本文選題：釕靶 + 釕粉　； 參考：《貴金屬》2017年S1期

【摘要】：電子工業(yè)生產(chǎn)釕靶對所用的釕粉純度(99.999%)、分散性、形貌和尺寸等有嚴格的要求。國內(nèi)目前只能在實驗室制備出高性能的釕粉,尚未應(yīng)用于生產(chǎn),在制備高性能釕粉方面與國外有較大差距,且國內(nèi)釕靶用釕粉主要依靠進口。通過分析和總結(jié)了國內(nèi)外釕靶用釕粉的生產(chǎn)方法、工藝和測試方法,并對國內(nèi)釕靶用釕粉的制備提出了建議。
[Abstract]:Ruthenium target produced in electronic industry has strict requirements for the purity, dispersity, morphology and size of the ruthenium powder used. At present, the high performance ruthenium powder can only be prepared in the laboratory in our country, but it has not been used in the production. There is a big gap between the preparation of high performance ruthenium powder and foreign countries, and the domestic ruthenium target ruthenium powder mainly depends on the import. The production method, process and testing method of ruthenium powder for ruthenium target at home and abroad were analyzed and summarized, and some suggestions for the preparation of ruthenium powder for ruthenium target in China were put forward.
【作者單位】： 昆明貴金屬研究所稀貴金屬綜合利用新技術(shù)國家重點實驗室;西北有色金屬研究院;
【基金】：云南省科技計劃項目-重點新產(chǎn)品(2016BA001) 云南省引進海外高層次人才項目(13020149)
【分類號】：TF123.2
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本文編號：1822240