【摘要】：納米晶金屬薄膜材料目前已經(jīng)被廣泛應(yīng)用于微電子，半導(dǎo)體等高新領(lǐng)域中。這種新型材料不僅可以作為MEMS部件上的硬質(zhì)涂層，也可以作為電子器件上的導(dǎo)熱導(dǎo)電涂層而使用。由于納米薄膜在工作過程中往往會(huì)受到循環(huán)應(yīng)力的作用，因此，其力學(xué)性能成為其研究的重點(diǎn)，，而揭示薄膜在受力過程中的變形機(jī)制對于納米薄膜力學(xué)性能的研究起到重要的作用。 本文通過采用一種薄膜轉(zhuǎn)移技術(shù)方法，研究超薄納米晶銅薄膜在接觸變形下的微觀結(jié)構(gòu)和變形機(jī)制。即首先利用光刻蝕技術(shù)制作帶有特殊花紋的“光刻膠/SiO2/Si”復(fù)合結(jié)構(gòu)，然后通過直流磁控濺射在復(fù)合基底上制備50nm厚的超薄納米晶銅薄膜。利用掃描和透射電子顯微技術(shù)，研究薄膜納米壓痕微觀組織形貌及納米尺度下組織結(jié)構(gòu)的變化，并探討了納米壓痕的微觀變形機(jī)制。其研究結(jié)果如下： (1)掃描與透射電子顯微鏡下，壓痕為正三角形，其形狀與壓頭相吻合，并在壓痕區(qū)域周圍出現(xiàn)明顯的“pile-up”現(xiàn)象。與非壓痕部位相比，納米壓痕區(qū)域的晶粒數(shù)量減少，晶粒取向發(fā)生變化。 (2)高分辨透射電子顯微鏡下，壓痕區(qū)域的晶粒為等軸晶，晶粒尺寸比未壓痕區(qū)域晶粒的尺寸大。另外晶粒中還出現(xiàn)大量的形變孿晶，且孿晶出現(xiàn)明顯取向性。 (3)納米壓入過程中，晶粒長大可以通過晶界的遷移、晶粒的旋轉(zhuǎn)以及孿晶調(diào)節(jié)的方式，與周圍晶粒減小晶界角；或者以吞噬小尺寸晶粒的方式進(jìn)行晶粒長大。 (4)形變孿晶是薄膜在接觸變形下的另一個(gè)主要途徑。形變孿晶通過晶界發(fā)出不全位錯(cuò)在滑移面上形成，同時(shí)改變晶粒的形狀。晶粒內(nèi)部的不全位錯(cuò)在局部應(yīng)力作用下通過多次自增殖的方式在孿晶面滑移形成形變孿晶。另外，不全位錯(cuò)也可以利用回彈機(jī)制在晶粒中形成“V”字形和平行四邊形的孿晶區(qū)域。
[Abstract]:Nanocrystalline metal thin films have been widely used in high-tech fields such as microelectronics and semiconductors. This new material can be used not only as a hard coating on MEMS parts, but also as a thermal conductive coating on electronic devices. The mechanical properties of nanocrystalline films have become the focus of study because they are often subjected to cyclic stress in the working process. Revealing the deformation mechanism of the film plays an important role in the study of the mechanical properties of nanocrystalline films. In this paper, the microstructure and deformation mechanism of ultrathin nanocrystalline copper films under contact deformation were studied by a thin film transfer technique. Firstly, the "photoresist / Sio _ 2 / Si" composite structure with special pattern was fabricated by photoetching technique, and then the ultrathin nanocrystalline copper thin films with 50nm thickness were deposited on the composite substrate by DC magnetron sputtering. Scanning and transmission electron microscopy (TEM) techniques were used to study the microstructure and microstructure of nano-indentation films. The mechanism of nano-indentation deformation was also discussed. The results are as follows: (1) under the scanning and transmission electron microscopy, the indentation is equilateral triangle, its shape is consistent with the indentation head, and there is an obvious "pile-up" phenomenon around the indentation area. Compared with the non-indentation site, the number of grains in the indentation area decreased and the grain orientation changed. (2) under the high resolution transmission electron microscope, the grains in the indentation region were equiaxed. The grain size is larger than that in the unindented region. In addition, there are a large number of deformation twins in the grains, and the twins have obvious orientation. (3) in the process of nanocrystalline indentation, the grain growth can pass through the grain boundary migration, the rotation of the grains and the adjustment of the twins. (4) deformation twinning is another main way of film deformation under contact deformation. Deformation twins emit incomplete dislocations through grain boundaries on the slip plane and change the shape of the grains at the same time. Deformation twins are formed by multiple self-proliferation of incomplete dislocations in grains under local stress. In addition, incomplete dislocations can also be used to form "V" zigzag and parallelogram twin regions in the grains by means of springback mechanism.
【學(xué)位授予單位】：太原理工大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TB383.1;O614.121

【參考文獻(xiàn)】

相關(guān)期刊論文 前10條

1 張立德;;我國納米材料技術(shù)應(yīng)用的現(xiàn)狀和產(chǎn)業(yè)化的機(jī)遇[J];材料導(dǎo)報(bào);2001年07期

2 邱成軍,曹茂盛,朱靜,楊慧靜;納米薄膜材料的研究進(jìn)展[J];材料科學(xué)與工程;2001年04期

3 隋曼齡;王艷波;崔靜萍;李白清;;透射電鏡原位拉伸研究金屬材料形變機(jī)制[J];電子顯微學(xué)報(bào);2010年03期

4 張立德;納米材料研究的新進(jìn)展及在21世紀(jì)的戰(zhàn)略地位[J];中國粉體技術(shù);2000年01期

5 劉維平,邱定蕃,盧惠民;納米材料制備方法及應(yīng)用領(lǐng)域[J];化工礦物與加工;2003年12期

6 李小嬋;柯培玲;劉新才;汪愛英;;復(fù)合高功率脈沖磁控濺射Ti的放電特性及薄膜制備[J];金屬學(xué)報(bào);2014年07期

7 何建立,劉長洪,李文治,李恒德;微組裝納米多層材料的力學(xué)性能研究[J];清華大學(xué)學(xué)報(bào)(自然科學(xué)版);1998年10期

8 楊曉豫,蔡厄,李瑩,周平南;SiC/W 納米多層膜的微結(jié)構(gòu)和微觀力學(xué)性能[J];上海交通大學(xué)學(xué)報(bào);1998年02期

9 徐萬勁;磁控濺射技術(shù)進(jìn)展及應(yīng)用(上)[J];現(xiàn)代儀器;2005年05期

10 徐建;陸敏;朱麗娜;吳立敏;;納米薄膜的制備技術(shù)及其膜厚表征方法進(jìn)展[J];現(xiàn)代儀器;2012年03期

本文編號：2234352