退火溫度對(duì)溶膠-凝膠法制備氧化鋯薄膜性能影響的研究
發(fā)布時(shí)間:2018-10-09 10:53
【摘要】:采用溶膠-凝膠法,在316L不銹鋼基底上以5 cm/min的提拉速度制備氧化鋯(ZrO_2)薄膜。用XRD分析了不同退火溫度下制備的氧化鋯干凝膠粉末的物相結(jié)構(gòu);采用掃描電鏡觀察了薄膜表面的顯微結(jié)構(gòu);對(duì)比了不同退火溫度對(duì)薄膜親/疏水性能的影響;通過計(jì)算薄膜的表面能及其與血液組分的界面張力,分析了退火溫度對(duì)氧化鋯薄膜血液相容性的影響;測(cè)試了試樣的動(dòng)電位極化曲線并分析其耐腐蝕性能。結(jié)果表明:采用500℃退火可以得到晶粒顆粒小、表面平整的四方相結(jié)構(gòu)氧化鋯薄膜,其與血液相容性最好,耐腐蝕性較強(qiáng)。
[Abstract]:Zirconia (ZrO_2) thin films were prepared on a 316L stainless steel substrate by sol-gel method at a Czochralski rate of 5 cm/min. The phase structure of zirconia xerogel powder prepared at different annealing temperatures was analyzed by XRD, the microstructure of the film surface was observed by scanning electron microscope, and the effect of annealing temperature on the hydrophilic / hydrophobic properties of the film was compared. The effect of annealing temperature on the blood compatibility of zirconia film was analyzed by calculating the surface energy and the interfacial tension between the film and the blood component. The potentiodynamic polarization curve of the sample was measured and its corrosion resistance was analyzed. The results show that the tetragonal structure zirconia thin film with small grain size and flat surface can be obtained by annealing at 500 鈩,
本文編號(hào):2259071
[Abstract]:Zirconia (ZrO_2) thin films were prepared on a 316L stainless steel substrate by sol-gel method at a Czochralski rate of 5 cm/min. The phase structure of zirconia xerogel powder prepared at different annealing temperatures was analyzed by XRD, the microstructure of the film surface was observed by scanning electron microscope, and the effect of annealing temperature on the hydrophilic / hydrophobic properties of the film was compared. The effect of annealing temperature on the blood compatibility of zirconia film was analyzed by calculating the surface energy and the interfacial tension between the film and the blood component. The potentiodynamic polarization curve of the sample was measured and its corrosion resistance was analyzed. The results show that the tetragonal structure zirconia thin film with small grain size and flat surface can be obtained by annealing at 500 鈩,
本文編號(hào):2259071
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