外加交流電場(chǎng)對(duì)薄液膜中氧擴(kuò)散的影響
發(fā)布時(shí)間:2018-06-13 00:29
本文選題:計(jì)時(shí)電流法 + 大氣腐蝕 ; 參考:《中國(guó)腐蝕與防護(hù)學(xué)報(bào)》2015年06期
【摘要】:采用計(jì)時(shí)電流法測(cè)定了交流電場(chǎng)作用下O_2在薄液膜中的擴(kuò)散系數(shù)�?疾炝擞�(jì)時(shí)電流法測(cè)定氧擴(kuò)散系數(shù)這一方法在薄液膜體系和電場(chǎng)環(huán)境下應(yīng)用的可行性,研究了薄液膜體系中液膜厚度以及外加電場(chǎng)對(duì)氧擴(kuò)散系數(shù)的影響。結(jié)果表明,O的擴(kuò)散系數(shù)隨著薄液膜厚度的減小而增大,隨著交流電場(chǎng)強(qiáng)度的增強(qiáng)而增大。交流電場(chǎng)對(duì)O擴(kuò)散系數(shù)的影響可能是其加速了O通過(guò)氣/液界面到達(dá)電極表面的過(guò)程。薄的液膜和強(qiáng)的電場(chǎng)會(huì)加快金屬腐蝕的陰極過(guò)程中O的傳輸,從而加速金屬腐蝕。
[Abstract]:The diffusion coefficient of O _ 2 in thin liquid film was measured by chronoamperometric method. The feasibility of measuring oxygen diffusion coefficient by chronoamperometric method in thin liquid film system and electric field environment was investigated. The effects of liquid film thickness and applied electric field on oxygen diffusion coefficient in thin liquid film system were studied. The results show that the diffusion coefficient of O increases with the decrease of thin liquid film thickness and increases with the increase of AC electric field intensity. The effect of AC field on the diffusion coefficient of O may be due to the acceleration of the process of O reaching the electrode surface through the gas / liquid interface. Thin liquid film and strong electric field can accelerate O transport in the cathodic process of metal corrosion, thus accelerating metal corrosion.
【作者單位】: 上海電力學(xué)院上海市電力材料防護(hù)與新材料重點(diǎn)實(shí)驗(yàn)室;上海中挪海事有限公司;
【基金】:國(guó)家自然科學(xué)基金項(xiàng)目(51271110) 上海市教委科研創(chuàng)新重點(diǎn)項(xiàng)目(12ZZ170)資助
【分類(lèi)號(hào)】:TG174.4
【相似文獻(xiàn)】
相關(guān)期刊論文 前10條
1 嚴(yán)忠;丁tD才;劉福彥;;用液膜技術(shù)提取鉻、汞[J];環(huán)境科學(xué);1982年02期
2 吳子生;許國(guó)良;嚴(yán)忠;;液膜穩(wěn)定性的研究(Ⅰ)——電容法測(cè)液膜的厚度[J];東北師大學(xué)報(bào)(自然科學(xué)版);1985年02期
3 林嘉,
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