發(fā)布時間：2018-01-17 00:14

  本文關(guān)鍵詞：鐵基非晶合金薄膜的熱處理和電子束輻照工藝及磁性能研究　出處：《深圳大學(xué)》2017年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 脈沖激光沉積 非晶合金薄膜 退火 電子束輻照

【摘要】：軟磁性薄膜材料在電子信息技術(shù)高速發(fā)展的今天有著重要的地位。然而采用先進的脈沖激光沉積技術(shù)制備的非晶合金薄膜具有比相同成分的條帶非晶樣品更差的磁學(xué)性能。本文采用了脈沖激光沉積技術(shù),在Si(100)單晶襯底上制備了Fe-B-Si-Nb的非晶合金薄膜,利用掃描電子顯微鏡(SEM)分析薄膜樣品的表面形貌和厚度,利用X射線衍射儀(XRD)來分析薄膜的結(jié)構(gòu),采用原子力顯微鏡(AFM)來分析薄膜樣品的表面形貌和粗糙度變化,使用綜合物性分析儀(PPMS)中的VSM組件來對薄膜的磁性能進行測試分析,探討了脈沖激光沉積時沉積參數(shù)、熱處理和電子束輻照改性對Fe基非晶合金薄膜結(jié)構(gòu)以及磁性能的影響。取得的主要研究結(jié)果如下:(1)對于在室溫條件下沉積的Fe基薄膜,薄膜均為非晶態(tài)結(jié)構(gòu),通過臺階高度的測量分析發(fā)現(xiàn)薄膜的沉積速率隨著膜厚的增加逐漸變緩。薄膜的粗糙度會隨著厚度的增加而增加,薄膜的矯頑力隨著厚度的增加而變大。(2)襯底溫度的升高會導(dǎo)致薄膜的質(zhì)量下降,薄膜表面出現(xiàn)許多孔洞,并且孔洞大小隨著沉積溫度的升高而增加,薄膜的粗糙度也隨溫度而增加,薄膜的矯頑力隨著沉積溫度的升高會先下降后升高,直至軟磁性能惡化。(3)Fe基非晶合金薄膜在500℃退火保溫1h后,在XRD圖像上出現(xiàn)了結(jié)晶相α-Fe和Fe3Si,晶粒大小分別為34nm和30nm,薄膜的粗糙度隨著退火溫度的升高而增加,在退火溫度為300℃時薄膜的矯頑力最低,此時薄膜的矯頑力相比于原始未退火的薄膜下降了43%。(4)在300℃退火保溫不同時間,保溫時間的延長會使得薄膜的粗糙度增加,但是薄膜還是非晶的狀態(tài),薄膜的矯頑力會隨著保溫時間的增加呈現(xiàn)出先下降后升高的趨勢,在300℃退火保溫0.5h時的薄膜其矯頑力最小,相比原始態(tài)薄膜下降了73%。(5)經(jīng)過電子束輻照后的薄膜表面出現(xiàn)許多花斑狀的結(jié)構(gòu),數(shù)量會隨著輻照劑量的升高而增加,經(jīng)過輻照后的薄膜還是非晶的狀態(tài),薄膜的矯頑力會隨著輻照劑量的增加而下降,當(dāng)電子束輻照劑量為40k Gy時,此時薄膜的矯頑力最低,為5.4Oe,薄膜的矯頑力相對于原始薄膜相比降低了89%。(6)通過退火和電子束輻照兩種手段進行對比發(fā)現(xiàn)電子束輻照改性的方法比傳統(tǒng)退火的方法改性更為有效地降低了薄膜的矯頑力,并且其操作性更為簡單,重復(fù)性好。
[Abstract]:The soft magnetic thin film material has an important position in the rapid development of electronic information technology today. However, the amorphous alloy films prepared by the advanced pulsed laser deposition technology have worse properties than the amorphous films with the same composition. Magnetic properties. Pulsed laser deposition technique is used in this paper. Amorphous alloy films of Fe-B-Si-Nb were prepared on single crystal substrates. The surface morphology and thickness of the films were analyzed by scanning electron microscopy (SEM). X-ray diffractometer (XRD) was used to analyze the structure of the films and AFM was used to analyze the surface morphology and roughness of the films. The magnetic properties of the films were tested and analyzed by using the VSM module in the comprehensive physical properties analyzer. The deposition parameters of the films during pulsed laser deposition were discussed. Effects of heat treatment and electron beam irradiation modification on the structure and magnetic properties of Fe-based amorphous alloy films. The main results obtained are as follows: 1) for Fe-based films deposited at room temperature. The deposition rate of the films is slower with the increase of the film thickness, and the roughness of the films will increase with the increase of the thickness. The coercivity of the film increases with the increase of thickness. The increase of substrate temperature will lead to the decrease of the film quality. There are many pores on the surface of the film, and the pore size increases with the increase of deposition temperature. The coarseness of the film also increases with temperature, and the coercivity of the film decreases first and then increases with the increase of deposition temperature. After annealing at 500 鈩，

本文編號：1435454