本文選題：CrTiAlCN薄膜 + 結(jié)構(gòu)��； 參考：《南京航空航天大學(xué)》2017年碩士論文

【摘要】：本文采用非平衡磁控濺射系統(tǒng),在316L不銹鋼和單晶硅片上沉積了CrAlN、CrTiAlN、CrTiAlCN薄膜,在M2高速鋼上沉積了不同C元素含量的CrTiAl(C)N薄膜,使用磁控濺射雙靶共濺射系統(tǒng)在M2高速鋼和單晶硅片上沉積了不同C元素含量的CrAl(C)N薄膜。對薄膜的元素組成、形貌結(jié)構(gòu)、硬度及其與基材之間的結(jié)合力等進(jìn)行了表征分析,探討了各薄膜的沉積參數(shù)或摩擦條件的改變對薄膜在空氣或切削液中的摩擦學(xué)特性的影響,通過對摩擦試驗結(jié)果來探討摩擦磨損機(jī)理。結(jié)果表明:(1)CrAlN基薄膜中主要存在的相為fcc-CrN,在CrAlN薄膜中依次摻入Ti、C元素后,薄膜的硬度和膜基結(jié)合力均有所下降,硬度從1233HV0.01降至1110HV0.01;在空氣中,三種薄膜的摩擦系數(shù)均在0.85~1.1之間,磨損率均隨著對磨速度的提高而升高;在水基切削液中,摩擦系數(shù)和薄膜的磨損率隨著對磨速度的提高而降低,當(dāng)對磨速度為0.4m/s時,CrTiAlCN薄膜摩擦系數(shù)最低為0.24,而CrAlN薄膜因具有較好的機(jī)械性能,磨損率最低,為1.43×10~(-7)mm~3/Nm。(2)CrAlCN薄膜中晶體的主要成分是CrN/Cr_2N,而C元素含量的升高,薄膜中CrN/Cr_2N成分逐漸減少。隨著C元素含量的增加,CrAlCN薄膜的硬度先增加后減小,在C元素含量為50.3 at.%時,薄膜的硬度最高,為1095HV0.01。在空氣和水基切削液的條件下,薄膜的摩擦系數(shù)都隨著CrAlCN薄膜中C元素含量的增加有降低的趨勢,在空氣中,摩擦系數(shù)從1.06降低到0.34,而在水基切削中,摩擦系數(shù)從0.60降低到0.11;空氣和水基切削液條件下,CrAlCN4薄膜都具有最低的磨損率,分別為為2.78×10~(-5) mm~3/Nm和1.62×10~(-5) mm~3/Nm。(3)CrTiAl(C)N薄膜中所含晶體的主要成分是面心立方CrN/TiN/AlN,且隨著C元素含量的增加,衍射峰強(qiáng)度逐漸降低;隨著C元素含量的增加,CrTiAl(C)N薄膜的硬度先增加后減小,在C元素含量為22.5 at.%時,薄膜的硬度最高,為2999HV0.05,CrTiAl(C)N薄膜的結(jié)合力則隨著C元素含量的增加逐漸減小,CrTiAlN薄膜的膜基結(jié)合力最高,為76N;CrTiAl(C)N薄膜與小球在空氣和水基切削液中對磨的摩擦系數(shù)隨著C元素含量的增加均有所降低,在空氣中,從1.22降低至0.37,而在水基切削中,摩擦系數(shù)從0.60降至0.53。在空氣和水基切削液中,CrTiAlCN5薄膜的均有最低的磨損率,分別為9.83×10~(-7) mm~3/Nm和1.15×10~(-6) mm~3/Nm。
[Abstract]:In this paper, CrAlN- CrTiAlN- CrTiAlCN thin films were deposited on 316L stainless steel and single crystal silicon substrates by unbalanced magnetron sputtering system, and CrTiAl(C)N films with different C content on M2 high speed steel were deposited. CrAl(C)N thin films with different C content were deposited on M2 high speed steel and single crystal silicon substrates by magnetron sputtering dual target co-sputtering system. The composition, morphology, hardness and adhesion between the films and the substrate were characterized and analyzed. The effects of deposition parameters or friction conditions on the tribological properties of the films in air or cutting fluid were discussed. The friction and wear mechanism is discussed by means of friction test results. The results show that the main phase in the CrAlN films is fcc-CrN, and the hardness and adhesion of the films decrease from 1233HV0.01 to 1110HV0.01, and the friction coefficient of the three films is between 0.851.1.In air, the hardness and adhesion of the films are decreased from 1233HV0.01 to 1110HV0.01.In the air, the friction coefficient of the three kinds of films is between 0.85 and 1.1.The hardness of the films is decreased from 1233HV0.01 to 1110HV0.01.In the air, the friction coefficient of the three kinds of films is between 0.85 and 1.1. The wear rate increased with the increase of grinding speed, and the friction coefficient and the wear rate of film decreased with the increase of grinding speed in water based cutting fluid. When the grinding speed is 0.4m/s, the friction coefficient of CrTiAlCN film is the lowest 0.24, while the wear rate of CrAlN film is the lowest because of its good mechanical properties. The main component of the crystal in the film is CrN / Cr2N, but with the increase of C element content, the CrN/Cr_2N component in the film decreases gradually. The hardness of CrAlCN films increased first and then decreased with the increase of C element content. When the content of C element was 50.3 at.%, the hardness of the films was the highest (1095HV0.01). Under the condition of air and water based cutting fluid, the friction coefficient of the film decreases with the increase of C element content in CrAlCN film. In air, the friction coefficient decreases from 1. 06 to 0. 34, while in water based cutting, the friction coefficient decreases from 1. 06 to 0. 34, while in water based cutting, the friction coefficient decreases from 1. 06 to 0. 34. The friction coefficient was reduced from 0.60 to 0.11.The wear rate of CrAlCN4 thin films was the lowest in air and water based cutting fluids, which were 2.78 脳 10 ~ (-5) mm~3/Nm and 1.62 脳 10 ~ (5) mm~3/Nm.(3)CrTiAl(C)N respectively. The main composition of the crystals contained in the films was face-centered cubic CrN / TiN / AlN, and with the increase of the content of C element, With the increase of C element content, the hardness of CrTiAlN films first increased and then decreased. When the content of C element was 22.5 at.%, the hardness of the films was the highest. The adhesion of CrTiAlN thin film to 2999HV0.05CrTiAlN film decreases gradually with the increase of the content of C element, and the adhesion of CrTiAlN film to the ball decreases with the increase of the content of C element, and the friction coefficient of the film and the ball decreases with the increase of the content of C element in the air and water based cutting fluid, and the adhesion of the CrTiAlN film to the ball is decreased with the increase of the content of C element. In air, the friction coefficient decreases from 1.22 to 0.37, while in water-based cutting, the friction coefficient decreases from 0.60 to 0.53. The wear rates of CrTiAlCN5 thin films in air and water based cutting fluids were 9.83 脳 10 ~ (-7) mm~3/Nm and 1.15 脳 10 ~ (-1) mm ~ (-1) mm ~ (-1) Nm, respectively, and the wear rates were 9.83 脳 10 ~ (-7) mm~3/Nm and 1.15 脳 10 ~ (-1) mm ~ (-1) mm ~ (-1).
【學(xué)位授予單位】：南京航空航天大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2017
【分類號】：TB383.2;TG501.5

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