發(fā)布時(shí)間：2018-01-05 02:10

  本文關(guān)鍵詞：鐵酸鋅基印跡復(fù)合光催化劑的制備及其在選擇性降解環(huán)丙沙星殘留中的應(yīng)用研究　出處：《江蘇大學(xué)》2017年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 環(huán)丙沙星殘留 ZnFe_2O_4 印跡光催化劑 選擇性 光催化降解

【摘要】：環(huán)丙沙星殘留對(duì)生態(tài)環(huán)境危害巨大,使病源細(xì)菌產(chǎn)生抗藥性,從而使環(huán)丙沙星對(duì)其失去功效,嚴(yán)重威脅著人類健康和社會(huì)的可持續(xù)發(fā)展。同時(shí),這種污染物在環(huán)境中通常是以微量或痕量的形式存在,但卻含有高毒性特點(diǎn)。光催化技術(shù)以半導(dǎo)體為催化劑,光為能量,將有機(jī)污染物礦化為H2O,CO2和其他無(wú)毒無(wú)害的小分子,是一種高效、無(wú)污染、低成本的高級(jí)氧化技術(shù)。ZnFe_2O_4,常見(jiàn)的磁性半導(dǎo)體光催化材料,具有禁帶寬度較窄、光化學(xué)性能穩(wěn)定以及磁分離性能優(yōu)異等特點(diǎn),促使其在光催化領(lǐng)域中占有重要一席之地。此外,通過(guò)分子印跡技術(shù)制備的分子印跡聚合物可以提供專一性吸附能力,其能夠?qū)h(huán)境中微量或痕量的污染物優(yōu)先吸附在催化劑的表面;且聚合物性質(zhì)穩(wěn)定、合成成本低、易于大量制備。因此,本論文中結(jié)合光催化技術(shù)和分子印跡技術(shù)的優(yōu)點(diǎn),制備出對(duì)特定污染物具有高效選擇性去除能力的印跡光催化劑,并考察不同合成因素合成的印跡光催化劑對(duì)環(huán)丙沙星的去除效果。本工作主要包含以下三個(gè)方面的內(nèi)容:(1)通過(guò)浸漬煅燒法制備ZnFe_2O_4@ZnO光催化劑并以其作為載體,再利用分子印跡技術(shù)包覆一層傳統(tǒng)印跡聚合物,制備出Zn Fe_2O_4@ZnO印跡復(fù)合光催化劑。利用XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS、氮?dú)馕?脫附實(shí)驗(yàn)、XPS和ESR技術(shù)對(duì)催化劑的形貌、結(jié)構(gòu)及性能進(jìn)行測(cè)試。此外,還詳細(xì)的考察了不同ZnO復(fù)合量和不同單體加入量對(duì)印跡光催化劑的影響。最后,分別對(duì)比恩諾沙星和5-磺基水楊酸,考察Zn Fe_2O_4@Zn O印跡復(fù)合光催化劑對(duì)環(huán)丙沙星的選擇性降解效果。(2)通過(guò)溶劑熱法制備ZnFe_2O_4,再在其表面包覆一層導(dǎo)電印跡聚合物層,制備出ZnFe_2O_4/PPy印跡復(fù)合光催化劑。通過(guò)XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS和氮?dú)馕?脫附實(shí)驗(yàn)對(duì)制得的光催化劑的形貌、結(jié)構(gòu)及性能進(jìn)行了系統(tǒng)表征。此外,還詳細(xì)考察了不同單體聚合時(shí)間和單體含量對(duì)ZnFe_2O_4/PPy印跡復(fù)合光催化劑的影響,探討了其選擇性光催化降解應(yīng)用,并闡明了其選擇性光催化反應(yīng)機(jī)理。(3)通過(guò)溶劑熱-煅燒法和分子印跡技術(shù)制備出了具有選擇性光催化降解能力的ZnFe_2O_4-Ag/PATP印跡復(fù)合光催化劑,并通過(guò)XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS、氮?dú)馕?脫附實(shí)驗(yàn)和XPS對(duì)制得的光催化劑進(jìn)行了系統(tǒng)表征。此外,還詳細(xì)考察了不同Ag含量和不同單體含量對(duì)印跡光催化劑的影響。同時(shí),分別對(duì)比恩諾沙星和5-磺基水楊酸,探討了Zn Fe_2O_4-Ag/PATP印跡復(fù)合光催化劑對(duì)環(huán)丙沙星的選擇性降解效果。最后,探討了該印跡光催化劑對(duì)環(huán)丙沙星的選擇性光催化降解機(jī)理。
[Abstract]:Ciprofloxacin great harm to the ecological environment, the pathogenic bacteria resistant to ciprofloxacin, thereby lose efficacy of the serious threat to human health and sustainable development of the society. At the same time, the pollutants in the environment is usually to trace the exist in the form, but with high toxicity. The photocatalytic technology for catalyst in the semiconductor, light energy, the mineralization of organic pollutants as H2O, CO2 and other small molecules, non-toxic and harmless, is an efficient, pollution-free, low cost.ZnFe_2O_4 advanced oxidation technology, magnetic semiconductor photocatalytic materials commonly, with narrow band gap, photochemical properties of stability and magnetic separation performance characteristics the important, a space for one person in the field of photocatalytic. In addition, the molecularly imprinted polymer was prepared by molecular imprinting technique can provide specific adsorption