發(fā)布時(shí)間：2018-03-06 05:23

  本文選題：光刻技術(shù)　切入點(diǎn)：數(shù)字微反射鏡　出處：《西安電子科技大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：光刻技術(shù)是集成電路制造、印刷電路板制造以及微機(jī)電元件制造等微納加工領(lǐng)域的核心技術(shù)之一。進(jìn)入21世紀(jì)以來(lái),隨著我國(guó)電子信息產(chǎn)業(yè)的高速發(fā)展,集成電路的需求出現(xiàn)了井噴式的增長(zhǎng)。由于我國(guó)光刻技術(shù)研究起步較晚,生產(chǎn)技術(shù)水平及規(guī)模遠(yuǎn)遠(yuǎn)滿足不了國(guó)內(nèi)的消費(fèi)需求,大量的集成電路依賴進(jìn)口來(lái)支撐,這已經(jīng)對(duì)國(guó)家信息安全、國(guó)防安全的建設(shè)構(gòu)成了強(qiáng)大的威脅。在傳統(tǒng)的光刻技術(shù)領(lǐng)域,國(guó)外的技術(shù)積累和專利保護(hù)措施嚴(yán)格限制了國(guó)內(nèi)相關(guān)技術(shù)的發(fā)展,使得短期內(nèi)我國(guó)很難在該領(lǐng)域獲得突破性的進(jìn)展。微光機(jī)電系統(tǒng)自出現(xiàn)以來(lái)一直受到廣泛的關(guān)注,并被當(dāng)作數(shù)字空間光調(diào)制器應(yīng)用于光刻領(lǐng)域。數(shù)字空間光調(diào)制器作為光刻系統(tǒng)中的圖形發(fā)生器,其能夠取代傳統(tǒng)光學(xué)光刻中的掩膜版,具有靈活、便捷、成本低以及生產(chǎn)效率高等特點(diǎn),在微光學(xué)元器件生產(chǎn)、集成電路及PCB制造行業(yè)表現(xiàn)出了極其廣闊的應(yīng)用前景。相比于電子束光刻、離子束光刻、紫外光刻等光刻技術(shù),數(shù)字無(wú)掩膜光刻作為新興的無(wú)掩膜光刻技術(shù),具有制造門檻低、技術(shù)壁壘少等優(yōu)勢(shì),該技術(shù)為我國(guó)突破國(guó)外光刻技術(shù)壟斷和發(fā)展具有自主知識(shí)產(chǎn)權(quán)的光刻技術(shù)帶來(lái)了新的契機(jī)。雖然基于數(shù)字空間光調(diào)制器的無(wú)掩膜光刻技術(shù)具有靈活性高、成本低、效率高等優(yōu)點(diǎn),但是系統(tǒng)中通常存在數(shù)據(jù)處理速度低以及大面積光刻對(duì)接困難等問(wèn)題。因此本文以數(shù)字無(wú)掩膜光刻系統(tǒng)為研究方向,對(duì)系統(tǒng)設(shè)計(jì)中涉及的關(guān)鍵技術(shù)進(jìn)行分析,并針對(duì)光刻系統(tǒng)中存在大面積曝光問(wèn)題提出了新的解決方案。本文首先對(duì)光刻技術(shù)做了全面的介紹,包括應(yīng)用背景、技術(shù)流程以及各種光刻技術(shù)的方法原理和優(yōu)缺點(diǎn)。然后,對(duì)數(shù)字無(wú)掩膜光刻系統(tǒng)中的關(guān)鍵元器件“數(shù)字光調(diào)制器”的結(jié)構(gòu)特點(diǎn)、電氣特性以及灰度調(diào)制的實(shí)現(xiàn)原理進(jìn)行了詳細(xì)的介紹。接著對(duì)數(shù)字無(wú)掩膜光刻系統(tǒng)中光源選擇、均光處理方案及投影物鏡的設(shè)計(jì)進(jìn)行了研究,并針對(duì)數(shù)字光刻系統(tǒng)中經(jīng)常出現(xiàn)的圖像處理速度慢及數(shù)據(jù)傳輸效率低的問(wèn)題,結(jié)合GPU及DMA技術(shù),提出一種高效圖像傳輸及高速圖像處理的架構(gòu),且在本地搭建CUDA開發(fā)環(huán)境,利用光刻圖像處理中常用的角點(diǎn)檢測(cè)算法對(duì)系統(tǒng)的數(shù)據(jù)處理性能進(jìn)行驗(yàn)證。最后,針對(duì)數(shù)字無(wú)掩膜光刻設(shè)備中大面積曝光問(wèn)題進(jìn)行深入的分析,在研究基于灰度的步進(jìn)拼接算法的基礎(chǔ)上,提出了一種掃描投影方法,該方法能夠有效解決基于灰度的步進(jìn)拼接算法中存在的曝光圖像刷新速度慢、生產(chǎn)效率低以及容易引入定位誤差等問(wèn)題。通過(guò)仿真驗(yàn)證該方法拼接效果良好,能夠有效降低曝光拼接的對(duì)位誤差。
[Abstract]:Photolithography is one of the core technologies in the fields of integrated circuit, printed circuit board and micro electromechanical components. Since 21th century, with the rapid development of electronic information industry in China, The demand for integrated circuits has increased by blowout. Since the research of lithography technology in China started relatively late, the level and scale of production technology can not meet the domestic consumer demand, and a large number of integrated circuits depend on imports to support them. This has posed a strong threat to the construction of national information security and national defense security. In the field of traditional lithography technology, technology accumulation and patent protection measures abroad have severely restricted the development of relevant domestic technologies. It is very difficult for our country to make a breakthrough in this field in the short term. As a graphic generator in lithography system, digital spatial light modulator can replace mask plate in traditional optical lithography, so it is flexible and convenient. Because of its low cost and high production efficiency, it has been widely used in the production of microoptical components, integrated circuits and PCB. Compared with electron beam lithography, ion beam lithography, ultraviolet lithography and other lithography technologies, As a new non-mask lithography technology, digital non-mask lithography has the advantages of low manufacturing threshold and low technical barriers. This technology brings a new opportunity for our country to break through the monopoly of foreign lithography technology and to develop lithography technology with independent intellectual property rights, although the non-mask lithography technology based on digital spatial light modulator has high flexibility and low cost. The efficiency is high, but there are some problems in the system, such as low data processing speed and difficult docking of large area lithography. Therefore, the key technologies involved in the system design are analyzed in this paper. A new solution to the problem of large area exposure in lithography system is put forward. Firstly, this paper gives a comprehensive introduction to lithography technology, including the application background, technical flow, method principle, advantages and disadvantages of various lithography technologies. This paper introduces in detail the structure characteristics, electrical characteristics and the realization principle of gray level modulation of the key component of digital maskless lithography system, which is the digital optical modulator. Then, the selection of light source in the digital mask free lithography system is introduced in detail. The scheme of equalizing light processing and the design of projection objective lens are studied. Aiming at the problems of slow image processing speed and low efficiency of data transmission in digital lithography system, combined with GPU and DMA technology, An efficient image transmission and high speed image processing architecture is proposed, and a local CUDA development environment is set up. The data processing performance of the system is verified by the corner detection algorithm commonly used in lithography image processing. Aiming at the problem of large area exposure in digital mask free lithography equipment, a scanning projection method is proposed on the basis of studying the algorithm of step stitching based on gray level. This method can effectively solve the problems of slow refresh speed of exposure image, low production efficiency and easy introduction of positioning error in the grayscale based step stitching algorithm. It can effectively reduce the alignment error of exposure splicing.
【學(xué)位授予單位】：西安電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN305.7

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