孿生靶磁控濺射TiAIN硬質(zhì)膜及性能研究
發(fā)布時(shí)間：2018-11-21 14:02
【摘要】：由于孿生靶可以克服Ti-A1合金靶造價(jià)高,制備過(guò)程中對(duì)膜層成分控制難以及合金結(jié)構(gòu)中的孔隙等缺陷造成的輝光放電不穩(wěn)定等一系列問(wèn)題受到人們的廣泛關(guān)注。但目前制備TiAlN三元復(fù)合薄膜多采用孿生Ti靶或?qū)\生Al靶,這種靶材安裝方式使真空鍍膜室中的靶材至少是三個(gè)或更多,靶材個(gè)數(shù)的增加使鍍膜設(shè)備結(jié)構(gòu)變得復(fù)雜化,不利于節(jié)約成本,基于這種情況,本文創(chuàng)造性地采用Ti、Al兩種物理性質(zhì)差異較大的金屬材料組成孿生Ti-A1靶制備TiAlN薄膜并探索其相應(yīng)的制備工藝就顯得極為重要。 本文采用孿生靶磁控濺射技術(shù)在Q235低碳鋼基體上制備了TiAIN薄膜,研究了負(fù)偏壓幅值、占空比、工作氣壓和靶電流對(duì)TiAlN薄膜表面形貌、膜厚、硬度、耐腐蝕性的影響并通過(guò)原子力顯微鏡(AFM)、臺(tái)階儀、納米壓痕儀和電化學(xué)腐蝕平臺(tái)對(duì)TiAIN薄膜的表面形貌、膜厚、硬度和耐腐蝕性進(jìn)行表征。同時(shí),考慮到負(fù)偏壓在磁控濺射鍍膜中對(duì)等離子體中帶電粒子的重要影響作用,研究了負(fù)偏壓幅值對(duì)薄膜物質(zhì)成分的影響并通過(guò)X射線光電子能譜儀(XPS)薄膜物質(zhì)成分進(jìn)行表征。 研究結(jié)果表明：提高靶電流、降低工作氣壓、選擇合適的負(fù)偏壓幅值和占空比能有效地降低薄膜表面粗糙度、提高粒徑均勻性；薄膜的沉積速率受靶電流的影響最大；膜層主要成分為Ti、A1和N,通過(guò)調(diào)整負(fù)偏壓可有效地調(diào)節(jié)膜層中A1/Ti原子比。通過(guò)XPS擬合結(jié)果可知,適當(dāng)?shù)脑黾迂?fù)偏壓的幅值大小可增加薄膜中的TiAlN含量。 通過(guò)納米壓痕儀和電化學(xué)腐蝕平臺(tái)對(duì)薄膜的硬度和耐腐蝕性能檢測(cè)并結(jié)合TiAlN薄膜表面形貌、膜厚分析可知,硬度受薄膜表面平整度、致密性和粒徑均勻性影響較大,當(dāng)薄膜粗糙度為2.75nm時(shí)硬度最高,為15.17GPa；薄膜的耐腐蝕能力受薄膜表面粗糙度和膜厚影響較大。粗糙度越小,膜厚值越大,薄膜的耐腐蝕性越強(qiáng)。
[Abstract]:Due to the fact that twin targets can overcome the high cost of Ti-A1 alloy targets, it is difficult to control the composition of the film during the preparation process, and a series of problems such as glow discharge instability caused by the defects in the structure of the alloy, such as glow discharge instability, have attracted extensive attention. However, at present, twinning Ti targets or twin Al targets are widely used in the preparation of TiAlN composite films. The installation of these targets makes the targets in the vacuum coating chamber at least three or more, and the increase of the number of targets complicates the structure of the coating equipment. Because of this situation, it is very important to use two kinds of metal materials with different physical properties of Ti,Al to form twinning Ti-A1 target to prepare TiAlN thin films and to explore the corresponding preparation technology. TiAIN thin films were prepared on Q235 low carbon steel substrates by twin target magnetron sputtering technique. The negative bias amplitude, duty cycle, working pressure and target current on the surface morphology, thickness and hardness of TiAlN films were studied. The surface morphology, film thickness, hardness and corrosion resistance of TiAIN films were characterized by atomic force microscope (AFM) (AFM), step tester, nano-indentation instrument and electrochemical corrosion platform. Considering the important effect of negative bias voltage on charged particles in plasma deposited by magnetron sputtering, The effect of negative bias amplitude on the composition of (XPS) thin films was investigated and characterized by X-ray photoelectron spectroscopy (XPS). The results show that increasing the target current, reducing the working pressure, choosing the proper negative bias amplitude and duty cycle can effectively reduce the surface roughness and improve the particle size uniformity of the film, and the deposition rate of the film is most affected by the target current. The main components of the film are Ti,A1 and N.The A1/Ti atom ratio in the film can be adjusted effectively by adjusting the negative bias voltage. The results of XPS fitting show that increasing the amplitude of negative bias voltage can increase the content of TiAlN in the film. The hardness and corrosion resistance of TiAlN films were tested by nano-indentation and electrochemical corrosion platform. The film thickness analysis showed that the hardness was greatly affected by surface smoothness, compactness and particle size uniformity. When the roughness of the film is 2.75nm, the hardness is the highest, 15.17GPa. The corrosion resistance of the films is greatly affected by the surface roughness and thickness of the films. The smaller the roughness, the greater the thickness of the film and the stronger the corrosion resistance of the film.
