本文選題：重復(fù)頻率激光 + 環(huán)向拉力損傷��； 參考：《長春理工大學(xué)》2015年碩士論文

【摘要】：激光與物質(zhì)間的相互作用研究在材料加工、機械制造業(yè)、光電成像系統(tǒng)等有著重要意義。而關(guān)于光學(xué)增透薄膜與重復(fù)頻率激光的相互作用研究尤為重要,本文主要對重復(fù)頻率長脈沖激光輻照光學(xué)薄膜材料的熱力損傷情況進(jìn)行數(shù)值模擬并分析其損傷情況。本文研究并建立了重復(fù)頻率長脈沖激光分別輻照單層薄膜材料(Al2O3/K9)和雙層薄膜材料(SiO2/Al2O3/K9)的物理模型,采用有限元算法求解相應(yīng)的熱傳導(dǎo)方程和熱應(yīng)力方程,得到了材料內(nèi)部熱、力場分布。數(shù)值模擬結(jié)果表明,單層薄膜材料:當(dāng)溫度冷卻時,殘余環(huán)向熱應(yīng)力沿徑向移動,在頻率比較低時,基底首先發(fā)生熱應(yīng)力損傷,接著薄膜發(fā)生熱應(yīng)力損傷。雙層薄膜材料:從激光參數(shù)上分析,在入射激光占空比相同的條件下,薄膜體系的溫升隨著脈寬的增大而減小;從整個薄膜體系中的熱力損傷上分析,在時間順序上SiO2膜層首先發(fā)生環(huán)向拉力損傷現(xiàn)象,然后K9基底發(fā)生環(huán)向拉力損傷,接著K9基底發(fā)生熱熔融現(xiàn)象,最后SiO2膜層發(fā)生熱熔融現(xiàn)象。本文結(jié)果可用于系統(tǒng)分析和揭示激光與光學(xué)薄膜相互作用機理,也可為光學(xué)薄膜設(shè)計及薄膜抗激光加固技術(shù)提供一定的理論參考和依據(jù)。
[Abstract]:The study of laser-matter interaction is of great significance in material processing, mechanical manufacturing, photoelectric imaging system and so on. It is very important to study the interaction between optical antireflection film and repetition rate laser. In this paper, thermal damage of optical thin film irradiated by long pulse laser at repetition rate is numerically simulated and its damage is analyzed. In this paper, the physical models of Al _ 2O _ 3 / K _ 9 and Si _ 2O _ 2 / Al _ 2O _ 3 / K _ 9) were studied and established, respectively. The corresponding heat conduction equation and thermal stress equation were solved by finite element method, and the internal heat of the material was obtained. Force field distribution. Numerical simulation results show that the thermal stress of the monolayer thin film material moves along the radial direction when the temperature is cooled. When the frequency is low, the thermal stress damage first occurs on the substrate and then the thermal stress damage occurs on the thin film. Double layer thin film material: from the laser parameter analysis, the temperature rise of the film system decreases with the increase of pulse width under the condition of the same duty cycle of the incident laser, and the thermal damage of the whole film system is analyzed from the point of view of the thermal damage of the whole film system. In time order, the SiO2 film layer first occurs the phenomenon of toroidal tensile damage, then the K9 substrate occurs the damage of circumferential tensile force, then the K9 substrate occurs thermal melting phenomenon, and finally the SiO2 film layer occurs the phenomenon of thermal melting. The results in this paper can be used to systematically analyze and reveal the interaction mechanism between laser and optical thin film, and can also provide some theoretical reference and basis for the design of optical thin film and the anti-laser strengthening technology of optical thin film.
【學(xué)位授予單位】：長春理工大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN249;TB383.2

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本文編號：1942933