本文選題：微晶玻璃　切入點(diǎn)：氫氟酸　出處：《蘇州大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：氫氟酸酸蝕是傳統(tǒng)的用于去除玻璃反射鏡體機(jī)加工藝輕量化后殘余應(yīng)力的一種有效方法,由于傳統(tǒng)對(duì)于反射鏡體及其輕量化孔的形位公差要求都不高,因此對(duì)酸蝕工藝一直未見詳細(xì)研究。對(duì)于可用于深空科學(xué)探測和反導(dǎo)預(yù)警等國防安全事業(yè)的全低溫光學(xué)系統(tǒng),其反射鏡結(jié)構(gòu)一體件和結(jié)構(gòu)件形位公差都有較高要求,且大部分的形位公差只能靠機(jī)加工藝保證,這就要求酸蝕過程中基本不能改變微晶玻璃結(jié)構(gòu)件的形位公差,因此對(duì)于酸蝕過程中各工藝參數(shù)的影響以及保形酸蝕工藝條件進(jìn)行研究具有很重要的價(jià)值。本文以酸蝕機(jī)理為基礎(chǔ),結(jié)合實(shí)驗(yàn),證明了氫氟酸酸蝕對(duì)于微晶玻璃表面存在的裂紋,劃痕和微裂紋的影響,酸蝕有利于微晶玻璃釋放殘余應(yīng)力。同時(shí),通過實(shí)驗(yàn)分析了酸蝕工藝參數(shù)對(duì)于酸蝕的影響并提出一些優(yōu)化方法。最后,解決實(shí)際酸蝕過程中氫氟酸酸蝕大體積實(shí)驗(yàn)件上下去除量不一致的問題并且結(jié)合之前實(shí)驗(yàn)得出的工藝條件實(shí)現(xiàn)了可用于全低溫光學(xué)系統(tǒng)的微晶玻璃結(jié)構(gòu)件酸蝕前后的形位公差不變即保形。
[Abstract]:Hydrofluoric acid etching is an effective method for removing residual stress of glass reflector after light weight machining. Because of the traditional requirements for the shape and position tolerance of the mirror and its lightweight holes are not high. Therefore, the acid etching process has not been studied in detail. For the all-low temperature optical system, which can be used for deep space scientific exploration and antimissile warning, the reflector structure and the configuration tolerance of the structure are all required. And most of the tolerance of shape and position can only be guaranteed by machining, which requires that the tolerance of glass-ceramics structure can not be changed in the process of acid etching. Therefore, it is of great value to study the influence of various technological parameters and the condition of conformal acid etching in the process of acid etching. In this paper, based on the mechanism of acid etching, combined with experiments, It is proved that the effect of hydrofluoric acid etching on the cracks, scratches and microcracks on the surface of glass-ceramics is beneficial to the release of residual stress from glass-ceramics. The influence of process parameters on acid etching is analyzed experimentally and some optimization methods are put forward. In order to solve the problem of high and low removal amount of hydrofluoric acid etching large volume experimental parts in the process of actual acid etching, and combined with the process conditions obtained from previous experiments, the glass ceramics structure can be used in the whole low temperature optical system before acid etching. The shape and position tolerance after the change is conformal.
【學(xué)位授予單位】：蘇州大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TQ171.733

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