本文選題：金剛石 + 摩擦化學(xué)拋光�。� 參考：《大連理工大學(xué)》2016年博士論文

【摘要】：金剛石不僅是目前世界上已知材料中最硬的物質(zhì),同時(shí)也是一種兼?zhèn)涠喾N優(yōu)越的物理化學(xué)特性的高性能材料,具有很小的摩擦系數(shù)、優(yōu)異的導(dǎo)熱性能、優(yōu)良的電絕緣性、較寬的透光波段、優(yōu)秀的半導(dǎo)體特性和極強(qiáng)的化學(xué)惰性,所以不僅廣泛應(yīng)用于軍事國(guó)防、航空航天等高精尖的專業(yè)領(lǐng)域,而且在超精密加工領(lǐng)域也具有廣闊的應(yīng)用前景。隨著人造金剛石的成功研制,金剛石的使用在寬度與深度上都獲得了突飛猛進(jìn)的發(fā)展。無(wú)論是天然金剛石還是人造金剛石,在實(shí)際應(yīng)用中都需要對(duì)其進(jìn)行精密超精密加工,以使其達(dá)到各種使用要求。但是金剛石獨(dú)特且優(yōu)良的性能勢(shì)必將給其精密超精密加工造成極大的困難,已成為限制金剛石得到大量實(shí)際應(yīng)用的技術(shù)瓶頸之一,亟待解決金剛石晶體材料的高效精密超精密加工難題�，F(xiàn)有的多種金剛石材料拋光方法,無(wú)論是物理去除法還是化學(xué)去除法、接觸式還是非接觸式,都存在著各自的優(yōu)缺點(diǎn),在拋光機(jī)理、拋光速率、尺寸限制和設(shè)備要求等方面都有著很大的區(qū)別。摩擦化學(xué)拋光技術(shù)是一種利用機(jī)械和化學(xué)的協(xié)同作用促進(jìn)金剛石石墨化,實(shí)現(xiàn)金剛石材料高效去除的新方法。與傳統(tǒng)的熱化學(xué)拋光技術(shù)相比,該方法由于借助機(jī)械摩擦生熱的方式促進(jìn)金剛石石墨化,因此不需要加熱設(shè)備,以及真空或者密閉性保護(hù)氣氛,大大降低了對(duì)專用拋光設(shè)備的技術(shù)要求,是一種非常有發(fā)展前途的金剛石拋光方法。由于摩擦化學(xué)拋光技術(shù)具有高效低損傷去除的特點(diǎn),在以高效去除為主要目標(biāo)的金剛石晶體材料的粗加工領(lǐng)域具有很好的應(yīng)用前景。但由于目前有關(guān)摩擦化學(xué)拋光用拋光盤(pán)的制備與拋光機(jī)理的研究相對(duì)較少,該技術(shù)在拋光效率和拋光表面質(zhì)量等方面還存在諸多問(wèn)題。本文針對(duì)金剛石摩擦化學(xué)拋光技術(shù)中存在的問(wèn)題,提出了新型合金拋光盤(pán)配方,研究了拋光盤(pán)制備及金剛石晶體摩擦化學(xué)拋光過(guò)程中的關(guān)鍵技術(shù)及其相關(guān)理論,主要研究?jī)?nèi)容如下：(1)為了在摩擦化學(xué)拋光中提高金剛石去除率,同時(shí)減小拋光盤(pán)的磨損率,需要研制一種兼?zhèn)錁O強(qiáng)金剛石石墨化催化能力與良好理化特性的合金拋光盤(pán)。根據(jù)摩擦化學(xué)拋光材料去除原理和過(guò)渡金屬未配對(duì)d電子催化理論,并結(jié)合摩擦化學(xué)拋光技術(shù)對(duì)拋光盤(pán)材料特性的要求,設(shè)計(jì)了Fe基、Ni基、Mn基和W基四類共七種合金拋光盤(pán)配方。通過(guò)研制拋光盤(pán)并進(jìn)行拋光性能對(duì)比實(shí)驗(yàn)發(fā)現(xiàn),WMoCr合金拋光盤(pán)的綜合性能最佳,金剛石材料去除率達(dá)1.5μm/min,而拋光盤(pán)的磨損率僅為0.35 mm3/min,磨削比達(dá)23.06。在此基礎(chǔ)上,通過(guò)對(duì)合金添加稀土Y元素等措施,進(jìn)一步完善了WMoCr合金的微觀組織,提升了拋光盤(pán)的拋光性能。(2)為了提高拋光盤(pán)的綜合性能,在WMoCr合金拋光盤(pán)的制備過(guò)程中,首先利用機(jī)械合金化方法獲得預(yù)合金化良好的合金粉末,再采用真空熱壓燒結(jié)技術(shù)制得具備較高硬度和致密度的合金拋光盤(pán)。通過(guò)機(jī)械合金化工藝試驗(yàn),研究了機(jī)械合金化過(guò)程中的球磨參數(shù)對(duì)粉末性能的影響規(guī)律,得到了合理的工藝參數(shù)：球磨轉(zhuǎn)速為300rpm,球磨時(shí)間為60小時(shí),球料比為15:1和PCA含量為10%,制備了晶粒細(xì)小、組織性能優(yōu)異的預(yù)合金化粉末,為提高拋光盤(pán)的拋光性能提供了保障。在此基礎(chǔ)上,通過(guò)真空熱壓燒結(jié)試驗(yàn),研究了燒結(jié)溫度、燒結(jié)壓力和保溫時(shí)間等因素對(duì)致密度、硬度等合金材料性能的影響規(guī)律。結(jié)果表明,在燒結(jié)溫度1400℃、燒結(jié)壓力30 MPa、保溫時(shí)間30 min的條件下,所制備的WMoCr合金的性能最佳,硬度達(dá)777.78 HV、致密度達(dá)96.49%,合金材料的晶粒均勻細(xì)小、組織結(jié)合緊密而且孔隙率極小(3)利用化學(xué)反應(yīng)熱力學(xué)吉布斯能變?cè)碛懻摿藟毫蜏囟葘?duì)金剛石石墨化平衡常數(shù)的影響規(guī)律及加快反應(yīng)的措施,并以此為依據(jù),在搭建的摩擦化學(xué)拋光盤(pán)拋光性能實(shí)驗(yàn)臺(tái)上,設(shè)計(jì)了金剛石晶體材料摩擦化學(xué)拋光的單因素實(shí)驗(yàn),優(yōu)選了合理的拋光工藝參數(shù)。實(shí)驗(yàn)結(jié)果顯示,拋光壓力65 N、拋光速度8000 rpm的條件下,可以實(shí)現(xiàn)金剛石高效率高表面質(zhì)量加工,同時(shí)拋光盤(pán)的磨損率和氧化程度最低。(4)通過(guò)對(duì)摩擦化學(xué)拋光實(shí)驗(yàn)過(guò)程觀察與反應(yīng)產(chǎn)物成分的檢測(cè)分析,并結(jié)合化學(xué)反應(yīng)熱力學(xué)的基本原理,研究了金剛石摩擦化學(xué)拋光機(jī)理。通過(guò)分析拋光前后金剛石與拋光盤(pán)表面的化學(xué)成分與內(nèi)部組織的變化,研究了金剛石晶體在摩擦化學(xué)拋光中的石墨化轉(zhuǎn)化過(guò)程,發(fā)現(xiàn)了采用WMoCr合金拋光盤(pán)時(shí)特有的材料去除機(jī)理,即：除了基于石墨化與擴(kuò)散作用的材料去除外,還通過(guò)金剛石相碳與中間產(chǎn)物W03發(fā)生化學(xué)反應(yīng)生成WC來(lái)實(shí)現(xiàn)材料去除。(5)在以上工作基礎(chǔ)上,采用自行研制的WMoCr合金杯形砂輪,進(jìn)行了金剛石晶體的摩擦化學(xué)拋光實(shí)驗(yàn),并與傳統(tǒng)金剛石砂輪的對(duì)金剛石晶體的加工效果進(jìn)行對(duì)比分析,實(shí)驗(yàn)結(jié)果表明采用WMoCr合金杯形砂輪時(shí),可獲得更高的材料去除率和表面質(zhì)量。最后采用自行研制的WMoCr合金拋光盤(pán)探索了金剛石砂輪的修整方法,分析其可行性與修整效果。