capacity, it can The pollutants in the environment trace is preferentially adsorbed on the surface of the catalyst; and the polymer properties of stability, low synthesis cost, easy mass production. Therefore, this paper combines the advantages of photocatalytic technology and molecular imprinting technique, preparation of imprinted photocatalyst with highly selective removal of specific contaminants, and the effects of removal the effect of ciprofloxacin imprinted photocatalysts with different synthesis synthesis factors. This work mainly includes the following three aspects: (1) ZnFe_2O_4@ZnO was prepared by impregnation calcination catalyst and its carrier, and molecular imprinting technology by coating a layer of traditional imprinted polymer, preparation of Zn composite photocatalyst. Using Fe_2O_4@ZnO blot XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS, nitrogen adsorption desorption experiment, the morphology of XPS and ESR technology of catalyst, structure and properties were tested. In addition, also with the effects of different amount of ZnO composite and different monomer amount on the imprinted photocatalyst. Finally, respectively enrofloxacin and 5- sulfosalicylic acid, the effects of Zn Fe_2O_4@Zn O imprinted composite photocatalyst on ciprofloxacin selective degradation effect. (2) the preparation of ZnFe_2O_4 by solvothermal method, and then coated with a layer of conductive polymer layer on the surface, the preparation of ZnFe_2O_4/PPy imprinted composite photocatalyst. Through XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS and N2 adsorption desorption experiments of the prepared photocatalyst morphology, structure and properties were systematically characterized. In addition also, the effects of polymerization time with different monomer and monomer content of ZnFe_2O_4/PPy imprinted composite photocatalyst, discusses the application of selective photocatalytic degradation, and expounds its selective photocatalytic reaction mechanism. (3) by solvent thermal forging Burning method and molecular imprinting technique to fabricate ZnFe_2O_4-Ag/PATP imprinted composite photocatalyst with selective photocatalytic degradation ability, and through XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS, nitrogen adsorption desorption and XPS on the catalyst were characterized. In addition, also with the effects of different Ag content and monomer content on the imprinted photocatalyst. At the same time, respectively enrofloxacin and 5- sulfosalicylic acid, discusses Zn Fe_2O_4-Ag/PATP imprinted composite photocatalyst on ciprofloxacin selective degradation effect. Finally, discusses the imprinted photocatalyst on selective catalytic ciprofloxacin the degradation mechanism.

【學(xué)位授予單位】：江蘇大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類號(hào)】：X52;O643.36

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本文編號(hào)：1381097