堿性含氟液對太陽電池用單晶硅的腐蝕機理研究
[Abstract]:The solar cell has been developed for several decades, and the crystalline silicon cell has been the mainstream of its market, and its high efficiency and low cost are its development direction. Corrosion technology (i.e., surface texture) is an important means to improve the conversion efficiency of crystalline silicon cells, but problems such as the initial formation mechanism of the pyramid and the corrosion anisotropy are still not well solved. In order to further understand the corrosion mechanism, the two kinds of corrosion system of NaOH/ NH4F and NaOH/ NH4F/ Na2CO3 were put forward, and compared with the pure NaOH solution. The corrosion-polymerization mechanism and the model of the corrosion-polymerization mechanism are put forward by the analysis of the experimental results such as the morphology, the corrosion rate and the Raman spectrum of the table. The appearance of the table, the change of the corrosion rate and the experimental phenomena in some other corrosion systems are explained. the surface of the silicon obtained by the corrosion of the pure NaOH solution is a pyramid structure, and the reflectivity is the most After the addition of the NH4F, the surface of the silicon is mainly covered with a small hill-shaped hillock, the reflectivity is high, the average is 15-16%, the corrosion rate is obviously reduced and the concentration is controlled completely, and the effect of the OH-ions is very small. Weak. Add Na2CO3, the surface hillock is a long mountain chain, the reflectance is close to the pure NaOH solution corrosion (the lowest value in the experiment is 12.85%), the corrosion rate is lower than that of the NaOH/ NH4F system. In order to further study, the Raman spectra of the three kinds of corrosion systems have been determined. The results show that the polymerization of the three kinds of corrosion system and the surface silicate of the silicon wafer is obviously changed. The degree of polymerization is the NaOH/ NH4F/ Na2CO3 system which is stronger than the NaOH/ NH4F system, and the NaOH/ NH4F system is stronger than that of the pure NaOH solution. Liquid, and no Si-F bond In this paper, based on the results of these experiments, the corrosion-poly was proposed. The theory is that the surface morphology after silicon corrosion is influenced by the polymerization of the product silicate, and the silicon oxide produced by the polymerization is formed by the pyramid, the small hill and the mountain chain. The micro-mask. In the basic fluorine-containing solution, the intermediate product of silicon corrosion is SiHxFy (OH) z, which is not stable and will eventually become There are three ways of polymerization of silicate and silicate: path1 (the reaction of the nucleophilic deprotonated triSi-O-with the neutral silicate species), the path2 (the bridging reaction of the Si-OH group) and the path3 (Si-F are directly related to Si-OH). the degree of polymerization of the product formed by the polymerization of the path1 and the path2 is low, and the path3 can occur not only when the concentration of the silicate is low, but also the degree of polymerization of the product the solution polymerization of pure naoh is carried out according to the path1 and the path2, the size of the formed micro-mask is the smallest, and the surface hillock is There are three kinds of polymerization modes of the pyramid. NaOH/ NH4F system, the size of the micro-mask is large, and the silicon surface is a strip-shaped hill. The CC032-ion can also promote the polymerization, but the addition of the pure NaOH solution can only increase the density of the pyramid, but the addition of the NaOH/ NH4F system and the F-ion can improve the degree of polymerization, so that the strip-shaped small hill becomes long. According to the change of the concentration of the reactant H2O and OH-ions in the silicon surface during the etching process and the formation of the silicon oxide mask, the corrosion-polymerization theory explains the form of the three kinds of corrosion systems in this paper. It can also explain some other experimental phenomena, such as pyramid collapse and various additives. The corrosion-polymerization theory is established in this paper based on the theory of corrosion-polymerization. The model not only explains the formation of a variety of shapes, but also explains their formation. The pyramid is a small hill formed by using a silicon oxide vertex as a mask, the oxide degree of polymerization is the lowest, and (111) the strip-shaped hillock is the highest in the density of the silicon oxide, and the plurality of silicon oxide vertices which are not easily formed are used as a mask, so (111) the strip-shaped small hills are small in strip shape, The hillock is hard to form. The small hillock is relatively easy to form with a plurality of apexes with a low silicon oxide density (111), which is relatively easy to form, and the small hillock, which is corroded by the NaOH/ NH4F system, is nearby. In addition, if the silicon oxide mask is formed on the (111) surface of the pyramid in the middle, 110) If (111) the silicon oxide on the (111) surface is formed very little, (110) the surface is small, or the silicon oxide is formed on the edge of the pyramid, the inclination of the pyramid (111) surface becomes smaller and the pyramid is extended, which explains that the inclination angle of the pyramid is less than the theoretical value 54 . The corrosion-polymerization theory and its model explain the experimental phenomena of the initial formation of the pyramid and the change of the appearance of the table in the process of corrosion and the change of the corrosion rate. The research and development of high-efficiency and low-cost silicon solar cell have laid the foundation for the research and development of high-efficiency
【學(xué)位授予單位】:昆明理工大學(xué)
【學(xué)位級別】:博士
【學(xué)位授予年份】:2014
【分類號】:TM914.4
【參考文獻】
相關(guān)期刊論文 前10條
1 李靜,吳孫桃,葉建輝,S.F.Y.Li;濕法腐蝕后硅表面形態(tài)微結(jié)構(gòu)的研究[J];微納電子技術(shù);2003年03期
2 李和委;硅的濕法化學(xué)腐蝕機理[J];半導(dǎo)體情報;1997年02期
3 姜巖峰,黃慶安,吳文剛,郝一龍,楊振川;硅在KOH中各向異性腐蝕的物理模型[J];半導(dǎo)體學(xué)報;2002年04期
4 陳勇;;硅各向異性腐蝕的計算機模擬[J];重慶工學(xué)院學(xué)報(自然科學(xué)版);2007年02期
5 謝榮國,席珍強,馬向陽,袁俊,楊德仁;用化學(xué)腐蝕制備多孔硅太陽電池減反射膜的研究[J];材料科學(xué)與工程;2002年04期
6 郭志球;柳錫運;沈輝;劉正義;;各向同性腐蝕法制備多晶硅絨面[J];材料科學(xué)與工程學(xué)報;2007年01期
7 王濤;王正志;;多晶硅太陽電池的酸腐蝕絨面技術(shù)[J];電源技術(shù);2006年12期
8 胡滿成,孟梅,高世揚,劉志宏,夏樹屏;CsCl-C_2H_5OH-H_2O三元體系多溫下平衡溶解度的研究[J];高等學(xué)校化學(xué)學(xué)報;2002年07期
9 李靜,吳孫桃,葉建輝,S.F.YLi;Si(111)濕法腐蝕后表面形態(tài)的FTIR研究[J];固體電子學(xué)研究與進展;2003年02期
10 曾毅波;王凌云;谷丹丹;孫道恒;;超聲技術(shù)在硅濕法腐蝕中的應(yīng)用[J];光學(xué)精密工程;2009年01期
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