發(fā)布時間：2018-05-05 23:36

  本文選題：高精度溫控算法 + 溫度控制　； 參考：《華中科技大學(xué)》2015年碩士論文

【摘要】：浸沒式光刻機是目前市場上最主流的高端光刻機,它通過在投影光刻機投影物鏡的最后一個鏡片與硅片之間充滿浸液來提高光刻的焦深和分辨率。浸沒式光刻機要求浸液不引入二次污染并且溫度具有高精度和高穩(wěn)定度。為了實現(xiàn)高精度和高穩(wěn)定度的浸液溫度控制,需要建立精確的浸液溫控模型和相應(yīng)的溫度控制算法。本文主要研究工作和結(jié)論如下:分析了浸液溫控的技術(shù)需求和相關(guān)約束,設(shè)計了一種調(diào)節(jié)冷卻水通過熱交換器的流量控制浸液溫度穩(wěn)定性的浸液溫控原理。該原理中通過引入旁路提升浸液流量、提高溫度穩(wěn)定性,通過支路直接純水泵增壓和流量伺服閥調(diào)流方式穩(wěn)定注液。高精度、高穩(wěn)定性溫度控制具有時滯、多擾動和非線性特征,為此本文提出了一種時滯補償,擾動抑制的串級控制結(jié)構(gòu),減小了時滯和環(huán)境擾動對溫度控制穩(wěn)定性的影響,并采用“灰色”辨識方法獲得了溫控系統(tǒng)導(dǎo)前區(qū)模型參數(shù)、惰性區(qū)模型參數(shù)和環(huán)境擾動模型。基于上述模型提出了浸液溫控算法,算法主控制器采用階梯算法,副控制器采用積分分離PI算法,擾動抑制采用前饋算法,時滯補償采用史密斯預(yù)估算法。基于Simulink對溫控算法進行了仿真分析,仿真結(jié)果表明:該溫控算法能有效補償時滯,減小超調(diào)量,并具有較好的抗干擾能力,提高了浸液溫控的穩(wěn)定性。建立了溫控算法驗證平臺,對浸液溫控算法的精度、穩(wěn)定性、魯棒性等各方面進行測試。測試數(shù)據(jù)表明,該浸液溫控算法實現(xiàn)了溫度穩(wěn)定度為22,±0.007℃@30mins,滿足浸沒式光刻機對浸液的性能需求。
[Abstract]:Immersion lithography machine is the most popular high-end lithography machine in the market at present. It can improve the focal depth and resolution of lithography by filling the solution between the last lens of the projection lens and the silicon wafer. Immersion lithography requires no secondary contamination and high temperature accuracy and stability. In order to realize the temperature control of high precision and high stability, it is necessary to establish the accurate temperature control model and the corresponding temperature control algorithm. The main work and conclusions of this paper are as follows: the technical requirements and related constraints of temperature control of leachate are analyzed, and a principle of temperature control is designed to control the temperature stability of leachate by regulating the flow rate of cooling water through heat exchanger. In this principle, the flow rate of immersion is increased by introducing bypass circuit, and the temperature stability is improved. The injection is stabilized by the way of direct pump booster and flow servo valve. The temperature control with high precision and high stability has the characteristics of delay, multi-disturbance and nonlinearity. In this paper, a cascade control structure with time-delay compensation and disturbance suppression is proposed, which reduces the influence of time delay and environmental disturbance on the stability of temperature control. The parameters of the model in front of the temperature control system, the model parameters of the inert zone and the environmental disturbance model are obtained by using the "grey" identification method. Based on the above model, a temperature control algorithm is proposed. The main controller uses step algorithm, the secondary controller adopts integral separation Pi algorithm, the disturbance suppression algorithm adopts feedforward algorithm, and the time-delay compensation adopts Smith prediction algorithm. The temperature control algorithm based on Simulink is simulated and analyzed. The simulation results show that the temperature control algorithm can effectively compensate the time delay, reduce the overshoot, and has better anti-interference ability, and improves the stability of temperature control of immersion liquid. A temperature control algorithm verification platform was established to test the accuracy, stability and robustness of the temperature control algorithm. The test data show that the temperature stability of the dipping solution is 22, 鹵0.007 鈩，

本文編號：1849744