本文關鍵詞： 投影光刻物鏡 高數(shù)值孔徑 公差 像質補償 偏振像差　出處：《中國科學院長春光學精密機械與物理研究所》2017年博士論文　論文類型：學位論文

【摘要】：用于制造大規(guī)模集成電路的核心設備是光刻機,光刻機的核心部件是投影光刻物鏡。為了將掩模圖形近似完美地投影到光刻膠上,光刻物鏡的像質必須滿足極其苛刻的指標要求。如果在光刻物鏡的加工制造過程中采取最優(yōu)的像質補償策略,則可以在確保各項像質指標的同時,降低多方面的公差要求,進而最大程度地降低投影光刻物鏡的制造成本。集成電路節(jié)點的推進促使光刻物鏡的數(shù)值孔徑(NA)不斷增大,當NA增大到一定程度時,成像光束的偏振態(tài)對成像質量的影響變得不可忽略,物鏡的像質評價中除了標量像差外,還需要考慮偏振像差。本文針對國內關于極大規(guī)模集成電路的產(chǎn)業(yè)化需求,開展了面向45 nm節(jié)點的深紫外波段NA 1.35浸沒式投影光刻物鏡的像質補償策略與偏振像差研究,主要包括以下研究內容:一、投影光刻物鏡的成像理論。研究了投影光刻物鏡的標量成像理論和矢量成像理論,由于矢量成像理論考慮了成像光束的偏振狀態(tài)和物鏡的偏振像差,所以其更能準確地描述高NA投影光刻物鏡的成像性能。本文綜合考慮了波像差、畸變、偏振像差(二向衰減和延遲)后,建立了更為全面的像質評價方法。二、像質補償策略。針對光學材料公差、元件制造公差以及裝配公差引起的光刻物鏡的波像差與畸變的劣化,本文系統(tǒng)地研究了多種像質補償方法,包括光學復算、計算機輔助裝調、面形精修、變形鏡和熱補償。其中,元件間隔的復算用來補償一維材料公差和加工公差,元件旋轉角度的復算用來補償二維公差如折射率均勻性公差和面形公差,計算機輔助裝調主要補償裝配公差,面形精修用來補償殘余的高階像差,變形鏡技術和熱補償技術相結合可以補償熱像差。本文為各種像質補償方法建立了數(shù)學模型,編寫了相應的程序,并在NA1.35的光刻物鏡上進行了仿真。仿真結果表明,本文的像質補償策略可將物鏡的波像差與畸變補償至設計水平。三、偏振像差。本文定量地分析了NA 1.35投影光刻物鏡的偏振像差,研究了偏振像差在光學系統(tǒng)中的分布規(guī)律,并推導出了一種新的多項式,即視場-方向澤尼克多項式,對其進行描述。該多項式是視場坐標和出瞳坐標的函數(shù),能同時表征偏振像差在視場與出瞳上的分布規(guī)律,并且各項在單位圓視場和單位圓光瞳上是正交的。視場-方向澤尼克多項式不僅適用于旋轉對稱的光學系統(tǒng),也適用于M-fold光學系統(tǒng)。為驗證該多項式的正確性,分別用光刻物鏡和顯微物鏡做了仿真,仿真結果與理論推導結果完全一致。本文的研究成果可為高NA投影光刻物鏡的研發(fā)提供一些有益的指導。
[Abstract]:The core device used in the manufacture of large scale integrated circuits is the lithography machine, the core component of which is the projection lithography objective lens. The image quality of the lithographic objective must meet the extremely harsh requirements. If the optimal image quality compensation strategy is adopted in the manufacturing process of the lithographic objective lens, it can ensure the various image quality indexes and reduce the tolerance requirements in many aspects. Thus, the manufacturing cost of projection lithography objective lens is minimized. The advance of integrated circuit node causes the numerical aperture of lithography objective lens to increase continuously, when na increases to a certain extent, The influence of the polarization state of the imaging beam on the imaging quality can not be ignored. Besides the scalar aberration, the polarization aberration should also be considered in the image quality evaluation of the objective lens. The image quality compensation strategy and polarization aberration of NA1.35 immersion lithographic objective lens for 45 nm node are studied. The main contents are as follows: 1. The imaging theory of projection lithography objective lens. The scalar imaging theory and vector imaging theory of projection lithography objective lens are studied, because the polarization state of the imaging beam and the polarization aberration of the objective lens are considered in the vector imaging theory. Therefore, it can more accurately describe the imaging performance of high na projection lithography objective lens. After considering wave aberration, distortion, polarization aberration (two direction attenuation and delay), a more comprehensive image quality evaluation method is established in this paper. Aiming at the deterioration of wave aberration and distortion caused by optical material tolerance, component manufacturing tolerance and assembly tolerance, this paper systematically studies various methods of image quality compensation, including optical complex calculation. Computer-aided adjustment, surface finishing, deformable mirrors and thermal compensation. The combination of element spacing is used to compensate for one-dimensional material tolerances and machining tolerances, The complex calculation of the rotation angle of the element is used to compensate two dimensional tolerances such as refractive index uniformity tolerance and plane shape tolerance, the computer-aided adjustment mainly compensates the assembly tolerance, and the plane shape refinement is used to compensate the residual higher-order aberrations. Thermal aberration can be compensated by the combination of deformable mirror technology and thermal compensation technique. In this paper, mathematical models of various image quality compensation methods are established, corresponding programs are compiled and simulated on NA1.35 lithography objective lens. The simulation results show that, The image quality compensation strategy in this paper can compensate the wave aberration and distortion of the objective lens to the design level. Thirdly, the polarization aberration. In this paper, the polarization aberration of the na 1.35 projection lithography objective lens is quantitatively analyzed, and the distribution of the polarization aberration in the optical system is studied. A new polynomial, the field-of-view Zehnik polynomial, is derived and described. The polynomial is a function of the field of view and the pupil coordinate, and can represent the distribution of polarization aberration in both the field of view and the pupil at the same time. All items are orthogonal in unit circle field of view and unit circle pupil. Field of view and directional Zehnik polynomials are suitable not only for rotationally symmetric optical systems, but also for M-fold optical systems. The simulation results are in good agreement with the theoretical results. The research results in this paper can provide some useful guidance for the research and development of high na projection lithography objective lens.
【學位授予單位】：中國科學院長春光學精密機械與物理研究所
【學位級別】：博士
【學位授予年份】：2017
【分類號】：TN405;O436.3

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