紫外活化過(guò)硫酸鈉去除水體中的三氯卡班
發(fā)布時(shí)間:2018-09-06 11:47
【摘要】:采用紫外活化過(guò)硫酸鈉(UV/PS)降解三氯卡班(TCC).考察了UV、PS和UV/PS聯(lián)用工藝去除TCC的效果,研究了PS投加量、反應(yīng)初始p H值和腐殖酸(HA)等因素對(duì)UV/PS降解TCC的影響,推測(cè)了UV/PS工藝中TCC可能的降解途徑,并對(duì)比了UV/PS和UV/H2O2工藝對(duì)TCC的去除效果和經(jīng)濟(jì)性.研究表明:UV與PS聯(lián)用能夠高效去除TCC,其降解過(guò)程符合擬一級(jí)動(dòng)力學(xué)模型(R~2≥0.95);擬一級(jí)反應(yīng)速率常數(shù)k隨著PS投加量的增加先增大再減小,在PS投加量為250μmol/L時(shí),k達(dá)到最大值0.0810min~(-1);偏酸性條件(p H=6.0)有利于TCC的降解;HA對(duì)TCC的降解有抑制作用,抑制作用與HA的濃度呈正相關(guān);GC/MS鑒定表明,TCC降解過(guò)程中主要的中間產(chǎn)物有異氰酸4-氯苯酯和對(duì)氯苯胺,其可能的降解途徑為T(mén)CC分子結(jié)構(gòu)中與酮羰基相連的C-N鍵斷裂,脫氯,經(jīng)過(guò)一系列的反應(yīng)形成對(duì)氯苯胺和異氰酸4-氯苯酯;UV/PS降解TCC過(guò)程中溶液中脫氯反應(yīng)導(dǎo)致Cl~-濃度增加;與UV/H_2O_2工藝相比,相同條件下UV/PS工藝中k值增大了96.65%,單位電能消耗量提高了97%.
[Abstract]:Degradation of (TCC). By UV activated sodium persulfate (UV/PS) The effects of PS dosage, initial pH value of reaction and humic acid (HA) on the degradation of TCC by UV,PS and UV/PS were investigated, and the possible degradation pathway of TCC in UV/PS process was deduced. The removal efficiency and economy of TCC by UV/PS and UV/H2O2 were compared. The results show that the degradation process of TCC, can be efficiently removed by the combination of 1: UV and PS. The degradation process accords with the pseudo-first-order kinetic model (R _ (2) 鈮,
本文編號(hào):2226255
[Abstract]:Degradation of (TCC). By UV activated sodium persulfate (UV/PS) The effects of PS dosage, initial pH value of reaction and humic acid (HA) on the degradation of TCC by UV,PS and UV/PS were investigated, and the possible degradation pathway of TCC in UV/PS process was deduced. The removal efficiency and economy of TCC by UV/PS and UV/H2O2 were compared. The results show that the degradation process of TCC, can be efficiently removed by the combination of 1: UV and PS. The degradation process accords with the pseudo-first-order kinetic model (R _ (2) 鈮,
本文編號(hào):2226255
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