針對工藝偏差的MEMS器件結(jié)構(gòu)參數(shù)優(yōu)化設(shè)計(jì)
發(fā)布時(shí)間：2018-11-16 16:55
【摘要】：MEMS器件作為集成電路和微機(jī)械的結(jié)合,性能對制造工藝具有更大的依賴性,故對其設(shè)計(jì)制造引入可制造性設(shè)計(jì)(DFM)思想勢在必行�？芍圃煨栽O(shè)計(jì)的思想,即在設(shè)計(jì)的源頭階段綜合考慮制造中影響性能和良品率的工藝偏差,通過適當(dāng)?shù)难a(bǔ)償設(shè)計(jì)對器件參數(shù)提前補(bǔ)償,從而抵消工藝誤差和效應(yīng)帶來的影響,實(shí)現(xiàn)工藝與設(shè)計(jì)的同步。本文以MEMS器件中梁結(jié)構(gòu)和梳齒結(jié)構(gòu)器件為研究對象,這一類器件都是MEMS器件中重要的基礎(chǔ)功能單元,其諧振頻率等性能值都是物理參數(shù)、器件尺寸和截面形狀的函數(shù),對工程設(shè)計(jì)來說有很重要的意義。而MEMS工藝偏差除了物理參數(shù)偏差,最主要的就是一些工藝效應(yīng)導(dǎo)致的幾何尺寸偏差和形貌偏差。本文針對工藝效應(yīng)對諧振頻率的影響展開研究,包括DRIE工藝導(dǎo)致的梯形剖面形狀(梯形效應(yīng))、Footing效應(yīng)導(dǎo)致的底部過刻蝕、TMDE工藝造成的波紋剖面形狀(波紋效應(yīng)),這三種工藝效應(yīng)是MEMS器件工藝加工中最常見的工藝效應(yīng)。本文將以器件諧振頻率為研究目標(biāo),針對這三種工藝效應(yīng)對器件造成的偏差,建立其修正模型。針對MEMS器件中的梁結(jié)構(gòu),對縱向運(yùn)動(dòng)的梁和橫向運(yùn)動(dòng)的梁分別建立基于單個(gè)工藝效應(yīng)以及多個(gè)工藝效應(yīng)共同作用下的修正模型。本文選取固支梁結(jié)構(gòu),在ANSYS14.5平臺(tái)上進(jìn)行建模與仿真,驗(yàn)證了縱向運(yùn)動(dòng)的梁結(jié)構(gòu)的諧振頻率修正模型的正確性。同理,選取懸臂梁結(jié)構(gòu)進(jìn)行ANSYS仿真與建模,驗(yàn)證了橫向運(yùn)動(dòng)的梁結(jié)構(gòu)修正模型的正確性。從而驗(yàn)證了梁結(jié)構(gòu)修正模型對于MEMS器件中常見的固支梁結(jié)構(gòu)和懸臂梁結(jié)構(gòu)都是適用的。針對MEMS器件中的梳齒結(jié)構(gòu),以梳狀諧振器為研究對象,運(yùn)用橫向運(yùn)動(dòng)的梁結(jié)構(gòu)模型結(jié)論,對其建立基于不同工藝效應(yīng)情況下的諧振頻率修正模型,并在ANSYS 14.5平臺(tái)上對梳狀諧振器進(jìn)行建模與仿真,驗(yàn)證了修正模型的正確性。根據(jù)器件在工藝偏差下的修正模型,本論文完成了對這三類器件的理想SPICE等效電路模型相應(yīng)的修正,利用ANSYS仿真結(jié)果驗(yàn)證了修正等效電路模型的正確性。最后,根據(jù)器件結(jié)構(gòu)參數(shù)對器件性能的影響,提出可以減小不確定性因素影響的方案,根據(jù)已有的設(shè)計(jì)優(yōu)化算法,實(shí)現(xiàn)工藝補(bǔ)償設(shè)計(jì)；并在C++ Builder軟件平臺(tái)上編寫可視化軟件,最終實(shí)現(xiàn)基于工藝偏差的MEMS器件結(jié)構(gòu)參數(shù)的自動(dòng)優(yōu)化設(shè)計(jì)。文中詳細(xì)介紹了優(yōu)化流程和軟件功能及使用。把DFM思想實(shí)現(xiàn)于MEMS設(shè)計(jì)過程中是MEMS發(fā)展的必經(jīng)之路,本文簡要展示了DFM思想應(yīng)用于MEMS簡單器件諧振頻率自動(dòng)優(yōu)化的方法,為MEMS器件的可制造性設(shè)計(jì)提供了思路與依據(jù)。
[Abstract]:As a combination of integrated circuits and micromachineries, MEMS devices have greater dependence on manufacturing process, so it is imperative to introduce manufacturability design (DFM) into its design and manufacture. The idea of manufacturability design is to consider synthetically the process deviation which affects the performance and the rate of good product in the source stage of the design, and compensate the device parameters in advance through the appropriate compensation design, thus counteracting the influence of the process error and effect. The synchronization of process and design is realized. In this paper, the beam structure and comb structure devices in MEMS devices are studied. These devices are important basic functional units in MEMS devices. The resonance frequency and other performance values are all functions of physical parameters, device size and section shape. It is of great significance to engineering design. In addition to the deviation of physical parameters, the most important process deviation of MEMS is the geometric size deviation and shape deviation caused by some process effects. In this paper, the influence of process effect on resonant frequency is studied, including trapezoidal profile shape caused by DRIE process (bottom overetching caused by trapezoid effect), Footing effect), corrugated profile shape (ripple effect) caused by TMDE process. These three process effects are the most common process effects in the processing of MEMS devices. In this paper, the resonant frequency of the device is taken as the research object, and the modified model is established for the deviation caused by these three process effects. For the beam structure in MEMS devices, a modified model based on single process effect and multiple process effects is established for the longitudinal and transverse motion beams, respectively. In this paper, the fixed beam structure is selected and modeled and simulated on the ANSYS14.5 platform, which verifies the correctness of the resonant frequency correction model of the longitudinal moving beam structure. In the same way, the ANSYS simulation and modeling of cantilever beam structure is carried out, which verifies the correctness of the modified beam structure model with transverse motion. It is verified that the modified model of beam structure is suitable for both fixed beam structure and cantilever beam structure which are commonly used in MEMS devices. Aiming at the comb structure in MEMS devices, the comb resonator is taken as the research object, and the resonant frequency correction model based on different process effects is established by using the conclusion of the beam structure model of transverse motion. The modeling and simulation of the comb resonator on ANSYS 14.5 platform verify the correctness of the modified model. According to the modified model of the device under the process deviation, the corresponding correction of the ideal SPICE equivalent circuit model of these three kinds of devices is completed in this paper, and the correctness of the modified equivalent circuit model is verified by the ANSYS simulation results. Finally, according to the influence of the device structure parameters on the device performance, the scheme which can reduce the influence of