太陽能電池硅片缺陷自動檢測分類方法研究
[Abstract]:The quality of solar cell silicon wafer is a key factor that affects the conversion efficiency of solar cell and the generation efficiency of battery module. Therefore, the quality detection of solar cell silicon wafer is particularly important in production and experiment. There are single crystal silicon wafers and polycrystalline silicon wafers in common use in solar cells. The silicon wafers are affected by many factors in the process of production, and there are some defects more or less. The common defects of polysilicon wafer are edge impurity, high impurity, dislocation defect and swirl defect of single crystal silicon wafer. The existence of wafer defects will greatly reduce the generation efficiency of the battery chip, reduce the service life of the battery components, and even affect the stability of photovoltaic power generation system. At present, in the actual production experiments, most of the solar cell electroluminescent defect detection, using human eye observation or automatic detection method to detect. The method of human eye observation is very subjective and easy to fatigue, which greatly reduces the reliability and efficiency of detection. In addition, because the detection of electroluminescent defects is aimed at the battery chip, it can not detect the defects of silicon wafer and diffusion wafer in the production process, which increases the production cost and reduces the production efficiency. And electroluminescent detection technology is contact detection, which will bring different damage to the battery chip. Therefore, a non-contact, efficient and accurate automatic detection method for silicon wafer defects in solar cells is very valuable. Based on the digital image processing technology, this paper studies the photoluminescence defect detection and classification method of solar cell silicon wafer, and puts forward the automatic detection and classification method of silicon wafer defect. The work of this paper mainly includes the following parts: 1. First, the photoluminescence image preprocessing, including image denoising, enhancement, edge detection, line detection, image rotation, target wafer segmentation. 2. Then using Gao Si curve fitting polysilicon chip image gray-scale curve method to calculate the segmentation threshold and segment defects, extract the defect area ratio and distribution characteristics; For monocrystalline silicon wafer, Gao Si curve is used to fit the gray and value curves of sampling pixels in the image, and the fitting standard deviation is extracted, and the high intensity partial area ratio in high frequency image is extracted by frequency domain filtering combined with binarization method. After the high-frequency binary image thinning, the Hough transform is extracted to detect the circle, and three features of the vortex defect are obtained. 3. Finally, a defect detection tree model is constructed to realize defect detection and classification. The three defects of polysilicon wafer are detected by eliminating method in turn. And based on C # to complete the design and integration of each functional module of the system software. The system software is tested in practical application. The result shows that the accuracy of defect detection and classification can reach more than 95%, which proves the correctness of the method and the rationality of the system software design. In this paper, a non-contact automatic defect detection and classification method for polysilicon wafer and single crystal silicon wafer in solar cell production is proposed, and the software is designed and compiled. Experiments show that this method is effective and accurate, and has a great prospect of application.
【學(xué)位授予單位】:東華大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2014
【分類號】:TM914.4;TP391.41
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