本文選題：Bowtie孔徑結(jié)構(gòu) + 納米直寫光刻　； 參考：《光電工程》2017年02期

【摘要】：Bowtie孔徑結(jié)構(gòu)已被廣泛用于納米直寫光刻領域來獲得超衍射聚焦光斑。然而,利用該結(jié)構(gòu)獲得的超衍射聚焦光斑呈橢圓形,影響了Bowtie結(jié)構(gòu)的進一步應用。為了獲得超衍射且圓形對稱的聚焦光斑,本文提出了雙Bowtie新型納米光刻結(jié)構(gòu)并利用Comsol軟件仿真模擬了該結(jié)構(gòu)的焦斑對稱特性和電場增強特性。結(jié)果表明利用雙Bowtie結(jié)構(gòu)獲得了圓形對稱焦斑,并且出射面的電場強度得到了增強,是入射面電場強度的22倍。本文進一步將雙Bowtie結(jié)構(gòu)與金屬/介質(zhì)/金屬結(jié)構(gòu)相結(jié)合,使得局域增強后的透射光的傳輸距離(工作距)得到了顯著延長。
[Abstract]:Bowtie aperture structure has been widely used in nanocrystalline direct lithography to obtain superdiffractive focusing spot. However, the superdiffractive focusing spot obtained by this structure is elliptical, which affects the further application of Bowtie structure. In order to obtain superdiffractive and circular symmetrical focusing spot, a novel double Bowtie nanocrystalline photolithography structure is proposed in this paper. The focal spot symmetry and electric field enhancement characteristics of the structure are simulated by Comsol software. The results show that the circular symmetrical focal spot is obtained by using the double Bowtie structure, and the electric field intensity of the ejection surface is enhanced, which is 22 times of that of the incident plane. By combining the double Bowtie structure with the metal / dielectric / metal structure, the transmission distance (working distance) of the locally enhanced transmitted light is significantly prolonged.
【作者單位】： 四川師范大學物理與電子工程學院;電子科技大學光電信息學院;
【基金】：四川省教育廳重點項目(16ZA0047)
【分類號】：TN305.7;O436

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1 鄭杰;基于雙Bowtie結(jié)構(gòu)的納米直寫光刻聚焦特性研究[D];四川師范大學;2016年

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本文編號：2101914