[Abstract]:Diamond is not only the most hard material known in the world at present, but also a high performance material with a variety of superior physical and chemical properties. It has very small friction coefficient, excellent thermal conductivity, excellent electrical insulation, wide transmittance, excellent semiconductor characteristics and very strong chemical inertness, so it is not only widely used. The pan should be used in military defense, aerospace and other high-precision fields, and it also has broad application prospects in the field of ultra precision processing. With the successful development of artificial diamond, the use of diamond has developed rapidly in width and depth. It is necessary to make precision ultra precision machining to make it meet various requirements. However, the unique and excellent performance potential of diamond will cause great difficulty for its precision ultra precision machining. It has become one of the technical bottlenecks to limit the practical application of diamond, and it is urgent to solve the high efficiency and precision of diamond crystal material. Many of the existing polishing methods for diamond materials, whether physical removal or chemical removal, contact or non-contact, have their own advantages and disadvantages. There are great differences in polishing mechanism, polishing rate, size limitation and equipment requirements. The friction chemical polishing technology is a kind of use machine. The synergistic action of weapons and chemistry promotes the graphitization of diamond and realizes the new method of high efficiency removal of diamond materials. Compared with the traditional thermo chemical polishing technology, this method promotes the graphitization of diamond with the aid of mechanical friction and heat generation, so it does not need heating equipment, vacuum or closed protective atmosphere, which greatly reduces the effect. The technical requirements of special polishing equipment are a very promising diamond polishing method. Because of the characteristics of high efficiency and low damage removal, the friction chemical polishing technology has a good prospect in the field of rough machining of diamond crystal materials with high efficiency as the main target. The research on the preparation and polishing mechanism of the discs is relatively less. There are still many problems in the polishing efficiency and the quality of the polishing surface. In this paper, a new type of alloy discs formula is put forward in view of the problems in the diamond friction chemical polishing technology. The preparation of the discs and the friction chemical polishing of diamond crystals are studied. The key technology and related theories in the process are as follows: (1) in order to improve the diamond removal rate in the friction chemical polishing and reduce the wear rate of the discs, a kind of alloy discs with good catalytic ability and good physicochemical properties is needed to be developed. The theory of d electron catalysis is not matched with the transition metal, and the requirements of the friction chemical polishing technology to the properties of the discs are designed. A total of seven kinds of alloy discs are designed for the four kinds of alloys, such as Fe, Ni, Mn and W. By developing the discs and comparing the polishing performance, it is found that the comprehensive performance of the WMoCr alloy discs is the best. The removal rate of the material is 1.5 m/min, and the wear rate of the discs is only 0.35 mm3/min, and the grinding ratio is up to 23.06.. By adding the rare earth Y element to the alloy, the microstructure of the WMoCr alloy is further improved and the polishing performance of the discs is improved. (2) in order to improve the comprehensive performance of the discs, the preparation of the discs of the WMoCr alloy is made. In the process, the good alloy powder prealloyed by mechanical alloying is obtained first, and then the alloy discs with high hardness and density are obtained by vacuum hot pressing and