磁納米粒子對(duì)Vs55溶液反玻璃化等溫結(jié)晶行為的影響
發(fā)布時(shí)間:2018-04-17 09:43
本文選題:結(jié)晶 + 納米粒子; 參考:《化工學(xué)報(bào)》2017年03期
【摘要】:借助差示掃描量熱儀(DSC)和低溫顯微系統(tǒng),研究了磁納米粒子對(duì)典型玻璃化溶液Vs55在反玻璃化過(guò)程中等溫結(jié)晶行為的影響。結(jié)果表明:(1)磁納米粒子經(jīng)過(guò)羧酸(CA)和聚乙二醇(PEG)表面修飾后,對(duì)Vs55溶液的玻璃化轉(zhuǎn)變溫度(Tg)幾乎沒(méi)有影響,但對(duì)其反玻璃化轉(zhuǎn)變溫度(Td)和反玻璃化結(jié)晶焓(HTd)影響較大;(2)在Vs55的反玻璃化溫區(qū)范圍內(nèi)(-85~-60℃),隨著等溫溫度的升高和降溫速率的增大,經(jīng)CA修飾的磁納米粒子均會(huì)顯著促進(jìn)Vs55的反玻璃化現(xiàn)象,在-85℃等溫時(shí)的冰晶生長(zhǎng)速率為0.37μm·s~(-1),-75℃等溫時(shí)則為2.19μm·s~(-1),而當(dāng)降溫速率從2℃·min~(-1)增大到100℃·min~(-1)時(shí)(在-75℃等溫結(jié)晶),其反玻璃化冰晶生長(zhǎng)的速率由1.72μm·s~(-1)增大到3.54μm·s~(-1);(3)與Vs55相比,兩種修飾均明顯促進(jìn)了其反玻璃化,在-80℃等溫結(jié)晶時(shí),Vs55溶液的生長(zhǎng)速率為0,而CA和PEG修飾分別達(dá)到了1.04μm·s~(-1)和2.31μm·s~(-1);與CA修飾相比,PEG修飾后的磁納米粒子更加促進(jìn)了Vs55溶液的反玻璃化現(xiàn)象,在-85℃等溫時(shí)的冰晶生長(zhǎng)速率為0.62μm·s~(-1),而-75℃等溫時(shí)則達(dá)到了6.25μm·s~(-1),這個(gè)結(jié)果也充分說(shuō)明了磁納米粒子表面修飾物質(zhì)的不同必定會(huì)顯著影響Vs55的反玻璃化結(jié)晶生長(zhǎng)。
[Abstract]:By means of differential scanning calorimeter (DSC) and low temperature microscopy system, the effect of magnetic nanoparticles on the isothermal crystallization behavior of typical glass solution Vs55 in the process of antivitrification was studied.The results show that the surface modification of the magnetic nanoparticles with carboxylic acid (CA) and polyethylene glycol (PEG) has little effect on the glass transition temperature (TG) of Vs55 solution.However, the anti-glass transition temperature (Td) and the antivitrification crystallization enthalpy (HTD) have a great influence on the antiglassization temperature range of Vs55 (-85 ~ 60 鈩,
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