本文選題：氯硅烷殘液 + 酸性水解��； 參考：《無機鹽工業(yè)》2017年08期

【摘要】：以氯硅烷殘液為原料,鹽酸為水解劑制備二氧化硅,探討了鹽酸濃度、反應溫度、Si O2濃度對水解體系膠凝時間的影響,從而確定了適宜的水解條件:鹽酸初始濃度為10%(質(zhì)量分數(shù))、二氧化硅質(zhì)量分數(shù)為2%、反應溫度為35℃。利用XRF、XRD、SEM、激光粒度分析儀、IR、TG-DSC-MS對所制備的Si O2的化學組成、相組成、形貌、粒徑、化學結構、熱穩(wěn)定性進行測試和表征。結果表明,氯硅烷殘液酸性水解制備的Si O2為非晶態(tài),純度達90%以上,平均粒徑為34.5μm,加熱后質(zhì)量損失率為1.9%,具有成為橡膠補強Rd的潛力。
[Abstract]:Silica was prepared from chlorosilane residue solution and hydrochloric acid as hydrolysis agent. The effects of hydrochloric acid concentration and reaction temperature on gelation time of hydrolysis system were discussed. The optimum hydrolysis conditions were determined as follows: the initial concentration of hydrochloric acid was 10% (mass fraction), the mass fraction of silica was 2 kum, and the reaction temperature was 35 鈩，

本文編號：1932770