sintering. Through the mechanical alloying process test, the influence law of ball milling parameters on the properties of the powder in the process of mechanical alloying is studied. The process parameters: the ball milling speed is 300rpm, the ball milling time is 60 hours, the ball material ratio is 15:1 and the PCA content is 10%. The pre alloyed powder with fine grain and excellent microstructure and properties is prepared. On this basis, the sintering temperature, the sintering pressure and the guarantee are studied through the vacuum hot press sintering test. The effect of temperature time and other factors on the properties of alloy materials such as density and hardness, and the results show that, under the conditions of sintering temperature 1400 C, sintering pressure 30 MPa and holding time 30 min, the properties of the prepared WMoCr alloy are the best, the hardness is 777.78 HV, the density is 96.49%, the grain size of the alloy material is even fine, the microstructure is tightly combined with the hole. The gap rate is very small (3) the effect of pressure and temperature on the equilibrium constant of the graphitization of diamond and the measures to expedite the reaction are discussed by the principle of chemical reaction thermodynamics Gibbs energy change. On this basis, a single factor of friction chemical polishing of diamond crystal material is designed on the experimental table of friction chemical polishing disc polishing performance. The experimental results show that the reasonable polishing process parameters are optimized. The experimental results show that the high efficiency and high surface quality processing of diamond can be achieved with the polishing pressure of 65 N and the polishing speed of 8000 rpm, and the wear rate and oxidation degree of the discs are the lowest. (4) detection and analysis of the composition of the reaction products by the experimental process of friction chemical polishing. On the basis of the basic principle of chemical reaction thermodynamics, the mechanism of diamond friction chemical polishing was studied. By analyzing the chemical composition and internal structure of the surface of diamond and discs before and after polishing, the transition process of the graphitization transformation of diamond crystal in the friction chemical polishing was studied, and the characteristic of using WMoCr alloy discs was found. The material removal mechanism is: except for the material based on the graphitization and diffusion, the chemical reaction of the diamond phase carbon and the intermediate product W03 is also produced to produce WC to realize the material removal. (5) on the basis of the above work, the friction chemical polishing experiment of the diamond crystal was carried out by using the self developed WMoCr alloy cup wheel. Compared with the traditional diamond grinding wheel, the processing effect of diamond crystal is compared and analyzed. The experimental results show that higher material removal rate and surface quality can be obtained when WMoCr alloy cup grinding wheel is used. Finally, the self developed WMoCr alloy discs are used to explore the dressing method of diamond wheel, and the feasibility and dressing effect is analyzed. Fruit.

【學(xué)位授予單位】：大連理工大學(xué)
【學(xué)位級(jí)別】：博士
【學(xué)位授予年份】：2016
【分類號(hào)】：TQ163

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8 聶傳繼;基于Marangoni效應(yīng)的數(shù)控化學(xué)拋光工藝研究[D];浙江大學(xué);2007年

9 宋曉敏;AM60鎂合金化學(xué)拋光及化學(xué)轉(zhuǎn)化膜的研究[D];湖南大學(xué);2009年

10 郭艷軍;磁力驅(qū)動(dòng)下的化學(xué)機(jī)械光整加工技術(shù)研究[D];大連理工大學(xué);2012年

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