本文選題：橢球形光學元件 + 真空鍍膜��； 參考：《長春理工大學》2017年碩士論文

【摘要】：膜厚均勻性是考核膜層性能的重要指標之一,對于一般較小且形狀較為平整的光學元件,其膜厚的均勻性一般會得到良好的控制。而對于大曲率的球形基底表面,尤其是內(nèi)表面,由于入射粒子的角度變化相當大,從正入射變成近乎零度掠入射,導(dǎo)致沉積粒子獲得的能量變化極大,從而帶來十分嚴重的膜厚均勻性問題。本論文所探究的是特定口徑和深度比4:1的橢球形光學元件內(nèi)表面鍍膜的均勻性。通過對影響橢球鏡的膜厚分布各種因素的調(diào)整,來調(diào)整和改善其膜厚均勻性。針對橢球形光學元件的膜層均勻性進行了理論分析研究。通過對基底內(nèi)表面的數(shù)學模型建立,運用膜厚理論公式表達出內(nèi)表面的膜厚分布。分析了夾具的自轉(zhuǎn)、真空室氣壓和離子源輔助蒸鍍對膜厚的影響,并在實驗中得到了較為理想的膜厚分布,在400mm的口徑上制備的SIO2膜層均勻性達到0~5%。該研究工作對這種大口徑膜層鍍制工藝具有一定的指導(dǎo)意義,在改善此種表面膜層均勻性上提供了理論依據(jù)。
[Abstract]:The uniformity of film thickness is one of the important indexes to evaluate the performance of the film, and the uniformity of the film thickness can be controlled well for the optical elements which are generally small and flat in shape. However, for the spherical substrate surface with large curvature, especially the inner surface, the energy obtained by the deposited particles varies greatly because the angle of the incident particles varies greatly, from normal incidence to near-zero grazing incidence. Thus, the problem of film thickness uniformity is very serious. In this paper, the uniformity of coating on the inner surface of ellipsoidal optical elements with specific aperture and depth ratio of 4:1 is investigated. The uniformity of film thickness is adjusted and improved by adjusting various factors affecting the film thickness distribution of ellipsoidal mirror. The film uniformity of ellipsoidal optical elements is studied theoretically. By establishing the mathematical model of the inner surface of the substrate, the thickness distribution of the inner surface is expressed by using the theoretical formula of film thickness. The effects of the rotation of the clamp, vacuum chamber pressure and ion source assisted evaporation on the film thickness were analyzed, and the ideal film thickness distribution was obtained in the experiment. The uniformity of the SIO2 film prepared on the 400mm caliber was 0 ~ 5%. The research work has certain guiding significance for this kind of large diameter film coating plating process and provides the theoretical basis for improving the uniformity of the surface film coating.
【學位授予單位】：長春理工大學
【學位級別】：碩士
【學位授予年份】：2017
【分類號】：O484

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