脈沖等離子體射流殺滅表面和水中的細(xì)菌
發(fā)布時(shí)間:2019-04-19 19:10
【摘要】:利用雙極性高頻脈沖電源和自制等離子體反應(yīng)器,形成了直徑為6mm、長(zhǎng)3~5cm的氬氣等離子體射流.當(dāng)脈沖電壓為2~5kV,脈沖頻率為1~3kHz,氬氣體積流量為3.3L/min時(shí),等離子體射流的功率為1~6W.等離子體處理瓊脂平板表面的大腸桿菌1~3min后,產(chǎn)生直徑為2~5cm的殺菌斑.用來(lái)處理酶標(biāo)板小孔內(nèi)的250μL大腸桿菌菌液時(shí),0.5~2.0min內(nèi)可將大腸桿菌細(xì)胞密度下降6個(gè)對(duì)數(shù).等離子體射流的滅菌效率隨著處理間距的減小、脈沖電壓和頻率的增大而提高,但本質(zhì)上取決于等離子體功率和能量密度.
[Abstract]:Argon plasma jet with a diameter of 6 mm and a long 3~5cm was formed by using bipolar high frequency pulse power supply and self-made plasma reactor. When the pulse voltage is 2? 5 kV, the pulse frequency is 1? 3 kHz, and the volume flow rate of argon is 3.3L/min, the power of the plasma jet is 1? 6 W. The Escherichia coli 1~3min on the surface of Agar plate was treated by plasma, and the bactericidal plaque with the diameter of 2~5cm was produced. When it was used to treat 250 渭 L E. coli liquid in the micropore of enzyme plate, the cell density of E. coli could be reduced by 6 logarithms in 0.5~2.0min. The sterilization efficiency of plasma jet increases with the decrease of treatment spacing and the increase of pulse voltage and frequency, but essentially depends on the plasma power and energy density.
【作者單位】: 浙江大學(xué)生物質(zhì)化工教育部重點(diǎn)實(shí)驗(yàn)室;浙江省醫(yī)療器械研究所;
【基金】:中央高校科研業(yè)務(wù)費(fèi)資助項(xiàng)目(2012XZZX001)
【分類號(hào)】:R318.6
本文編號(hào):2461198
[Abstract]:Argon plasma jet with a diameter of 6 mm and a long 3~5cm was formed by using bipolar high frequency pulse power supply and self-made plasma reactor. When the pulse voltage is 2? 5 kV, the pulse frequency is 1? 3 kHz, and the volume flow rate of argon is 3.3L/min, the power of the plasma jet is 1? 6 W. The Escherichia coli 1~3min on the surface of Agar plate was treated by plasma, and the bactericidal plaque with the diameter of 2~5cm was produced. When it was used to treat 250 渭 L E. coli liquid in the micropore of enzyme plate, the cell density of E. coli could be reduced by 6 logarithms in 0.5~2.0min. The sterilization efficiency of plasma jet increases with the decrease of treatment spacing and the increase of pulse voltage and frequency, but essentially depends on the plasma power and energy density.
【作者單位】: 浙江大學(xué)生物質(zhì)化工教育部重點(diǎn)實(shí)驗(yàn)室;浙江省醫(yī)療器械研究所;
【基金】:中央高校科研業(yè)務(wù)費(fèi)資助項(xiàng)目(2012XZZX001)
【分類號(hào)】:R318.6
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