uncertainty factors is put forward, and the process compensation design is realized according to the existing design optimization algorithm. The visual software is written on the C Builder software platform, and the automatic optimization design of the MEMS device structure parameters based on the process deviation is finally realized. The optimization flow, software function and application are introduced in detail in this paper. It is the only way for the development of MEMS to realize the idea of DFM in the process of MEMS design. This paper briefly demonstrates the method of applying DFM idea to the automatic optimization of resonance frequency of MEMS simple devices, which provides the train of thought and basis for the manufacturability design of MEMS devices.
【學(xué)位授予單位】：東南大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2016
【分類號(hào)】：TH-39
本文編號(hào)：2336079
[Abstract]:As a combination of integrated circuits and micromachineries, MEMS devices have greater dependence on manufacturing process, so it is imperative to introduce manufacturability design (DFM) into its design and manufacture. The idea of manufacturability design is to consider synthetically the process deviation which affects the performance and the rate of good product in the source stage of the design, and compensate the device parameters in advance through the appropriate compensation design, thus counteracting the influence of the process error and effect. The synchronization of process and design is realized. In this paper, the beam structure and comb structure devices in MEMS devices are studied. These devices are important basic functional units in MEMS devices. The resonance frequency and other performance values are all functions of physical parameters, device size and section shape. It is of great significance to engineering design. In addition to the deviation of physical parameters, the most important process deviation of MEMS is the geometric size deviation and shape deviation caused by some process effects. In this paper, the influence of process effect on resonant frequency is studied, including trapezoidal profile shape caused by DRIE process (bottom overetching caused by trapezoid effect), Footing effect), corrugated profile shape (ripple effect) caused by TMDE process. These three process effects are the most common process effects in the processing of MEMS devices. In this paper, the resonant frequency of the device is taken as the research object, and the modified model is established for the deviation caused by these three process effects. For the beam structure in MEMS devices, a modified model based on single process effect and multiple process effects is established for the longitudinal and transverse motion beams, respectively. In this paper, the fixed beam structure is selected and modeled and simulated on the ANSYS14.5 platform, which verifies the correctness of the resonant frequency correction model of the longitudinal moving beam structure. In the same way, the ANSYS simulation and modeling of cantilever beam structure is carried out, which verifies the correctness of the modified beam structure model with transverse motion. It is verified that the modified model of beam structure is suitable for both fixed beam structure and cantilever beam structure which are commonly used in MEMS devices. Aiming at the comb structure in MEMS devices, the comb resonator is taken as the research object, and the resonant frequency correction model based on different process effects is established by using the conclusion of the beam structure model of transverse motion. The modeling and simulation of the comb resonator on ANSYS 14.5 platform verify the correctness of the modified model. According to the modified model of the device under the process deviation, the corresponding correction of the ideal SPICE equivalent circuit model of these three kinds of devices is completed in this paper, and the correctness of the modified equivalent circuit model is verified by the ANSYS simulation results. Finally, according to the influence of the device structure parameters on the device performance, the scheme which can reduce the influence of uncertainty factors is put forward, and the process compensation design is realized according to the existing design optimization algorithm. The visual software is written on the C Builder software platform, and the automatic optimization design of the MEMS device structure parameters based on the process deviation is finally realized. The optimization flow, software function and application are introduced in detail in this paper. It is the only way for the development of MEMS to realize the idea of DFM in the process of MEMS design. This paper briefly demonstrates the method of applying DFM idea to the automatic optimization of resonance frequency of MEMS simple devices, which provides the train of thought and basis for the manufacturability design of MEMS devices.
【學(xué)位授予單位】：東南大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2016
【分類號(hào)】：TH-39
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