【摘要】：通過改變碲鋅鎘襯底的表面加工方法及溴-甲醇腐蝕液的濃度,研究襯底的表面狀態(tài)對碲鎘汞薄膜表面起伏情況的影響。利用傅里葉紅外透射(FTIR)光譜議、晶片掃描成像系統(tǒng)、光學(xué)顯微鏡等工具對不同條件下的碲鎘汞薄膜的表面起伏情況進行觀察和比較。研究初步發(fā)現(xiàn)碲鋅鎘襯底不經(jīng)過化學(xué)拋光,以及不經(jīng)過腐蝕直接進行外延的情況下得到的碲鎘汞薄膜的表面起伏狀況會得到一定程度的改善,但是考慮溴-甲醇腐蝕液對機械拋光造成的表面應(yīng)力的釋放作用以及外延過程中的襯底回熔的相互作用會使得外延所得碲鎘汞薄膜表面起伏情況更加復(fù)雜。因此,仍需要對襯底使用前的化學(xué)拋光對薄膜表面起伏的作用以及確定合適的溴-甲醇腐蝕液的濃度進行進一步的研究。
[Abstract]:The effect of substrate state on the surface undulation of HgCdTe thin films was studied by changing the surface processing method of CdTe substrate and the concentration of Bromine-methanol etchant. The surface undulation of HgCdTe films prepared on CdTe substrates without chemical polishing and direct epitaxy without etching is improved to a certain extent. However, the effect of Bromine-methanol etchant on the surface stress release caused by mechanical polishing and its external effects are considered. The surface fluctuation of HgCdTe films prepared by epitaxy is more complicated due to the interaction of substrate remelting during epitaxy. Therefore, the effect of chemical polishing prior to substrate use on the surface fluctuation of HgCdTe films and the determination of appropriate concentration of Bromine-methanol etchant still need further study.
【作者單位】： 華北光電技術(shù)研究所;
【分類號】：TB383.2

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