本文關(guān)鍵詞：對(duì)芯片工業(yè)生產(chǎn)中缺陷降低方法的研究　出處：《湖北工業(yè)大學(xué)》2017年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 芯片 缺陷檢測(cè) 缺陷自動(dòng)檢測(cè)設(shè)備

【摘要】：隨著人類的發(fā)展和科技的進(jìn)步,集成電路芯片工業(yè)生產(chǎn)的發(fā)展極其迅速。最近的幾十年中,硅基半導(dǎo)體的應(yīng)用大大促進(jìn)了現(xiàn)代社會(huì)生產(chǎn)力水平的快速發(fā)展,如超大規(guī)模集成電路的發(fā)明和發(fā)展引發(fā)了各行各業(yè)日新月異的技術(shù)進(jìn)步,人們的物質(zhì)文化水平也因之產(chǎn)生了深刻的變化。30多年來,計(jì)算機(jī)的性能提高了1萬倍,價(jià)格卻降至當(dāng)初的萬分之一。晶體管數(shù)量的增加是通過不斷縮小晶體管的線寬來實(shí)現(xiàn)的,晶體管的線寬先后從20世紀(jì)90年代的0.5微米、0.35微米、0.25微米、0.18微米一直發(fā)展到目前的90納米及以下的工藝。而在整個(gè)集成電路芯片工業(yè)生產(chǎn)過程中,缺陷檢測(cè)和改善是個(gè)重要問題,關(guān)系著產(chǎn)品良品率和公司的生計(jì)。及時(shí)發(fā)現(xiàn)并改善問題,縮小影響面,并掌握基礎(chǔ)缺陷狀況,這是一套優(yōu)秀的缺陷檢測(cè)系統(tǒng)必須做到的。本文主要研究缺陷檢測(cè)系統(tǒng)的工具和方法,包括了缺陷檢測(cè)設(shè)備KLA和AIT的原理和方法,擴(kuò)展到缺陷分析方法,趨勢(shì)圖,缺陷庫(kù)及指定時(shí)間設(shè)備缺陷監(jiān)控系統(tǒng),研究缺陷分析及改善優(yōu)化。經(jīng)過研究,取得了預(yù)期的結(jié)果,并在實(shí)際工業(yè)生產(chǎn)中發(fā)揮了巨大的作用。運(yùn)用所掌握的檢測(cè)方法及系統(tǒng)資源,對(duì)幾個(gè)異常缺陷模式進(jìn)行了實(shí)戰(zhàn)性的處理。合理的檢測(cè)及有效的方法,能在提高整體工作效率的同時(shí),也加快對(duì)缺陷的反饋速度和對(duì)重點(diǎn)機(jī)臺(tái)的缺陷監(jiān)控。
[Abstract]:With the development of human and the progress of science and technology, the development of integrated circuit chip industry is extremely rapid. In recent decades, the application of silicon based semiconductor greatly promoted the rapid development of modern social productivity level, such as the invention and development of large scale integrated circuit technology progress in all walks of life led to change rapidly, people's material and cultural level also because of the profound changes. For more than 30 years, the performance of computers has increased by 10 thousand times, and the price has dropped to 1/10000. The increase of transistors is achieved by reducing the linewidth of transistors. The linewidth of transistors has grown from 0.5 microns, 0.35 microns, 0.25 microns, and 0.18 microns in 1990s to the current technology of 90 nm and below. In the whole IC chip industrial production process, defect detection and improvement is an important issue, which is related to the good product rate and the company's livelihood. Timely detection and improvement of the problem, reduce the impact surface, and master the condition of basic defects, this is a set of excellent defect detection system must be done. This paper mainly studies the tools and methods of defect detection system, including the principles and methods of defect detection devices KLA and AIT. It extends to the defect analysis method, trend chart, defect library and designated time equipment defect monitoring system, and studies defect analysis and optimization. After research, the expected results have been obtained, and it has played a great role in the actual industrial production. Using the method and system resources mastered, several abnormal defect modes are dealt with in actual combat. Reasonable detection and effective methods can improve the efficiency of the whole work and speed up the feedback speed of the defect and monitor the defects of the key machine.
【學(xué)位授予單位】：湖北工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類號(hào)】：TN405

【參考文獻(xiàn)】

相關(guān)期刊論文 前10條

1 熊光潔;馬樹元;武思遠(yuǎn);聶學(xué)俊;湯曉華;;新型高密度電路板的自動(dòng)光學(xué)檢測(cè)系統(tǒng)設(shè)計(jì)[J];計(jì)算機(jī)工程與設(shè)計(jì);2011年09期

2 陳偉權(quán);李本亮;賈明輝;;缺陷引起的可靠性和成品率關(guān)系研究[J];現(xiàn)代電子技術(shù);2011年02期

3 張曉情;李沛林;王敬松;楊建紅;;PECVD淀積Si_3N_4作為光刻掩膜版的保護(hù)膜[J];半導(dǎo)體技術(shù);2009年11期

4 金紅杰;都二華;俞凱旋;;半導(dǎo)體芯片PCM測(cè)試技術(shù)的應(yīng)用研究[J];微電子學(xué)與計(jì)算機(jī);2009年06期

5 雒曉軍;;明場(chǎng)缺陷檢測(cè)機(jī)臺(tái)的發(fā)展及其在32/45nm技術(shù)中的應(yīng)用[J];集成電路應(yīng)用;2009年05期

6 Scott Jansen;Stephen Fox;Glenn Florence;Alexa Perry;;設(shè)計(jì)信息提高SEM缺陷檢測(cè)取樣效率[J];集成電路應(yīng)用;2008年10期

7 Ray Thomas;Paul Melville;;元器件損傷以及失效風(fēng)險(xiǎn)評(píng)估[J];集成電路應(yīng)用;2008年09期

8 Andrew Stamper;Sang Chong;Kourosh Nafisi;Petra Feichtinger;WeeTeck Chia ;David Randall;Aneesh Khullar;;在SEM上進(jìn)行晶片檢測(cè)程式優(yōu)化的新方法[J];集成電路應(yīng)用;2008年05期

9 王志華;;走在成品率前沿的KLA-Tencor[J];集成電路應(yīng)用;2008年04期

10 姚達(dá);劉欣;岳世忠;;半導(dǎo)體光刻技術(shù)及設(shè)備的發(fā)展趨勢(shì)[J];半導(dǎo)體技術(shù);2008年03期

相關(guān)碩士學(xué)位論文 前1條

1 楊琦;紫外像增強(qiáng)器視場(chǎng)缺陷檢測(cè)技術(shù)研究[D];南京理工大學(xué);2011年

，

本文編號(hào)：1347073