【摘要】：光學(xué)系統(tǒng)對光學(xué)平面面型精度的要求越來越高,對其相應(yīng)的檢測技術(shù)也提出了更加苛刻的要求。在光學(xué)平面檢測中,傳統(tǒng)的利用干涉儀直接對平面進(jìn)行檢測屬于相對檢測,檢測精度很大程度上依賴平面標(biāo)準(zhǔn)鏡面型。一般來說,其檢測精度為λ/20—λ/50,而對于更高要求的檢測精度則需要通過絕對檢測技術(shù)實(shí)現(xiàn)。絕對檢測技術(shù)通過對光學(xué)平面進(jìn)行多次檢測,能夠有效的去除參考標(biāo)準(zhǔn)鏡的面型影響,并還原被測平面的面型,實(shí)現(xiàn)高精度的面型檢測�；赯ernike擬合的三平面互檢法是在傳統(tǒng)三平面互檢法的基礎(chǔ)上所建立的一種的絕對檢測技術(shù),由于其操作簡便且精度較高而作為常用的絕對檢測方法。該方法所還原的平面面型理論上滿足納米級絕對檢測要求。在實(shí)際檢測中存在著檢測隨機(jī)誤差和系統(tǒng)誤差。本文以基于Zernike多項(xiàng)式擬合三平面互檢法為研究核心,針對其在檢測過程中所存在的上述誤差源進(jìn)行分類研究。其隨機(jī)誤差主要包括了測量環(huán)境溫度和濕度對干涉腔腔長及被測平面的誤差影響,系統(tǒng)誤差主要包括在檢測過程中存在的標(biāo)準(zhǔn)平面與被測平面光軸偏離、被測平面旋轉(zhuǎn)角度偏離及相對檢測結(jié)果面積截取等影響。對于系統(tǒng)隨機(jī)誤差,通過研究后對納米級絕對檢測所需實(shí)驗(yàn)環(huán)境的溫度、濕度及干涉腔腔長進(jìn)行了標(biāo)定;而對于系統(tǒng)誤差,則分析了不同偏離值對于絕對檢測結(jié)果的誤差影響。并在進(jìn)行了測量環(huán)境和絕對檢測算法的標(biāo)定之后,通過實(shí)驗(yàn)驗(yàn)證了系統(tǒng)誤差對于該絕對檢測技術(shù)的影響。通過理論分析及實(shí)驗(yàn)驗(yàn)證,標(biāo)準(zhǔn)平面與被測平面的光軸偏離對Zernike多項(xiàng)式三平面互檢法檢測精度的誤差影響最大,此外實(shí)驗(yàn)環(huán)境溫度、腔長設(shè)定、旋轉(zhuǎn)角度偏離及相對檢測結(jié)果面積截取比均對檢測結(jié)果存在誤差影響。為了保證納米級精度要求,在控制實(shí)驗(yàn)環(huán)境溫差小于0.2℃條件下將腔長設(shè)為0.02m,并需要在檢測中控制光軸偏離小于2個像素,旋轉(zhuǎn)角度偏離小于1°,將面積截取比設(shè)置為95%。
[Abstract]:The requirements of optical system for the accuracy of optical plane profile are getting higher and higher, and the corresponding detection technology is also put forward more stringent requirements. In optical plane detection, the traditional use of interferometer to detect the plane directly belongs to the relative detection, and the detection accuracy depends to a large extent on the plane standard mirror type. Generally speaking, the detection accuracy is 位 / 20-位 / 50, while the higher detection accuracy needs to be realized by absolute detection technology. By detecting the optical plane many times, the absolute detection technology can effectively remove the influence of the surface shape of the reference standard mirror, reduce the surface shape of the measured plane, and realize the high precision surface detection. The three-plane mutual detection method based on Zernike fitting is an absolute detection technique based on the traditional three-plane mutual detection method, which is used as a common absolute detection method because of its simple operation and high accuracy. The plane surface reduced by this method theoretically meets the requirements of nanometer absolute detection. There are random errors and systematic errors in practical detection. In this paper, the three-plane mutual detection method based on Zernike multinomial fitting is taken as the research core, and the above error sources existing in the detection process are classified and studied. The random error mainly includes the influence of measuring ambient temperature and humidity on the cavity length and the measured plane, and the systematic error mainly includes the deviation between the standard plane and the optical axis of the measured plane, the deviation of the rotation angle of the measured plane and the interception of the relative detection result area. For the random error of the system, the temperature, humidity and cavity length of the experimental environment needed for nanometer absolute detection are calibrated, while for the system error, the effects of different deviation values on the absolute detection results are analyzed. After calibrating the measurement environment and absolute detection algorithm, the influence of system error on the absolute detection technology is verified by experiments. Through theoretical analysis and experimental results, it is proved that the deviation of optical axis between the standard plane and the measured plane has the greatest influence on the detection accuracy of Zernike multinomial triplane mutual detection method. In addition, the temperature of the experimental environment, the setting of cavity length, the deviation of rotation angle and the area interception ratio of the relative detection results all have error effects on the detection results. In order to ensure the accuracy of nanometer level, the cavity length is set to 0.02m under the condition of controlling the temperature difference of the experimental environment less than 0.2 鈩，

本文編號：2508007