本文選題：TiN + 常壓化學(xué)氣相沉積法　； 參考：《浙江大學(xué)》2011年碩士論文

【摘要】：當(dāng)前能源危機(jī)日益嚴(yán)重,具有優(yōu)異節(jié)能效果的高效節(jié)能鍍膜玻璃引起了廣泛研究興趣。但該玻璃目前大部分是多層復(fù)合結(jié)構(gòu),主要采用離線鍍膜技術(shù),不利于普遍使用。本論文嘗試以常壓化學(xué)氣相沉積法,在玻璃片上沉積TiN薄膜,旨在研制能夠與浮法玻璃生產(chǎn)線兼容的單層高效節(jié)能薄膜。 以TiCl4和NH3為反應(yīng)物,以N2為保護(hù)氣,用常壓化學(xué)氣相沉積法在玻璃基板上沉積TiN薄膜。運(yùn)用XRD、EDX、SEM和UV-Vis分光光度計(jì)等測(cè)試手段,研究了制備參數(shù)(沉積溫度、時(shí)間和冷卻方式)和熱處理參數(shù)(熱處理溫度、時(shí)間和氣氛)對(duì)薄膜化學(xué)成分、形貌和光電性能的影響,以調(diào)整其低輻射和陽(yáng)光控制功能。 研究發(fā)現(xiàn)TiN薄膜的成膜溫度高于500℃,沉積時(shí)間大于1 min時(shí)開始出現(xiàn)結(jié)晶,且表現(xiàn)出(200)晶面取向生長(zhǎng)。升高沉積溫度、延長(zhǎng)沉積時(shí)間和真空冷卻都能改善結(jié)晶性能,降低N/Ti,改善導(dǎo)電性,提高平均中遠(yuǎn)紅外反射率,即增強(qiáng)低輻射功能。而適中的沉積溫度、長(zhǎng)反應(yīng)時(shí)間和氮?dú)饫鋮s能提高薄膜陽(yáng)光控制功能。當(dāng)沉積溫度在600℃,沉積時(shí)間為90s,氮?dú)饫鋮s時(shí)薄膜能較好綜合低輻射功能和陽(yáng)光控制功能：平均中遠(yuǎn)紅外反射率為55%,平均近紅外反射率達(dá)到60%左右,可見光透過率為8%左右。此外,還發(fā)現(xiàn)高溫和長(zhǎng)時(shí)間反應(yīng)會(huì)降低可見光反射率,這對(duì)解決節(jié)能鍍膜玻璃應(yīng)用上存在的光污染問題具有重要意義。 為了進(jìn)一步改善薄膜光電性能,本研究對(duì)TiN薄膜進(jìn)行熱處理,結(jié)果顯示：熱處理后薄膜的結(jié)晶性能得到改善,N含量減少,晶格常數(shù)減小,應(yīng)力和缺陷得到改善,導(dǎo)電性能變好,平均中遠(yuǎn)紅外反射率從50%幾增加到70%以上,平均近紅外反射率從25%左右增大到37%。這說明熱處理工藝能夠加強(qiáng)薄膜的低輻射功能和陽(yáng)光控制功能,使得薄膜更好的兼具保溫和隔熱。但是熱處理溫度和時(shí)間進(jìn)一步增加,部分TiN被氧化,薄膜的各項(xiàng)性能變差。
[Abstract]:Nowadays, the energy crisis is becoming more and more serious, and the high-efficiency energy-saving coated glass with excellent energy-saving effect has attracted extensive research interest. However, most of the glass is multilayer composite structure at present, which mainly adopts off-line coating technology, which is not suitable for general use. In this paper, TiN thin films were deposited on glass substrates by atmospheric pressure chemical vapor deposition. The purpose of this thesis is to develop a single layer high efficiency energy saving thin film which can be compatible with float glass production line. TiN thin films were deposited on glass substrates by atmospheric pressure chemical vapor deposition with TiCl4 and NH3 as reactants and N2 as protective gas. The effects of preparation parameters (deposition temperature, time and cooling mode) and heat treatment parameters (heat treatment temperature, time and atmosphere) on the chemical composition, morphology and optoelectronic properties of the films were studied by means of UV-Vis spectrophotometer and SEM. To adjust its low radiation and sunlight control functions. It is found that when the temperature of TiN film is higher than 500 鈩，

本文編號(hào)：1957723