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光子篩光學(xué)特性分析及應(yīng)用研究

發(fā)布時(shí)間:2018-03-20 04:03

  本文選題:光子篩 切入點(diǎn):像差計(jì)算 出處:《中國(guó)科學(xué)院光電技術(shù)研究所》2017年博士論文 論文類型:學(xué)位論文


【摘要】:X射線和極紫外波段在光刻、空間望遠(yuǎn)鏡、X射線光譜檢測(cè)和高分辨率顯微鏡等領(lǐng)域有不可替代的作用。但是在X射線和極紫外波段大多數(shù)傳統(tǒng)的光學(xué)材料的折射率接近或者小于1,不能作為透鏡來(lái)聚焦和成像。波帶片通過(guò)相位調(diào)制來(lái)實(shí)現(xiàn)聚焦,不受波長(zhǎng)的限制,是X射線和極紫外波段的重要衍射透鏡。波帶片的分辨率受限于其最外環(huán)的尺寸,為了尋求更高的分辨率,2001年德國(guó)科學(xué)家L.Kipp等人首次提出使用光子篩來(lái)代替波帶片。結(jié)構(gòu)上光子篩采用大量的微孔代替菲涅爾波帶片的環(huán)帶結(jié)構(gòu),相對(duì)于波帶片具有以下優(yōu)點(diǎn):首先,在相同的特征尺寸條件下,具備更大數(shù)值孔徑,實(shí)現(xiàn)更高分辨力,而且小孔衍射可以抑制部分高階衍射,壓低聚焦光斑的旁瓣;其次,光子篩的微孔分布沒(méi)有打斷結(jié)構(gòu)的連續(xù)性,不需要額外的襯底作為支撐,可以制作為薄膜光學(xué)元件,具有大口徑,質(zhì)量輕,體積小等優(yōu)點(diǎn);再者,光子篩小孔排布為設(shè)計(jì)提供了更多的可能性,可以通過(guò)改進(jìn)光子篩設(shè)計(jì)達(dá)到優(yōu)化聚焦成像以及實(shí)現(xiàn)特殊光場(chǎng)分布等目的。本文針對(duì)光子篩成像和聚焦兩大問(wèn)題,開(kāi)展光學(xué)性能分析和應(yīng)用研究。在光子篩聚焦方面,之前的國(guó)內(nèi)外學(xué)者主要將精力集中在光子篩聚焦性能的改進(jìn),比如分辨率,衍射效率和焦深等,對(duì)光子篩聚焦時(shí)多焦點(diǎn)的現(xiàn)象研究不足。本文研究了光子篩多焦點(diǎn)機(jī)理,將光子篩和伽伯波帶片結(jié)合,設(shè)計(jì)了單焦點(diǎn)光子篩,并進(jìn)行了模擬仿真和實(shí)驗(yàn)驗(yàn)證,證明單焦點(diǎn)光子篩可以減弱聚焦時(shí)的背景光,提高圖像的信噪比。并利用光子篩微孔排布的自由度,設(shè)計(jì)了交錯(cuò)式光子篩,簡(jiǎn)單的改變光子篩環(huán)帶,利用光子篩聚焦來(lái)實(shí)現(xiàn)局域空心光束,光場(chǎng)計(jì)算和實(shí)驗(yàn)證明了其可行性,并可以產(chǎn)生極小尺寸的空心光斑,該結(jié)構(gòu)在光鑷、粒子約束和原子冷卻中具有重要應(yīng)用。光子篩作為成像元件在現(xiàn)實(shí)中的應(yīng)用需求越來(lái)越迫切,而光子篩像差問(wèn)題一直沒(méi)有引起足夠的重視,為此,本論探究了光子篩像差計(jì)算方法,建立了光子篩等效波像差模型,突破了以往光斑尺寸的評(píng)價(jià)指標(biāo),拓展了光子篩的光學(xué)分析內(nèi)涵。并具體進(jìn)行了光子篩像差實(shí)例計(jì)算,總結(jié)光子篩像差特點(diǎn),并研究了像差影響因素。在成像應(yīng)用方面,設(shè)計(jì)了三平面和九平面同時(shí)成像光子篩,建立了三維成像光子篩的成像模型,模擬了其點(diǎn)擴(kuò)散函數(shù),并實(shí)驗(yàn)證明了可行性,三維成像光子篩有望在X射線顯微成像發(fā)揮重要用途。此外,提出了基于光子篩的光譜成像方法,對(duì)光子篩光譜成像原理和成像模型進(jìn)行了細(xì)致的分析,研究了光譜數(shù)據(jù)重建算法并進(jìn)行模擬仿真。總之,本論文完善了光子篩的光學(xué)特性的分析,并在聚焦和成像方面開(kāi)展了諸多卓有成效的應(yīng)用研究,為光子篩廣泛應(yīng)用奠定了基礎(chǔ)。
[Abstract]:X-rays and extreme ultraviolet bands in photolithography, Space telescope X-ray spectroscopy and high resolution microscopy have irreplaceable effects. However, the refractive index of most traditional optical materials in X-ray and extreme ultraviolet bands is close to or less than 1, and cannot be considered as transparent. The waveband plate is focused by phase modulation. Independent of wavelength, they are important diffraction lenses for X-ray and extreme ultraviolet wavelengths. The resolution of the band plate is limited by the size of its outermost ring, In 2001, in order to seek higher resolution, German scientist L. Kipp and others first proposed the use of photonic sieve instead of the band plate. The photonic sieve in the structure uses a large number of micropores to replace the annular structure of the Fresnel band plate. Compared with Yu Bo strip, it has the following advantages: firstly, it has larger numerical aperture and higher resolution under the same characteristic size, and small hole diffraction can suppress some higher-order diffraction