用結(jié)構(gòu)色無損檢測光柵占空比的初步探索
本文選題:衍射效 切入點(diǎn):率 出處:《中國科學(xué)技術(shù)大學(xué)》2017年碩士論文 論文類型:學(xué)位論文
【摘要】:本論文的主要研究工作是基于嚴(yán)格耦合波的結(jié)構(gòu)色檢測光柵結(jié)構(gòu)參數(shù)的方法,主要分為理論計(jì)算和多層介質(zhì)膜光柵的參數(shù)測量兩個(gè)部分。在快點(diǎn)火系統(tǒng)中約束著系統(tǒng)性能的主要參數(shù)是多層介質(zhì)膜光柵的衍射效率。考慮到光柵制作工藝中圖形多步轉(zhuǎn)移中的不確定因素,目前缺少無損檢測的手段對(duì)正式光柵制作工藝過程進(jìn)行有效可靠的檢測,本文的重點(diǎn)工作是提出了基于結(jié)構(gòu)色的無損檢測方法來測量光柵的參數(shù)。一、給出了基于結(jié)構(gòu)色檢測光柵參數(shù)的基本原理和思路,詳細(xì)的介紹了嚴(yán)格耦合波來求解周期性結(jié)構(gòu)的衍射效率的方法,分析了光源光譜和光柵衍射效率擬合成結(jié)構(gòu)色的方法,給出了具體的步驟和實(shí)現(xiàn)代碼,其中計(jì)算程序考慮了多維周期性結(jié)構(gòu)和錐角衍射等因素。二、分析了光源的參數(shù)(偏振和半高寬)以及光柵的參數(shù)對(duì)結(jié)構(gòu)色的影響,其中光柵的參數(shù)包括了線密度,柵線高度,占空比,光柵形貌等等。給出的結(jié)論包括:光柵線密度在1740線每毫米時(shí),對(duì)應(yīng)的結(jié)構(gòu)色對(duì)線密度變化不敏感;光柵柵線高度在300nm左右時(shí),較小的柵線高度可以引起結(jié)構(gòu)色較大的改變。三、給出了線密度為1740線每毫米的多層介質(zhì)膜光柵的占空比檢測實(shí)驗(yàn)結(jié)果,分別在顯微鏡測量系統(tǒng)和光譜儀測量系統(tǒng)中進(jìn)行了討論。給出了顯微鏡測量系統(tǒng)中測量占空比的絕對(duì)誤差在13%到20%和光譜檢測系統(tǒng)中測量占空比的絕對(duì)誤差在3%到20%。本文的研究結(jié)果表明,基于結(jié)構(gòu)色檢測光柵占空比的方法可行,但是存在一定的誤差。在文章的后續(xù)工作中給出了今后改進(jìn)的方向。
[Abstract]:The main research work of this thesis is the method of structure color detection of grating structure parameters based on strictly coupled wave. It is mainly divided into two parts: theoretical calculation and parameter measurement of multilayer dielectric film grating. The main parameter constraining the system performance in the fast ignition system is the diffraction efficiency of the multilayer dielectric film grating. The uncertain factors in multi-step transfer, At present, there is a lack of the means of nondestructive testing for the effective and reliable detection of the formal grating fabrication process. The key work of this paper is to propose a nondestructive testing method based on structure color to measure the parameters of the grating. In this paper, the basic principle and train of thought of grating parameters based on structural color detection are given. The method of calculating diffraction efficiency of periodic structure by strictly coupled wave is introduced in detail, and the method of light source spectrum and diffraction efficiency of grating to synthesize structure color is analyzed. The specific steps and implementation codes are given, in which the multi-dimensional periodic structure and cone angle diffraction are taken into account in the calculation program. Secondly, the influence of the parameters of the light source (polarization and half maximum width) and the parameters of the grating on the structure color is analyzed. The grating parameters include linear density, grating height, duty cycle, grating morphology and so on. The conclusions are as follows: when the grating linear density is 1740 lines per millimeter, the corresponding structure color is not sensitive to the change of linear density; When the grating gate height is about 300nm, the smaller grating height can cause a great change in structure color. Third, the duty cycle of the multilayer dielectric film grating with a linear density of 1740 lines per millimeter is obtained. It is discussed in microscope measurement system and spectrometer measurement system respectively. The absolute error of duty cycle measured in microscope measurement system is 13% to 20%, and absolute duty cycle error in spectrum detection system is 3%. The results of this paper show that, The method of detecting the duty cycle of grating based on structure color is feasible, but there are some errors. In the following work of this paper, the direction of improvement is given.
【學(xué)位授予單位】:中國科學(xué)技術(shù)大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2017
【分類號(hào)】:TN25
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