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多弧離子鍍制備TiAlN-Cu多層膜的組織結(jié)構(gòu)和性能研究

發(fā)布時(shí)間:2017-12-27 18:32

  本文關(guān)鍵詞:多弧離子鍍制備TiAlN-Cu多層膜的組織結(jié)構(gòu)和性能研究 出處:《燕山大學(xué)》2015年碩士論文 論文類(lèi)型:學(xué)位論文


  更多相關(guān)文章: 硬質(zhì)薄膜 TiAlN-Cu多層膜 多弧離子鍍 Hall-Petch


【摘要】:在傳統(tǒng)的硬質(zhì)薄膜中Ti Al N由于具有高硬度、高溫抗氧化性(800℃)和高溫?zé)岱(wěn)定性(達(dá)1470℃)已取代了Ti N薄膜,并廣泛應(yīng)用于機(jī)械領(lǐng)域中的刀具、模具和切削工具等部件上。Cu由于具有優(yōu)良的塑性和延展性常加入到薄膜中以改善薄膜的綜合性能。為了提高Ti Al N薄膜的綜合力學(xué)性能,本課題在Ti Al N薄膜中加入不同厚度的Cu層,研究Cu層在Ti Al N-Cu多層膜中所起的作用,并與Ti Al N薄膜相比較,薄膜的硬度、膜基結(jié)合強(qiáng)度、韌性以及耐磨性是否有所提高。為了揭示多層膜的強(qiáng)韌化機(jī)制和耐磨性,對(duì)不同厚度Cu層的Ti Al N-Cu多層膜力學(xué)性能和摩擦磨損性能的影響進(jìn)行了研究,并從理論上分析了Cu層厚度對(duì)多層膜綜合性能的影響。本課題采用BY-DH-4A型多弧離子鍍?cè)O(shè)備進(jìn)行沉積制備薄膜,首先試驗(yàn)出沉積Ti Al N薄膜最優(yōu)參數(shù)。采用Ti Al合金靶和Cu磁過(guò)濾靶交替沉積制備Ti Al N-Cu多層膜,為了提高薄膜膜基結(jié)合力,在襯底與薄膜之間增加一薄層Ti Al過(guò)渡層。選擇實(shí)驗(yàn)參數(shù):脈沖偏壓為-100V,靶電流為90A,進(jìn)行沉積Ti Al N-Cu多層膜,沉積Ti Al N在N2放電條件下,其工作氣壓為0.5Pa,沉積Cu層在Ar放電條件下,工作氣壓為0.3Pa,制備的Ti Al N-Cu多層膜為三層膜結(jié)構(gòu),Cu為中間層。通過(guò)實(shí)驗(yàn)研究和理論分析,多層膜結(jié)構(gòu)可以影響薄膜的內(nèi)殘余應(yīng)力,進(jìn)而影響薄膜的硬度、膜基結(jié)合強(qiáng)度等力學(xué)性能。本論文對(duì)Ti Al N薄膜和不同Cu層厚度Ti Al N-Cu多層膜的力學(xué)性能研究表明,當(dāng)Cu層厚度在81nm時(shí),Ti Al N-Cu多層膜硬度值最高,當(dāng)Cu層厚度大于81nm時(shí),Ti Al N-Cu多層膜硬度反而迅速下降,低于Ti Al N薄膜硬度。根據(jù)納米多層結(jié)構(gòu)效應(yīng),當(dāng)調(diào)制層厚(λ)在納米范圍內(nèi),材料強(qiáng)度不遵循Hall-Petch公式,材料硬度會(huì)達(dá)到一峰值,之后隨著厚度增加硬度迅速下降;而當(dāng)調(diào)制層厚在微米范圍內(nèi),材料強(qiáng)度遵循Hall-Petch公式。Cu層厚度也是影響Ti Al N-Cu多層膜力學(xué)性能的關(guān)鍵因素之一。當(dāng)增加的Cu層厚度在納米范圍內(nèi)時(shí)Ti Al N-Cu多層膜的硬度比Ti Al N薄膜有硬度優(yōu)勢(shì)。本實(shí)驗(yàn)測(cè)得Ti Al N-Cu多層膜在韌性、膜基結(jié)合強(qiáng)度上都高于Ti Al N薄膜。本實(shí)驗(yàn)還測(cè)得Ti Al N-Cu多層膜的表面粗糙度臨界值。根據(jù)Ti Al N-Cu多層膜表面粗糙度與摩擦系數(shù)的關(guān)系可得到Ti Al N-Cu表面粗糙度的臨界值為0.12μm,符合Svahn等人的研究結(jié)論,低于這個(gè)臨界值,表面粗糙度對(duì)薄膜的摩擦系數(shù)影響不大,而高于這個(gè)臨界值,表面粗糙度對(duì)薄膜的摩擦系數(shù)影響很大。本論文還研究了Ti Al N薄膜和不同Cu層厚度Ti Al N-Cu多層膜的摩擦磨損性能。研究發(fā)現(xiàn)不同Cu層厚度的Ti Al N-Cu多層膜有不同的結(jié)合力也有不同的磨損類(lèi)型。當(dāng)Cu層厚度大于108nm,Ti Al N-Cu多層膜的磨損率低于單一Ti Al N薄膜的磨損率,有更好的耐磨性。根據(jù)涂層膜基結(jié)合力的高低對(duì)應(yīng)著不同的摩擦副和磨損類(lèi)型可知:結(jié)合力最高硬度值最低的Ti Al N-Cu多層膜有著最低摩擦系數(shù)和磨損率,對(duì)應(yīng)粘著磨損;結(jié)合力與硬度值居中的Ti Al N-Cu多層膜屬于疲勞磨損類(lèi)型;而結(jié)合力較低硬度值最高的Ti Al N-Cu多層膜有著最高的摩擦系數(shù)和磨損率,對(duì)應(yīng)三體磨粒磨損;而Ti Al N薄膜由于其表面脫落的Ti Al N硬質(zhì)顆粒以及低的結(jié)合力所以磨痕屬于磨粒磨損和粘著磨損的混合磨損。通過(guò)本課題的研究,通過(guò)適當(dāng)加入Cu層中間層可以改變單一Ti Al N薄膜機(jī)械性能。當(dāng)Cu層厚度在納米尺寸內(nèi),Ti Al N-Cu多層膜的硬度增高。Cu層厚度在100nm范圍的Ti Al N-Cu多層膜的膜基結(jié)合力、韌性以及耐磨性要遠(yuǎn)遠(yuǎn)好于單一的Ti Al N薄膜。這對(duì)以后實(shí)際生產(chǎn)和機(jī)械領(lǐng)域中的應(yīng)用,比如刀具、模具及切削工具等部件使用,有很好的利用和參考價(jià)值,以及對(duì)研究多層膜的結(jié)構(gòu)和性能有重要的研究?jī)r(jià)值。