and suppress the sidelobe of focusing spot. The micropore distribution of the photonic sieve does not break the continuity of the structure, does not need additional substrate as the support, can be made into thin film optical elements, with the advantages of large aperture, light weight, small volume and so on. The arrangement of photonic sieve holes provides more possibilities for the design, which can optimize the focus imaging and realize the special light field distribution by improving the photonic screen design. In this paper, we aim at two major problems: photon screen imaging and focusing. In the field of photon screen focusing, previous scholars at home and abroad have focused on improving the focusing performance of the photon screen, such as resolution, diffraction efficiency and depth of focus, etc. The multi-focus mechanism of photonic screen is studied in this paper. The single focus photonic screen is designed by combining the photon screen with the gamma wave band plate, and the simulation and experiment are carried out. It is proved that the single focus photon screen can weaken the background light and improve the signal-to-noise ratio of the image. The local hollow beam is realized by photon sieve focusing. The optical field calculation and experiment prove its feasibility, and it can produce very small hollow spot. The structure is used in optical tweezers. Particle confinement and atomic cooling have important applications. The application of photonic screen as imaging element is more and more urgent, but the problem of photonic screen aberration has not been paid enough attention to. This paper probes into the calculation method of photonic screen aberration, establishes the equivalent wave aberration model of photonic screen, breaks through the previous evaluation index of light spot size, expands the connotation of optical analysis of photonic screen, and makes a practical calculation of photon screen aberration. The characteristics of photonic screen aberration are summarized, and the influence factors of aberration are studied. In imaging application, the imaging model of 3D imaging photonic screen is established and its point diffusion function is simulated. The experimental results show that the three-dimensional imaging photonic screen is expected to play an important role in X-ray microscopic imaging. In addition, a spectral imaging method based on photonic screen is proposed, and the principle and model of photonic screen spectral imaging are analyzed in detail. The spectral data reconstruction algorithm is studied and simulated. In a word, the optical properties of the photonic sieve are analyzed, and a lot of fruitful application researches have been carried out in the field of focusing and imaging. It lays a foundation for the wide application of photon screen.
【學(xué)位授予單位】:中國(guó)科學(xué)院光電技術(shù)研究所
【學(xué)位級(jí)別】:博士
【學(xué)位授予年份】:2017
【分類號(hào)】:O43

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