【摘要】：為抑制負載擾動對恒流控制的影響,針對等離子體負載需求,提出一種基于前饋控制的等離子體電源恒流控制策略。首先根據恒流源的開環(huán)傳遞矩陣,探討輸出導納對恒流電源負載擾動的影響機理,然后在分析等離子體負載模型以及電弧放電所帶來的負載擾動問題的基礎上,將電壓前饋控制引入電流閉環(huán)中。從降低恒流控制變換器的等效導納的角度,進行電壓前饋補償函數的設計,并分析負載模型參數對前饋補償函數的影響,對比引入電壓前饋控制前后負載擾動的噪聲衰減情況。仿真和實驗結果表明,基于前饋控制的等離子體電源恒流控制策略能有效抑制等離子體負載突變對恒流輸出的擾動,改善了恒流控制系統(tǒng)的動態(tài)響應性能,并對減少濺射鍍層缺陷、提高膜層質量有良好的效果。
[Abstract]:In order to restrain the influence of load disturbance on constant current control, a constant current control strategy for plasma power supply based on feedforward control is proposed to meet the demand of plasma load. Based on the open-loop transfer matrix of the constant current source, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. Then, based on the analysis of the plasma load model and the load disturbance caused by the arc discharge, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. The voltage feedforward control is introduced into the current closed loop. In order to reduce the equivalent admittance of the constant current control converter, the voltage feedforward compensation function is designed, and the influence of load model parameters on the feedforward compensation function is analyzed. The noise attenuation of the load disturbance before and after the introduction of voltage feedforward control is compared. The simulation and experimental results show that the constant current control strategy based on feedforward control can effectively suppress the constant current output disturbance caused by the sudden change of plasma load and improve the dynamic response performance of the constant current control system. It has a good effect on reducing the defects of sputtering coating and improving the quality of the film.
【作者單位】： 西安理工大學自動化與信息工程學院;
【基金】：國家自然科學基金青年科學基金資助項目(51307139)
【分類號】：TM46;O539

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