低壓化學(xué)氣相沉積設(shè)備控制系統(tǒng)的設(shè)計與實現(xiàn)
發(fā)布時間:2018-04-11 06:14
本文選題:LPCVD設(shè)備控制系統(tǒng) + WPF。 參考:《上海交通大學(xué)》2015年碩士論文
【摘要】:低壓化學(xué)氣相沉積(Low Pressure Chemical Vapor Deposition,LPCVD)技術(shù)是薄膜太陽能行業(yè)中的核心技術(shù),是生產(chǎn)透明導(dǎo)電氧化物(Transparent Conducting Oxide,TCO)玻璃的主要方法。TCO玻璃是指用物理或化學(xué)的方法在表面均勻沉積一層透明的導(dǎo)電氧化物膜的平板玻璃,主要用作薄膜太陽能電池的前基板(電極),它的性能對于薄膜太陽能電池的最終轉(zhuǎn)換率有著相當大的影響[1]。TCO玻璃的生產(chǎn)過程繁瑣,需要多個設(shè)備協(xié)同工作,在生產(chǎn)完成后需要用氮氣清理腔體并進行長時間的抽空,降低了設(shè)備的生產(chǎn)效率。在有多臺設(shè)備進行生產(chǎn)的環(huán)境中必然會出現(xiàn)工藝耗時較長的設(shè)備長期處于滿載,而工藝耗時較短的設(shè)備長期空載,如果無法進行合理的調(diào)度必然會造成設(shè)備資源的浪費。設(shè)備多樣且分散也不利于搜集對比生產(chǎn)數(shù)據(jù)和進行設(shè)備管理。設(shè)備控制多是在密閉不透明的腔體內(nèi)進行,無法直觀的看到腔體內(nèi)狀態(tài)的變化,也給操作人員帶來了許多困擾。這些問題逐漸成為了LPCVD設(shè)備發(fā)展的瓶頸。本文以國內(nèi)某知名光伏設(shè)備制造商(以下簡稱E公司)的實際項目為背景,在分析了LPCVD設(shè)備的生產(chǎn)過程的基礎(chǔ)上,設(shè)計并實現(xiàn)了一種新的LPCVD設(shè)備的控制系統(tǒng)。該系統(tǒng)包括了圖形界面控制、用戶帳戶管理、錯誤校正、工藝配方管理、設(shè)備安全運行保護機制、設(shè)備實時狀態(tài)數(shù)據(jù)管理、非實時設(shè)備信息管理等功能模塊,測試及應(yīng)用情況表明該系統(tǒng)實現(xiàn)了設(shè)備的精確控制與調(diào)度優(yōu)化,提高了生產(chǎn)效率。相比同類的其他系統(tǒng),本文的研究工作主要有以下特點:1.LPCVD設(shè)備控制系統(tǒng)選擇Prodave驅(qū)動庫和TCP/IP通訊協(xié)議與西門子的PLC進行通訊,采取不斷遍歷PLC的每一個模塊來獲取最新的數(shù)據(jù),可以達到10毫秒就可以遍歷200個IO點,最大限度的保證了系統(tǒng)的實時性。2.LPCVD設(shè)備控制系統(tǒng)通過采用C/S架構(gòu)和WCF技術(shù)來實現(xiàn)多客戶端同時訪問LPCVD設(shè)備,從而使得當一個操作員在一臺電腦上進行操作時,另一臺電腦也可以查看工藝數(shù)據(jù)與機臺運行狀態(tài),避免了排隊操作的情況。3.LPCVD設(shè)備控制系統(tǒng)采用WPF技術(shù)來實現(xiàn)圖形化的客戶端界面,通過從PLC上獲取的IO點來繪制真實設(shè)備的剖面圖,為操作員直觀的展示腔體里當前的運行狀態(tài)。同時提供了相應(yīng)的操作頁面,管理頁面與統(tǒng)計頁面,來進行機臺操作,管理操作機臺人員的信息和查看生產(chǎn)數(shù)據(jù),極大的增強了用戶的體驗。
[Abstract]:Low pressure chemical vapor deposition (Low Pressure Chemical Vapor Deposition LPCVD) technology is the core technology of thin-film solar industry, is the production of transparent conductive oxide (Transparent Conducting, Oxide, TCO) the main method of glass.TCO glass is a flat glass conductive oxide film by physical or chemical methods in uniformly deposited on the surface of a layer of transparent. The front substrate, mainly used for thin film solar cell (electrode), the performance of the final conversion for thin film solar cell rate has a considerable impact on the production process of [1].TCO glass is complicated, need to work multiple devices at the completion of production need to clean up the cavity with nitrogen and long time, reduce equipment production efficiency. In the process time-consuming equipment must be loaded with long-term multi equipment production environment, and a shorter process The equipment for a long time idle, if not reasonable scheduling will inevitably result in a waste of resources. The equipment equipment various and scattered is not conducive to the collection of data and comparison of production equipment management. Equipment control is carried out in a closed cavity opaque, unable to visually see the change of the cavity state, also brought a lot of problems to the operator these problems have gradually become the bottleneck of LPCVD equipment development. In this paper, a well-known domestic photovoltaic equipment manufacturer (hereinafter referred to as E company) the actual project as the background, based on the analysis of the production process of LPCVD equipment, the design and implementation of the control system of a new LPCVD equipment. The system includes a graphical interface user account control, error correction, process management, recipe management, equipment operation safety protection mechanism, real-time data management equipment, non real-time equipment information management and other functions Module, test and application show that the system realizes the control and scheduling of accurate equipment, improve production efficiency. Compared with other similar systems, the main research work of this paper has the following characteristics: Prodave driver and TCP/IP communication protocol to communicate with the SIEMENS PLC 1.LPCVD equipment control system, take each module continue to traverse the PLC to get the latest data, can reach 10 milliseconds to traverse the 200 IO, the maximum guarantee of real-time.2.LPCVD equipment control system by using C/S architecture and WCF technology to realize multi client access LPCVD devices at the same time, so that when an operator in a computer on another computer, you can also view the process data and the machine running state, avoid the queuing operations.3.LPCVD equipment control system uses WPF technology to realize the map The shape of the client interface, through access from the PLC IO to draw the profile of the real equipment, for the current operating state display cavity operator intuitive. At the same time provide the corresponding operation page, page management and Statistics page, to machine operation, operation management machine and the staff information and check the production data. Greatly enhance the user experience.
【學(xué)位授予單位】:上海交通大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2015
【分類號】:TM914.42;TP273
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