沉積時間對電解鎳微觀組織結(jié)構(gòu)的影響
發(fā)布時間:2018-04-11 11:21
本文選題:電解鎳 + 表面形貌 ; 參考:《材料熱處理學(xué)報》2016年02期
【摘要】:采用XRD和SEM研究了電沉積時間對電解鎳的擇優(yōu)生長方向、晶粒大小、表面形貌和截面組織的影響。結(jié)果表明,隨著電沉積時間的延長,電解鎳的晶體生長方向會發(fā)生變化,由最初的(111)(200)面織構(gòu)變?yōu)?6 h后的(220)面織構(gòu);隨著沉積過程的進(jìn)行,電解鎳的微觀表面形貌由棱錐狀慢慢變?yōu)榘麪?生長機(jī)制由開始時的螺旋位錯生長變?yōu)槔鄯e長大機(jī)制;電解鎳的橫截面組織由細(xì)晶粒層和較粗大晶粒層構(gòu)成,屬于非均勻沉積層,大部分晶粒呈柱狀生長,并且垂直于始極片,晶粒大小沿沉積厚度呈階梯狀分布。
[Abstract]:The effect of electrodeposition time on the preferred growth direction, grain size, surface morphology and cross section microstructure of electrolytic nickel was investigated by XRD and SEM.The results show that with the prolongation of electrodeposition time, the crystal growth direction of electrolytic nickel will change, from the initial texture of the surface to the texture of the crystal after 16 hours, and with the process of deposition, the crystal growth direction of electrolytic nickel will change, and the crystal growth direction of electrolytic nickel will be changed with the increase of the electrodeposition time.The microstructure of electrolytic nickel gradually changed from pyramidal to cellular, the growth mechanism changed from spiral dislocation growth to cumulative growth mechanism, and the cross section structure of electrolytic nickel was composed of fine grain layer and coarse grain layer.Most of the grains are columnar and perpendicular to the initial plate, and the grain size is a ladder distribution along the thickness of the deposit.
【作者單位】: 蘭州理工大學(xué)省部共建有色金屬先進(jìn)加工與再利用國家重點(diǎn)實(shí)驗(yàn)室;蘭州理工大學(xué)材料科學(xué)與工程學(xué)院;
【基金】:金昌市青年人才基金(jrc2015-76)
【分類號】:TG174.4
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1 王凌;吳燕;;ICP-AES測定電解鎳中的雜質(zhì)元素[J];光譜實(shí)驗(yàn)室;2013年03期
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