脈沖偏壓對304不銹鋼表面多弧離子鍍CrAlN薄膜結構和耐蝕性能的影響
發(fā)布時間:2018-05-20 18:37
本文選題:CrAlN薄膜 + 多弧離子鍍; 參考:《材料保護》2015年10期
【摘要】:目前,鮮見有關脈沖偏壓對多弧離子鍍Cr Al N薄膜耐蝕性能影響的報道。以不同的脈沖偏壓在304不銹鋼表面多弧離子鍍Cr Al N薄膜。采用掃描電鏡、顯微鏡、X射線衍射儀、硬度儀、粗糙度儀分析了Cr Al N薄膜的表面形貌、相結構、硬度、表面粗糙度及耐蝕性能,分析了脈沖偏壓對相關性能的影響。結果表明:隨著脈沖偏壓幅值的增大,Cr Al N薄膜表面大顆粒及凹坑尺寸和數(shù)量減少,薄膜質量提高;Cr Al N薄膜主要由(Cr,Al)N相組成,隨著偏壓增加,Cr Al N薄膜出現(xiàn)(220)擇優(yōu)取向;Cr Al N薄膜表面粗糙度隨脈沖偏壓增大而減小,顯微硬度隨脈沖偏壓的增大而增大;Cr Al N薄膜在3.5%Na Cl溶液中的耐蝕性隨著脈沖偏壓的增大而增大,脈沖偏壓為400 V時,Cr Al N薄膜與基體304不銹鋼的腐蝕速率之比為0.34,薄膜的綜合性能最好。
[Abstract]:At present, there are few reports about the effect of pulse bias on the corrosion resistance of multi-arc ion plating Cr Al N films. Cr Al N thin films were deposited on 304 stainless steel by multi-arc ion plating with different pulse bias voltage. The surface morphology, phase structure, hardness, surface roughness and corrosion resistance of Cr Al N thin films were analyzed by means of scanning electron microscope, microscope X-ray diffractometer, hardness tester and roughness instrument. The results show that with the increase of pulse bias amplitude, the size and number of large particles and pits on the surface of Cr Al N films decrease, and the improvement of the film quality is mainly composed of CrAlN phase. With the increase of bias voltage, the surface roughness of Cr Al N films decreases with the increase of pulse bias. The corrosion resistance of Cr Al N films in 3.5%Na Cl solution increases with the increase of pulse bias voltage. When the pulse bias voltage is 400 V, the ratio of corrosion rate of Cr Al N film to 304 stainless steel substrate is 0.34, and the comprehensive properties of the film are the best.
【作者單位】: 遼寧工程技術大學材料科學與工程學院;
【分類號】:TG174.44
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,本文編號:1915786
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