本文選題：羥基磷灰石 + 無(wú)定形磷酸鈣�。� 參考：《浙江大學(xué)》2011年碩士論文

【摘要】：本文利用電化學(xué)恒電位沉積方法在金屬鈦表面制備了含硅羥基磷灰石(Si-HA)和無(wú)定形磷酸鈣(Si-ACP)及其復(fù)合涂層,研究了不同的Si元素含量對(duì)涂層微結(jié)構(gòu)和性能的影響,并對(duì)涂層制備過(guò)程和影響機(jī)理進(jìn)行了探討。實(shí)驗(yàn)采用電化學(xué)恒電位方法,工作電壓為3V,沉積時(shí)間為1h。涂層用掃描電子顯微鏡(SEM)、X射線衍射法(XRD)、紅外光譜(FTIR)、分析電感耦合等離子體原子發(fā)射光譜(ICP-AES)等分析測(cè)試方法分別對(duì)涂層成分、結(jié)構(gòu)、形貌進(jìn)行表征。 1)在含有Ca2+,P043-以及Si032-的電解液中,溫度為85℃的條件下沉積,于鈦表面上制得Si-HA涂層。分析結(jié)果表明：電化學(xué)恒電位方法可制得Si飽和含量為0.55wt.%左右的Si-HA涂層,si以Si044-形式取代P043-進(jìn)入HA晶格,造成羥基磷灰石中OH-減小以維持電荷平衡。另外,電解液中Si元素的存在抑制涂層中HA晶體的生長(zhǎng),使涂層變薄,且當(dāng)電解液中Si/(Si+P)達(dá)到20%時(shí)Si-HA晶體形貌由單獨(dú)的棒狀轉(zhuǎn)變?yōu)楦肯噙B的樹枝狀。 2)在添加檸檬酸鈉和硅酸鈉的Ca-P電解液中,通過(guò)電化學(xué)沉積,于60℃的環(huán)境中在鈦基體上制得Si-ACP涂層。實(shí)驗(yàn)結(jié)果表明：電解液中添加檸檬酸可促進(jìn)ACP的形成,添加硅酸鈉可使ACP涂層均勻化,Si-ACP涂層中Si元素含量并未按照預(yù)定比例進(jìn)入涂層,Si-ACP涂層中的Ca/P比維持在1.8左右,涂層Si元素未出現(xiàn)飽和狀態(tài),隨電解液中Si元素的增加,涂層中的Si/P值上升且涂層中ACP球形顆粒的尺寸減小。 3)在85℃的條件下,在有檸檬酸鈉和硅酸鈉的Ca-P電解液中一步可制備ACP與HA共存的復(fù)合涂層。先沉積ACP,然后ACP直接向HA轉(zhuǎn)變,轉(zhuǎn)變機(jī)理為表面調(diào)節(jié)機(jī)制,中間未出現(xiàn)其他前軀體,且電解液中Si元素含量越多,復(fù)合涂層的HA相對(duì)含量越少。另外,通過(guò)在鈦金屬表面先沉積一層Si-HA晶體,再沉積一層Si-ACP,兩步可獲得HA與ACP相互融合的復(fù)合涂層,凝膠狀的ACP填充在HA晶體的空隙中,與一步法不同的是,在第二步ACP的沉積工藝中,Si元素的含量越多ACP相對(duì)量反而越少。
[Abstract]:Silicon hydroxyapatite (Si-HA) and amorphous calcium phosphate (Si-ACP) and their composite coatings were prepared on the surface of titanium by electrochemical potentiostatic deposition. The effects of different Si content on the microstructure and properties of the coatings were studied. The preparation process and influence mechanism of the coating were also discussed. The electrochemical potentiostatic method was used, the working voltage was 3 V and the deposition time was 1 h. The composition, structure and morphology of the coating were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), FTIR spectroscopy (FTIR) and ICP-AES- (inductively coupled plasma atomic emission spectrometry). 1) in the electrolyte containing Ca2 P043- and Si032-, the Si-HA coating was prepared on the surface of titanium by deposition at 85 鈩，

本文編號(hào)：1894613