【摘要】：傳統(tǒng)光學(xué)成像系統(tǒng)存在衍射極限,其本質(zhì)是由于攜帶物體亞波長結(jié)構(gòu)的光場信息由倏逝波攜帶,由于倏逝波在成像過程當(dāng)中的指數(shù)型衰減特性,使得光學(xué)顯微鏡的分辨率一直在半個照明波長左右。近些年來,隨著表面等離子體光學(xué)的發(fā)展,可以實(shí)現(xiàn)操縱倏逝波參與到成像過程中去,為超分辨成像及超分辨光刻的研究提供了重要依據(jù)。本文開展了關(guān)于提升超分辨成像與光刻分辨率的方法研究,設(shè)計(jì)了表面等離子體共振腔結(jié)構(gòu),實(shí)現(xiàn)了倏逝波信息在成像過程當(dāng)中的放大和增強(qiáng)傳輸,進(jìn)而突破衍射極限,提升成像分辨率。圍繞表面等離子體共振腔結(jié)構(gòu),本文主要研究了以下兩方面內(nèi)容:實(shí)現(xiàn)透明位相型物體的遠(yuǎn)場超分辨相襯成像;結(jié)合SP波照明結(jié)構(gòu)拓展接觸式光刻工作距,提升光刻分辨率。論文的主要成果如下:1、開展了對于透明位相型物體的遠(yuǎn)場超分辨相襯成像的行為與理論研究。分析了Hyperlens的相襯成像原理,設(shè)計(jì)了基于表面等離子體共振腔的Hyperlens結(jié)構(gòu)用于實(shí)現(xiàn)透明物體相襯成像對比度的進(jìn)一步提升。數(shù)值計(jì)算模擬證明了該結(jié)構(gòu)在365nm波長入射下可以實(shí)現(xiàn)半周期為λ/10的分辨率,并且折射率差分辨率可以達(dá)到0.15。2、介紹了表面等離子體波的激發(fā)方式,并且開展了表面等離子體共振腔對于分辨力提升的原理分析。設(shè)計(jì)了基于表面等離子體共振腔的SP波照明光刻結(jié)構(gòu),實(shí)現(xiàn)了分辨力增強(qiáng)以及拓展工作距的效果,其半周期的分辨率可以達(dá)到32nm。并且在特征尺寸為60nm的光柵掩模圖形中,可以將其空氣工作距拓展到120nm,是傳統(tǒng)近場光刻技術(shù)的十倍左右。同時,相對于傳統(tǒng)棱鏡浸沒離軸照明光刻技術(shù),進(jìn)一步改善了光柵圖形成像的均勻性。
[Abstract]:There is diffraction limit in traditional optical imaging system, the essence of which is that the information of light field carrying subwavelength structure of object is carried by evanescent wave and the exponential attenuation characteristic of evanescent wave in imaging process. The resolution of the optical microscope is always about half the illuminating wavelength. In recent years, with the development of surface plasma optics, it is possible to control evanescent waves to participate in the imaging process, which provides an important basis for the study of super-resolution imaging and super-resolution lithography. In this paper, the methods of raising super-resolution imaging and photolithographic resolution are studied, and the structure of surface plasmon resonance cavity is designed to amplify and enhance the propagation of evanescent wave information in the imaging process, thus breaking through the diffraction limit. Enhance imaging resolution. Focusing on the structure of the surface plasmon resonance cavity, this paper mainly studies the following two aspects: to realize the far-field super-resolution phase contrast imaging of transparent phase objects; to expand the contact lithography working distance and improve the lithographic resolution by combining the SP wave illumination structure. The main achievements of this paper are as follows: 1. The behavior and theory of far-field super-resolution phase contrast imaging for transparent phase objects are studied. The principle of phase contrast imaging of Hyperlens is analyzed and the Hyperlens structure based on surface plasmon resonance cavity is designed to further enhance the contrast of phase contrast imaging of transparent objects. Numerical simulation shows that the structure can achieve a half-period 位 / 10 resolution at 365nm wavelength incidence, and the resolution of refractive index difference can reach 0.15.2. The excitation mode of surface plasma wave is introduced. The principle of the resolution enhancement in the surface plasmon resonance cavity is analyzed. The SP wave illumination lithography structure based on the surface plasmon resonance cavity is designed. The resolution is enhanced and the working distance is extended. The half-period resolution can reach 32nmm. In the grating mask pattern with feature size of 60nm, the air working distance can be extended to 120 nm, which is about ten times that of the traditional near-field lithography. At the same time, compared with the traditional prism immersion off-axis illumination lithography technology, the image uniformity of grating image is further improved.
【學(xué)位授予單位】：中國科學(xué)院大學(xué)(中國科學(xué)院光電技術(shù)研究所)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2017
【分類號】：O53

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