[Abstract]:In traditional hard films, Ti Al N has been replaced by Ti N thin films because of its high hardness, high temperature oxidation resistance (800 degree) and high temperature thermal stability (up to 1470 degrees C), and is widely used in cutting tools, dies and cutting tools in mechanical industry. Because of its excellent plasticity and ductility, Cu is often added to the film to improve the comprehensive performance of the film. In order to improve the comprehensive mechanical properties of N thin films Ti Al Cu, this paper with different thickness in Ti Al N in the film, study the role of Cu in the Ti Al N-Cu layer in the multilayer film, and compared with the Ti Al N film, film based film hardness, bonding strength, toughness and wear resistance is whether increased. In order to reveal the toughening mechanism and wear resistance of multi-layer films, the effects of different thickness of Cu layer on the mechanical properties and friction and wear properties of Ti Al N-Cu multilayer films were studied, and the influence of the thickness of Cu layer on the comprehensive properties of multilayer films was theoretically analyzed. In this study, the BY-DH-4A type multi arc ion plating equipment was used to prepare the deposited film. First, the optimum parameters for the deposition of Ti Al N film were tested. Ti Al N-Cu multilayer films were prepared by alternating deposition of Ti Al alloy targets and Cu magnetic filter targets. In order to improve the adhesion force of the film substrate, a thin layer Ti Al transition layer was added between the substrate and the film. Selection of experimental parameters: pulse voltage is -100V, the target current is 90A, Ti Al N-Cu multilayer film deposition, deposition of Ti Al N in N2 discharge conditions, the working pressure is 0.5Pa, the deposition of Cu layer in Ar discharge conditions, the working pressure is 0.3Pa, the Ti Al N-Cu multilayer films prepared for the three film the structure, Cu as the middle layer. Through experimental research and theoretical analysis, the multilayer membrane structure can affect the residual stress inside the film, and further affect the mechanical properties of the film, such as the hardness and the adhesion strength of the film. This paper studies on the mechanical properties of Ti Al N films and different thickness of Cu layer Ti Al N-Cu multilayers show that when the thickness of Cu layer in 81nm, Ti Al N-Cu multilayer film hardness is highest, when the Cu layer thickness is greater than 81nm, the Ti Al N-Cu multilayer film hardness but decreased rapidly, is lower than the hardness of Ti Al N films. According to the multilayer structure effect, when the modulation layer thickness (lambda) in the range of nanometer materials, strength does not follow the Hall-Petch formula, the hardness of the material will reach a peak, then decreased rapidly with the increasing thickness of hardness; and when the modulation layer thickness in the micrometer range, the strength of the material follows the Hall-Petch formula. The thickness of Cu layer is also one of the key factors affecting