本文選題：磁控濺射 + Ti-Si-N��； 參考：《沈陽大學》2015年碩士論文

【摘要】：Ti N薄膜因其高硬度、高耐磨性、高熔點等優(yōu)良性能,在磨具、機械、航空等領域得到廣泛的應用。通過向薄膜中添加Al、Si等元素可以改善薄膜的性能來滿足日益增長的需求。在過去的幾十年里,Ti-Si-N納米復合膜由于優(yōu)異的機械性能已引起了廣泛的關注。然而薄膜的最佳結構和性能難以獲得,因此對薄膜制備工藝的研究仍具有重要意義。本文利用反應磁控共濺射技術,在不同的工藝條件下制備了Ti-Si-N納米復合膜。利用X射線衍射、原子力顯微鏡和場發(fā)射掃描電鏡對薄膜的相結構與表面微觀形貌進行了分析;利用劃痕法、納米壓痕技術對薄膜的力學性能進行了測量;用電化學技術探究了Ti-Si-N納米復合膜的工藝參數(shù)對薄膜耐腐蝕性能的影響。研究了Si靶功率對Ti-Si-N納米復合膜結構和性能的影響,結果表明:Si3N4是以非晶態(tài)的形式出現(xiàn)在薄膜中。隨著Si靶功率的增加,薄膜的擇優(yōu)取向由(111)晶面轉變?yōu)?200)晶面,晶粒尺寸先減小后增大。薄膜表面變得更加光滑致密,薄膜的膜基結合力、硬度以及耐腐蝕性隨Si靶功率的增加逐漸變好。但過高的Si靶功率會使薄膜性能下降。研究了基體溫度(100℃~400℃)對薄膜結構和性能的影響,結果表明:薄膜在低溫條件下晶粒尺寸較小但表面的大顆粒較多,表面粗糙度較大。隨著溫度的升高,晶粒尺寸略有增加,但表面顆粒均勻,平整度增加�；w溫度在300℃時,薄膜的膜基結合力最大為46 N,硬度值也達到最大值為23.0 GPa,腐蝕性也最好。溫度繼續(xù)增加,薄膜中部分晶粒尺寸迅速增加,相關力學性能和抗腐蝕性能降低。研究了負偏壓對薄膜結構和性能的影響,結果表明:隨著負偏壓的增加,薄膜中Ti N(111)晶面衍射峰減弱,(200)晶面衍射強度增強;薄膜的平均晶粒尺寸和表面粗糙度先減小后增大。在負偏壓為-120V時薄膜的平均晶粒尺寸最小,為8.6 nm,薄膜的膜基結合力和耐腐蝕性能最好。在負偏壓為-80V時,薄膜表面粗糙度最小,為3.63 nm。通過探究N2流量對薄膜結構和性能的影響發(fā)現(xiàn):薄膜擇優(yōu)取向為(200)晶面,平均晶粒尺寸基本不變,N2流量對薄膜擇優(yōu)取向和平均晶粒尺寸影響不大。N2流量的增加會使薄膜晶粒進一步細化,組織均勻。在N2流量比為8 m L/min時,薄膜表面粗糙度最小為3.18 nm,膜基結合力達最大值31 N,此時薄膜的硬度和彈性模量也最高,分別為15.8 GPa和279.2 GPa。但過高的氮氣流量會使薄膜的性能降低。
[Abstract]:Tin thin films have been widely used in abrasive, mechanical, aviation and other fields because of their high hardness, high wear resistance and high melting point.The properties of the films can be improved by adding Al Si and other elements to the films to meet the increasing demand.In the past few decades, Ti-Si-N nanocomposite films have attracted wide attention due to their excellent mechanical properties.However, the optimal structure and properties of the films are difficult to obtain, so the study of the preparation process of the films is still of great significance.In this paper, Ti-Si-N nanocomposite films were prepared under different conditions by reactive magnetron co-sputtering.X-ray diffraction, atomic force microscope and field emission scanning electron microscope were used to analyze the phase structure and surface morphology of the films, and the mechanical properties of the films were measured by scratch method and nano-indentation technique.The effect of process parameters on the corrosion resistance of Ti-Si-N nanocomposite films was investigated by electrochemical technique.The effect of Si target power on the structure and properties of Ti-Si-N nanocomposite films was investigated. The results show that the structure and properties of Ti-Si-N nanocomposite films are in the form of amorphous Si _ 3N _ 4.With the increase of Si target power, the preferred orientation of the thin film changes from 111) to 200), and the grain size decreases first and then increases.The surface of the film becomes smoother and denser, and the adhesion, hardness and corrosion resistance of the film become better with the increase of Si target power.However, the properties of the films will be decreased when the Si target power is too high.The effects of substrate temperature (100 鈩，

本文編號：1739125