PS-VA模式中RM殘留量對信賴性的影響(英文)
發(fā)布時間:2018-03-29 23:41
本文選題:PS-VA 切入點:殘像 出處:《液晶與顯示》2017年10期
【摘要】:PSVA技術(shù)已經(jīng)廣泛應用于電視技術(shù),但是殘像問題仍然沒有解決,為了改善PS-VA電視屏的IS表現(xiàn),本文通過UV1和UV2制程影響RM來研究RM的殘留量與IS表現(xiàn)的關(guān)系,結(jié)果表明RM殘留量和IS有很強的相關(guān)性。眾所周知,離子濃度是IS問題的關(guān)鍵因素,基于分析RM殘留量和離子濃度的關(guān)系,我們開了一種改善PS-VA模式IS問題的新技術(shù),另外,本文提出通過設計新的母體混晶材料,使PS-VA制程后液晶具有更低RM殘留量來改善IS問題,同時通過大量的測試數(shù)據(jù)驗證改善效果,其中離子濃度由Toyo6254測試,通過SEM和AFM來分析表面形態(tài)。
[Abstract]:PSVA technology has been widely used in television technology, but the problem of residual image has not been solved. In order to improve the is performance of PS-VA TV screen, this paper studies the relationship between RM residue and is performance by UV1 and UV2 process. The results show that there is a strong correlation between RM residue and is. As we all know, ion concentration is the key factor of is problem. Based on the analysis of the relationship between RM residue and ion concentration, we have developed a new technique to improve the is problem of PS-VA mode. In this paper, we propose to improve the is problem by designing a new matrix mixed crystal material so that the liquid crystal after PS-VA process has lower RM residue. At the same time, the improvement effect is verified by a large number of test data, in which the ion concentration is measured by Toyo6254. Surface morphology was analyzed by SEM and AFM.
【作者單位】: 河北省平板顯示材料工程技術(shù)研究中心/石家莊誠志永華顯示材料有限公司;深圳華星光電技術(shù)有限公司;
【分類號】:TN873
【相似文獻】
相關(guān)期刊論文 前3條
1 海豚;;用手機欣賞大片——RM格式電影制作[J];電腦愛好者(普及版);2008年08期
2 安亞軍;將RM一450CE編輯控制器由2對1升檔為3對1編輯控制器[J];有線電視技術(shù);1999年02期
3 士心;;直播RM 三星YP-CP3[J];數(shù)碼先鋒;2009年10期
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