本文選題：化學(xué)氣相沉積　切入點(diǎn)：發(fā)射光譜　出處：《真空科學(xué)與技術(shù)學(xué)報(bào)》2017年05期 　論文類型：期刊論文

【摘要】：在傳統(tǒng)的波導(dǎo)耦合微波等離子體化學(xué)氣相沉積裝置中引入雙基片結(jié)構(gòu),測(cè)量了金剛石沉積過程中的等離子體發(fā)射光譜,通過與單基片結(jié)構(gòu)對(duì)比,比較研究了雙基片對(duì)微波等離子體參數(shù)的影響。研究表明:在相同金剛石沉積參數(shù)下,雙基片結(jié)構(gòu)相比于單基片結(jié)構(gòu)下等離子體基團(tuán)強(qiáng)度更高。其中H_α基團(tuán)強(qiáng)度遠(yuǎn)高于單基片臺(tái)下H_α基團(tuán)強(qiáng)度;隨著甲烷濃度的增加,雙基片結(jié)構(gòu)下C_2基團(tuán)強(qiáng)度上升更加顯著,且在相同條件下,雙基片結(jié)構(gòu)下C_2與H_α的比值更小,有利于提高金剛石膜的質(zhì)量。此外,雙基片結(jié)構(gòu)下等離子體電子溫度較低且隨氣壓的上升而進(jìn)一步降低。
[Abstract]:In the conventional waveguide coupled microwave plasma chemical vapor deposition (MPCVD) device, the plasma emission spectra of diamond deposition process were measured by introducing the double substrate structure, and the results were compared with that of the single substrate structure. The effects of double substrates on the parameters of microwave plasma are compared. The results show that: under the same diamond deposition parameters, The strength of plasma group in double substrate structure is higher than that in single substrate structure, the strength of H _ 偽 group is much higher than that of H _ 偽 group under single substrate, and the strength of C _ 2 group increases more significantly with the increase of methane concentration. Under the same conditions, the ratio of C _ 2 to H _ 偽 is smaller in the dual-substrate structure, which is beneficial to improve the quality of diamond film. In addition, the electron temperature of the plasma in the dual-substrate structure is lower and further decreases with the increase of the pressure.
【作者單位】： 武漢工程大學(xué)材料科學(xué)與工程學(xué)院湖北省等離子體化學(xué)與新材料重點(diǎn)實(shí)驗(yàn)室;
【基金】：國家自然科學(xué)基金項(xiàng)目
【分類號(hào)】：TQ163

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