the mechanical properties of Ti Al N-Cu multilayer. The hardness of the Ti Al N-Cu multilayer film is better than that of the Ti Al N film when the thickness of the increased Cu layer is in the nanometer range. In this experiment, the Ti Al N-Cu multilayer film is higher than the Ti Al N film in the toughness and bond strength of the membrane. The critical value of the surface roughness of the Ti Al N-Cu multilayer film is also measured in this experiment. According to the Ti Al N-Cu multilayer film surface roughness and friction coefficient of the relationship can be Ti Al N-Cu the critical value of surface roughness of 0.12 m, with the conclusion of Svahn et al, below the critical value of surface roughness has little effect on the film friction coefficient, and higher than the critical value, the surface roughness has great influence the degree of the film coefficient of friction. The friction and wear properties of Ti Al N films and Ti Al N-Cu multilayer films with different Cu layer thickness are also studied in this paper. It is found that Ti Al N-Cu multilayer films with different thickness of Cu layer have different binding forces and different wear types. When the thickness of Cu layer is greater than that of 108nm, the wear rate of Ti Al N-Cu multilayer film is lower than that of single Ti Al N film, and it has better wear resistance. According to the coating adhesion level of the corresponding side friction and wear type shows different binding force: the highest hardness Ti Al N-Cu multilayer film has the lowest friction coefficient and the wear rate is the lowest, the corresponding adhesive wear; a combination of strength and hardness of Ti Al N-Cu multilayer film center belongs to the type of fatigue wear and adhesion; low hardness Ti Al N-Cu multilayer film has the highest friction coefficient and wear rate of the highest, the corresponding abrasive wear; and the Ti Al N film because of its Ti Al N off the surface of hard particles and low adhesion so worn are abrasive wear and adhesive wear mixed wear. Through the study of this subject, the mechanical properties of single Ti Al N film can be changed by proper addition of the middle layer of the Cu layer. When the thickness of the Cu layer is in the nanoscale size, the hardness of the Ti Al N-Cu multilayer film is increased. The bonding force, toughness and wear resistance of the Ti Al N-Cu multilayer with the thickness of Cu layer in the 100nm range are much better than that of a single Ti Al N film. This will be of great value for future production and application in mechanical field, such as cutting tools, dies and cutting tools, and has important research value for studying the structure and performance of multilayers.
【學(xué)位授予單位】:燕山大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2015
【分類(lèi)號(hào)】:TG174.4

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