【學(xué)位授予單位】：哈爾濱商業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2014
【分類號(hào)】：TB43
本文編號(hào)：2347190
[Abstract]:Due to the fact that twin targets can overcome the high cost of Ti-A1 alloy targets, it is difficult to control the composition of the film during the preparation process, and a series of problems such as glow discharge instability caused by the defects in the structure of the alloy, such as glow discharge instability, have attracted extensive attention. However, at present, twinning Ti targets or twin Al targets are widely used in the preparation of TiAlN composite films. The installation of these targets makes the targets in the vacuum coating chamber at least three or more, and the increase of the number of targets complicates the structure of the coating equipment. Because of this situation, it is very important to use two kinds of metal materials with different physical properties of Ti,Al to form twinning Ti-A1 target to prepare TiAlN thin films and to explore the corresponding preparation technology. TiAIN thin films were prepared on Q235 low carbon steel substrates by twin target magnetron sputtering technique. The negative bias amplitude, duty cycle, working pressure and target current on the surface morphology, thickness and hardness of TiAlN films were studied. The surface morphology, film thickness, hardness and corrosion resistance of TiAIN films were characterized by atomic force microscope (AFM) (AFM), step tester, nano-indentation instrument and electrochemical corrosion platform. Considering the important effect of negative bias voltage on charged particles in plasma deposited by magnetron sputtering, The effect of negative bias amplitude on the composition of (XPS) thin films was investigated and characterized by X-ray photoelectron spectroscopy (XPS). The results show that increasing the target current, reducing the working pressure, choosing the proper negative bias amplitude and duty cycle can effectively reduce the surface roughness and improve the particle size uniformity of the film, and the deposition rate of the film is most affected by the target current. The main components of the film are Ti,A1 and N.The A1/Ti atom ratio in the film can be adjusted effectively by adjusting the negative bias voltage. The results of XPS fitting show that increasing the amplitude of negative bias voltage can increase the content of TiAlN in the film. The hardness and corrosion resistance of TiAlN films were tested by nano-indentation and electrochemical corrosion platform. The film thickness analysis showed that the hardness was greatly affected by surface smoothness, compactness and particle size uniformity. When the roughness of the film is 2.75nm, the hardness is the highest, 15.17GPa. The corrosion resistance of the films is greatly affected by the surface roughness and thickness of the films. The smaller the roughness, the greater the thickness of the film and the stronger the corrosion resistance of the film.
【學(xué)位授予單位】：哈爾濱商業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2014
【分類號(hào)】：TB43
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