光配向PI固烤時間與曝光能量對LCD光學及殘影的影響
發(fā)布時間:2018-03-31 06:28
本文選題:光配向 切入點:固烤時間 出處:《液晶與顯示》2017年08期
【摘要】:采用光配向技術使PI獲得配向能力并制得IPS型LCD,通過AOI光學自動檢測設備以及DMS光學測量系統(tǒng)對在不同PI固烤時間和UV曝光能量下獲得樣品的預傾角、對比度及穿透率進行了量測,并研究了各條件下樣品的殘影(Image Sticking)性能。結果顯示:在900~2 700s,400~600mJ/cm~2范圍內,固烤時間和曝光能量對LCD光學性能影響較小,但對殘影性能影響較大,IS隨曝光量增大有惡化的趨勢,且該趨勢在高亞胺化程度下趨于平緩;調整固烤時間及曝光能量可以獲得較佳的殘影性能,固烤時間1 800s,曝光能量400~500mJ/cm~2條件的LCD殘影性能較佳。
[Abstract]:The IPS type LCD was obtained by using the optical matching technique. The predip angle of the sample was obtained under different Pi curing time and UV exposure energy by the AOI optical automatic detection equipment and the DMS optical measurement system. The contrast and penetration were measured, and the residual image Sticking properties of the samples were studied under various conditions. The results showed that in the range of 900U 2 700sL 400mJ / cm ~ (2), the effect of curing time and exposure energy on the optical properties of LCD was relatively small. However, it has a tendency to deteriorate with the increase of exposure, and the trend tends to be gentle under the high imidization degree, and the better residual image performance can be obtained by adjusting the curing time and exposure energy. Solid baking time 1 800 s, exposure energy 400~500mJ/cm~2 condition of LCD residual performance is better.
【作者單位】: 昆山龍騰光電有限公司;
【分類號】:TN873
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本文編號:1689555
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