基于CFD的陶瓷靜電施釉過(guò)程的關(guān)鍵技術(shù)研究
本文關(guān)鍵詞: 靜電施釉 CFD 數(shù)值模擬 優(yōu)化分析 正交試驗(yàn) 實(shí)驗(yàn)驗(yàn)證 出處:《景德鎮(zhèn)陶瓷學(xué)院》2015年碩士論文 論文類型:學(xué)位論文
【摘要】:靜電施釉技術(shù)具有施釉效果好、節(jié)省原料、提高釉漿利用率、降低陶瓷制品廢品率、減少污染等優(yōu)點(diǎn),已得到廣泛的認(rèn)可。但是我國(guó)在陶瓷行業(yè)中,遲遲沒(méi)有得到推廣及應(yīng)用,主要原因是對(duì)靜電施釉設(shè)備原理及其霧化機(jī)理認(rèn)識(shí)不足,對(duì)靜電施釉各項(xiàng)重要工藝參數(shù)的選取優(yōu)化的同時(shí)合理匹配等問(wèn)題沒(méi)有相關(guān)經(jīng)驗(yàn)。針對(duì)以上問(wèn)題,本文圍繞靜電施釉技術(shù)進(jìn)行如下研究:(1)對(duì)靜電施釉下電壓放電機(jī)理及釉漿霧化機(jī)理進(jìn)行了研究分析;诹黧w力學(xué)CFD的流體連續(xù)性方程和動(dòng)力方程進(jìn)行分析,對(duì)釉漿在旋杯內(nèi)的運(yùn)動(dòng)進(jìn)行了研究,建立旋杯式靜電施釉中釉漿在旋杯內(nèi)運(yùn)動(dòng)及電場(chǎng)作用下對(duì)釉滴霧化影響的數(shù)學(xué)模型。(2)結(jié)合計(jì)算流體力學(xué)知識(shí),對(duì)靜電施釉系統(tǒng)進(jìn)行建模,采用分區(qū)域劃分網(wǎng)格技術(shù),對(duì)霧化模型進(jìn)行網(wǎng)格劃分。利用DPM模型來(lái)模擬釉滴,通過(guò)MHD電磁場(chǎng)力程序,用UDS加入電的方程,然后利用UDF加入電場(chǎng)對(duì)動(dòng)量方程的影響,從而通過(guò)FLUENT軟件對(duì)靜電施釉過(guò)程進(jìn)行數(shù)值模擬分析。(3)分別對(duì)電壓,釉漿壓力,釉漿粘度這三個(gè)參數(shù)對(duì)靜電施釉質(zhì)量造成的影響進(jìn)行模擬和分析,將得到靜電施釉的釉滴群靠近陶瓷制品表面時(shí)的粒徑分布和速度分布結(jié)果進(jìn)行分析,分別得到在電壓為-30KV時(shí);釉漿壓力為2.5bar;粘度為0.4Pa.s時(shí),靜電施釉質(zhì)量較好。(4)利用數(shù)理統(tǒng)計(jì)中的正交試驗(yàn)法,對(duì)電壓,供漿壓力,釉漿粘度這三個(gè)參數(shù)對(duì)靜電施釉的影響進(jìn)行綜合分析。然后分析了靜電施釉霧場(chǎng)中這三個(gè)參數(shù)對(duì)指標(biāo)因素進(jìn)行正交分析,得到這三個(gè)參數(shù)影響靜電施釉效果和效率的顯著性,得到釉漿電壓對(duì)靜電施釉的影響電壓最大,釉漿壓力次之,粘度最小,得出了在電壓為-50KV,釉漿壓力為2.5bar,釉漿粘度為0.9Pa.s情況下,靜電施釉的工藝參數(shù)配合好。(5)通過(guò)靜電施釉實(shí)驗(yàn)對(duì)電壓、供漿壓力、釉漿粘度三個(gè)影響方面仿真結(jié)果進(jìn)行驗(yàn)證,得到了在這三個(gè)工藝參數(shù)下,仿真和實(shí)驗(yàn)的結(jié)果趨勢(shì)相似。從測(cè)得的釉粒平均粒徑來(lái)看,分別得到電壓為-30KV;供漿壓力為1.91bar;釉漿粘度為0.6Pa.s時(shí)的粒徑大小和粒徑分布較好,最后綜合三個(gè)工藝參數(shù)進(jìn)行正交分析,得到最佳參數(shù)配合值(-30KV,1.91bar,0.6Pa.s)與仿真結(jié)果基本一致。本文模擬的結(jié)果為靜電施釉過(guò)程的工藝參數(shù)合理選擇奠定了理論基礎(chǔ),具有一定的參考價(jià)值。
[Abstract]:Electrostatic glazing technology has been widely recognized for its advantages of good glazing effect, saving raw materials, improving the utilization ratio of glaze slurry, reducing the waste rate of ceramic products and reducing pollution. However, in China, it has not been popularized and applied in the ceramic industry. The main reason is that the principle of electrostatic glazing equipment and its atomization mechanism are not well understood, and there is no relevant experience in selecting and optimizing the important technological parameters of electrostatic glazing at the same time as reasonable matching, etc. In view of the above problems, In this paper, the mechanism of voltage discharge under electrostatic glaze and the atomization mechanism of glaze slurry are studied and analyzed. Based on the fluid continuity equation and dynamic equation of hydrodynamics CFD, the following research on electrostatic glazing technology is carried out. In this paper, the movement of glaze slurry in rotary cup is studied, and the mathematical model of the influence of the slurry on the atomization of the glaze droplet under the action of the rotating cup and the electric field is established. The model of electrostatic glazing system is established by combining the knowledge of computational fluid mechanics. In this paper, the atomization model is meshed by using the