絡(luò)合劑結(jié)構(gòu)及其電極性對電鍍銀晶體生長的影響
發(fā)布時(shí)間:2018-02-27 03:02
本文關(guān)鍵詞: 絡(luò)合劑 電鍍 鍍層晶體 空間結(jié)構(gòu) 電極性 出處:《熱加工工藝》2017年18期 論文類型:期刊論文
【摘要】:以硫代硫酸鹽和四氟硼酸銀為絡(luò)合劑的主要體系,分別研究了電鍍銀的晶體生長方式與硫代硫酸、四氟硼酸根空間及電極性的關(guān)系。結(jié)果表明,在硫代硫酸鹽體系下電鍍銀晶體根據(jù)空間結(jié)構(gòu)及電極性關(guān)系按照層狀方式生長;在四氟硼酸銀體系下電鍍銀晶體根據(jù)空間結(jié)構(gòu)及電極性關(guān)系以一定的枝晶方向生長。
[Abstract]:Using thiosulfate and silver tetrafluoroborate as main complexing agents, the relationship between crystal growth mode of silver plating and space of thiosulfuric acid, tetrafluoroboric acid and electrode properties were studied. Silver electroplating crystals were grown in layered manner according to spatial structure and electrode properties in thiosulfate system, and dendritic direction in silver plating crystals in silver tetrafluoroborate system according to spatial structure and electrode properties.
【作者單位】: 昆明理工大學(xué)材料科學(xué)與工程學(xué)院;
【基金】:NSFC-云南聯(lián)合基金(U1037601)
【分類號】:O78;TQ153.16
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本文編號:1540812
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