry was established. The requirements of preparing stable suspensions for sample size were investigated, and the suspension was introduced into liquid cathodic glow discharge atomic emission spectrometer by a six-way valve. The stability of liquid cathode glow plasma can be maintained without adjusting the pH value of suspensions accurately by using the aqueous solution standard for quantitative analysis. The effects of operating voltage, liquid velocity and integration time of photomultiplier tube on the detection limit are studied. The optimized experimental conditions are as follows: operating voltage 1080 V, liquid flow rate 1.2 mL / min, integral time of photomultiplier tube 800 ms.. The original liquid cathodic glow discharge atomic emission spectrometer was improved by using the six-way valve sampling system, so as to realize the direct sampling detection of suspensions. The detection limit of various elements was found to be between 0.2 ~ 53 mg/kg and 1.1% ~ 5.0% by using this device for the detection of silicon nitride samples. By analyzing the standard reference material (ERM-ED101) of silicon nitride, the results are in agreement with the high temperature and high pressure digestion-inductively coupled plasma emission spectrometry (ICP-AES), and the results are in good agreement with the standard reference values. The results show that this method can be used for the direct injection of silicon nitride powder suspension, the results are accurate and reliable, high sensitivity and application value.
【作者單位】: 中國科學(xué)院上海硅酸鹽研究所;
【基金】:中國科學(xué)院科研裝備研制項目(No.YZ201539)、中國科學(xué)院儀器設(shè)備功能開發(fā)技術(shù)創(chuàng)新項目(No.Y67YQ2120G) 上海市無機非金屬材料分析測試表征專業(yè)技術(shù)服務(wù)平臺項目(No.14DZ2292900)資助
【分類號】:O657.31;TQ127.2
本文編號:2258520
[Abstract]:Aiming at nine trace impurity elements (Al,Ca,Co,Fe,K,Mg,Mn,Na,Ni) in high purity silicon nitride powder, a quantitative analysis method of suspension injection and liquid cathode glow discharge atomic emission spectrometry was established. The requirements of preparing stable suspensions for sample size were investigated, and the suspension was introduced into liquid cathodic glow discharge atomic emission spectrometer by a six-way valve. The stability of liquid cathode glow plasma can be maintained without adjusting the pH value of suspensions accurately by using the aqueous solution standard for quantitative analysis. The effects of operating voltage, liquid velocity and integration time of photomultiplier tube on the detection limit are studied. The optimized experimental conditions are as follows: operating voltage 1080 V, liquid flow rate 1.2 mL / min, integral time of photomultiplier tube 800 ms.. The original liquid cathodic glow discharge atomic emission spectrometer was improved by using the six-way valve sampling system, so as to realize the direct sampling detection of suspensions. The detection limit of various elements was found to be between 0.2 ~ 53 mg/kg and 1.1% ~ 5.0% by using this device for the detection of silicon nitride samples. By analyzing the standard reference material (ERM-ED101) of silicon nitride, the results are in agreement with the high temperature and high pressure digestion-inductively coupled plasma emission spectrometry (ICP-AES), and the results are in good agreement with the standard reference values. The results show that this method can be used for the direct injection of silicon nitride powder suspension, the results are accurate and reliable, high sensitivity and application value.
【作者單位】: 中國科學(xué)院上海硅酸鹽研究所;
【基金】:中國科學(xué)院科研裝備研制項目(No.YZ201539)、中國科學(xué)院儀器設(shè)備功能開發(fā)技術(shù)創(chuàng)新項目(No.Y67YQ2120G) 上海市無機非金屬材料分析測試表征專業(yè)技術(shù)服務(wù)平臺項目(No.14DZ2292900)資助
【分類號】:O657.31;TQ127.2
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