technology of zonal grid division, the DPM model is used to simulate the glaze droplets, the electric equation is added by UDS through the MHD electromagnetic force program, and the influence of the electric field on the momentum equation is obtained by the addition of the UDF electric field. The effect of three parameters, such as voltage, slurry pressure and slurry viscosity, on the electrostatic glazing quality is simulated and analyzed by FLUENT software. The results of particle size distribution and velocity distribution of electrostatic glazed glaze droplets close to the surface of ceramic products are analyzed. The results show that when the voltage is -30 KV, the slurry pressure is 2.5 barand the viscosity is 0.4 Pa.s. The quality of electrostatic glazing is better. (4) by using the orthogonal test method in mathematical statistics, the voltage and slurry supply pressure are analyzed. The influence of these three parameters on electrostatic glazing is comprehensively analyzed, and then the orthogonal analysis of these three parameters in electrostatic glazing fog field is carried out, and the significance of these three parameters affecting the effect and efficiency of electrostatic glazing is obtained. The results show that the influence voltage of slurry voltage on electrostatic glazing is the greatest, the slurry pressure is the second, and the viscosity is the least. Under the condition of voltage -50 KV, slurry pressure 2.5 barand slurry viscosity 0.9 Pa.s, the results show that, when the voltage is -50 KV, the slurry pressure is 2.5 bar. and the slurry viscosity is 0.9Pa.s. The process parameters of electrostatic glazing are matched well. 5) through electrostatic glazing experiments, the simulation results of three aspects of voltage, slurry pressure and viscosity of glaze slurry are verified, and the results are obtained under these three technological parameters. The results of simulation and experiment are similar. According to the average particle size of glaze, the voltage is -30 KV, the supply pressure is 1.91 bar. the particle size and particle size distribution are better when the viscosity of glaze slurry is 0.6 Pa.s. finally, the three process parameters are analyzed by orthogonal analysis. The results of this paper provide a theoretical basis for the reasonable selection of the process parameters of electrostatic glazing process and have a certain reference value.
【學(xué)位授予單位】:景德鎮(zhèn)陶瓷學(xué)院
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2015
【分類號(hào)】:TQ174.641
【相似文獻(xiàn)】
相關(guān)期刊論文 前6條
1 朱振華,孫雅琴,馬云霞;Ky-1鑄造抗咬耐蝕不銹鋼研制[J];上海鋼研;1986年05期
2 張子成;;流化床反應(yīng)器的靜電與結(jié)片的消除方法[J];煉油與化工;2007年02期
3 王秀娥;關(guān)于靜電平衡導(dǎo)體表面電荷分布規(guī)律的研究[J];北京工商大學(xué)學(xué)報(bào)(自然科學(xué)版);2003年03期
4 陳克成;;靜電平衡時(shí)導(dǎo)體內(nèi)部電位與表面電位并不嚴(yán)格相等[J];撫順石油學(xué)院學(xué)報(bào);1988年01期
5 呂天雄;趙成大;;分子結(jié)合能靜電計(jì)算方法的研究[J];分子科學(xué)學(xué)報(bào);1983年02期
6 ;[J];;年期
相關(guān)重要報(bào)紙文章 前1條
1 魯東升;如何學(xué)習(xí)物理概念[N];大連日?qǐng)?bào);2005年
相關(guān)碩士學(xué)位論文 前1條
1 吳琦;基于CFD的陶瓷靜電施釉過(guò)程的關(guān)鍵技術(shù)研究[D];景德鎮(zhèn)陶瓷學(xué)院;2015年
,本文編號(hào):1550406
本文鏈接:http://sikaile.net/kejilunwen/huaxuehuagong/1550406.html